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Class Information
Number: 427/255.23
Name: Coating processes > Coating by vapor, gas, or smoke > Mixture of vapors or gases (e.g., deposition gas and inert gas, inert gas and reactive gas, two or more reactive gases, etc.) utilized
Description: Process wherein a mixture of gases or vapors is used to form the coating.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7622153 |
Method of making vapour deposited oxygen-scavenging particles |
Nov. 24, 2009 |
| 7615251 |
Processing device using shower head structure and processing method |
Nov. 10, 2009 |
| 7608299 |
Process for the deposition by CVD of a silver film on a substrate |
Oct. 27, 2009 |
| 7608301 |
Process for forming a protective coating containing aluminium and zirconium on a metal |
Oct. 27, 2009 |
| 7597951 |
Coated cutting tool insert |
Oct. 6, 2009 |
| 7595088 |
Hydrogen assisted HDP-CVD deposition process for aggressive gap-fill technology |
Sep. 29, 2009 |
| 7592254 |
Methods for coating and filling high aspect ratio recessed features |
Sep. 22, 2009 |
| 7592043 |
Method and apparatus for coating a patterned thin film on a substrate from a fluid source with continuous feed capability |
Sep. 22, 2009 |
| 7588804 |
Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces |
Sep. 15, 2009 |
| 7585545 |
Hydrogen sulfide injection method for phosphor deposition |
Sep. 8, 2009 |
| 7572647 |
Internal balanced coil for inductively coupled high density plasma processing chamber |
Aug. 11, 2009 |
| 7566477 |
Method for saturating a carrier gas with precursor vapor |
Jul. 28, 2009 |
| 7556839 |
Method of manufacturing semiconductor device and apparatus for processing substrate |
Jul. 7, 2009 |
| 7553468 |
Method for producing solid product |
Jun. 30, 2009 |
| 7544631 |
C and N-doped titaniumoxide-based photocatalytic and self-cleaning thin films and the process for production thereof |
Jun. 9, 2009 |
| 7517557 |
Oxide films, a method of producing the same and structures having the same |
Apr. 14, 2009 |
| 7498059 |
Method for growing thin films |
Mar. 3, 2009 |
| 7491660 |
Method of forming nitride films with high compressive stress for improved PFET device performance |
Feb. 17, 2009 |
| 7485338 |
Method for precursor delivery |
Feb. 3, 2009 |
| 7485339 |
Method for chemical vapor deposition capable of preventing contamination and enhancing film growth rate |
Feb. 3, 2009 |
| 7479303 |
Method for chemical vapor deposition (CVD) with showerhead and method thereof |
Jan. 20, 2009 |
| 7470450 |
Forming a silicon nitride film |
Dec. 30, 2008 |
| 7455884 |
Atomic layer deposition with point of use generated reactive gas species |
Nov. 25, 2008 |
| 7452827 |
Gas distribution showerhead featuring exhaust apertures |
Nov. 18, 2008 |
| 7438955 |
Titanium nitride thin film formation on metal substrate by chemical vapor deposition in a magnetized sheet plasma source |
Oct. 21, 2008 |
| 7431967 |
Limited thermal budget formation of PMD layers |
Oct. 7, 2008 |
| 7431968 |
Process and apparatus for organic vapor jet deposition |
Oct. 7, 2008 |
| 7431998 |
Tool and method for the chemical vapor deposition of a two-phase layer on a substrate member |
Oct. 7, 2008 |
| 7429402 |
Ruthenium as an underlayer for tungsten film deposition |
Sep. 30, 2008 |
| 7427425 |
Reactors with isolated gas connectors and methods for depositing materials onto micro-device workpieces |
Sep. 23, 2008 |
| 7427426 |
CVD method for forming metal film by using metal carbonyl gas |
Sep. 23, 2008 |
| 7422805 |
Cutting tool for bimetal machining |
Sep. 9, 2008 |
| 7422770 |
Forming a thin film structure |
Sep. 9, 2008 |
| 7413767 |
Gas supply method in a CVD coating system for precursors with a low vapor pressure |
Aug. 19, 2008 |
| 7404984 |
Method for growing thin films |
Jul. 29, 2008 |
| 7404985 |
Noble metal layer formation for copper film deposition |
Jul. 29, 2008 |
| 7396563 |
Ceramic thin film on various substrates, and process for producing same |
Jul. 8, 2008 |
| 7393561 |
Method and apparatus for layer by layer deposition of thin films |
Jul. 1, 2008 |
| 7387815 |
Metallization of substrate(s) by a liquid/vapor deposition process |
Jun. 17, 2008 |
| 7384665 |
Formation of protective coatings for color filters |
Jun. 10, 2008 |
| 7374941 |
Active reactant vapor pulse monitoring in a chemical reactor |
May. 20, 2008 |
| RE40082 |
Coated inserts for rough milling |
Feb. 19, 2008 |
| 7323219 |
Apparatus and method for applying diamond-like carbon coatings |
Jan. 29, 2008 |
| 7314651 |
Film forming method and film forming device |
Jan. 1, 2008 |
| 7300558 |
Rapid cycle time gas burster |
Nov. 27, 2007 |
| 7294360 |
Conformal coatings for micro-optical elements, and method for making the same |
Nov. 13, 2007 |
| 7267842 |
Method for removing titanium dioxide deposits from a reactor |
Sep. 11, 2007 |
| 7264846 |
Ruthenium layer formation for copper film deposition |
Sep. 4, 2007 |
| 7261919 |
Silicon carbide and other films and method of deposition |
Aug. 28, 2007 |
| 7252859 |
Organic materials for an evaporation source |
Aug. 7, 2007 |
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