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Class Information
Number: 382/144
Name: Image analysis > Applications > Manufacturing or product inspection > Mask inspection (e.g., semiconductor photomask)
Description: Subject matter wherein photomasks for semiconductor or printed circuit board fabrication are scanned for defects, holes, etc.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7397941 |
Method and apparatus for electron beam inspection of repeated patterns |
Jul. 8, 2008 |
| 7397940 |
Object positioning method for a lithographic projection apparatus |
Jul. 8, 2008 |
| 7389491 |
Methods, systems and computer program products for correcting photomask using aerial images and boundary regions |
Jun. 17, 2008 |
| 7388979 |
Method and apparatus for inspecting pattern defects |
Jun. 17, 2008 |
| 7386162 |
Post fabrication CD modification on imprint lithography mask |
Jun. 10, 2008 |
| 7385689 |
Method and apparatus for inspecting substrate pattern |
Jun. 10, 2008 |
| 7382912 |
Method and apparatus for performing target-image-based optical proximity correction |
Jun. 3, 2008 |
| 7378201 |
Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device |
May. 27, 2008 |
| 7376259 |
Topography compensation of imprint lithography patterning |
May. 20, 2008 |
| 7376260 |
Method for post-OPC multi layer overlay quality inspection |
May. 20, 2008 |
| 7371489 |
Photomask, method for detecting pattern defect of the same, and method for making pattern using the same |
May. 13, 2008 |
| 7368208 |
Measuring phase errors on phase shift masks |
May. 6, 2008 |
| 7366343 |
Pattern inspection method and apparatus |
Apr. 29, 2008 |
| 7366342 |
Simultaneous computation of multiple points on one or multiple cut lines |
Apr. 29, 2008 |
| 7361909 |
Method and apparatus for correcting drift during automated FIB processing |
Apr. 22, 2008 |
| 7362428 |
Highly sensitive defect detection method |
Apr. 22, 2008 |
| 7360199 |
Iterative method for refining integrated circuit layout using compass optical proximity correction (OPC) |
Apr. 15, 2008 |
| 7354684 |
Test pattern and method of evaluating the transfer properties of a test pattern |
Apr. 8, 2008 |
| 7352892 |
System and method for shape reconstruction from optical images |
Apr. 1, 2008 |
| 7339663 |
Method and apparatus for classifying repetitive defects on a substrate |
Mar. 4, 2008 |
| 7336814 |
Method and apparatus for machine-vision |
Feb. 26, 2008 |
| 7330580 |
System and method for inspecting an LCD panel |
Feb. 12, 2008 |
| 7327870 |
Method for inspecting a region of interest |
Feb. 5, 2008 |
| 7317824 |
Overlay marks, methods of overlay mark design and methods of overlay measurements |
Jan. 8, 2008 |
| 7315641 |
Pattern correcting method of mask for manufacturing a semiconductor device and recording medium having recorded its pattern correcting method |
Jan. 1, 2008 |
| 7310438 |
Systems for detecting defects in printed solder paste |
Dec. 18, 2007 |
| 7303841 |
Repair of photolithography masks by sub-wavelength artificial grating technology |
Dec. 4, 2007 |
| 7302091 |
Method and apparatus for determining defect detection sensitivity data, control method of defect detection apparatus, and method and apparatus for detecting defect of semiconductor devices |
Nov. 27, 2007 |
| 7300729 |
Method for monitoring a reticle |
Nov. 27, 2007 |
| 7300725 |
Method for determining and correcting reticle variations |
Nov. 27, 2007 |
| 7302090 |
Method and device for determining the properties of an integrated circuit |
Nov. 27, 2007 |
| 7297453 |
Systems and methods for mitigating variances on a patterned wafer using a prediction model |
Nov. 20, 2007 |
| 7289231 |
Apparatus and method for determining physical properties of a mask blank |
Oct. 30, 2007 |
| 7289657 |
Method of inspecting photo-mask |
Oct. 30, 2007 |
| 7289658 |
Removal of relatively unimportant shapes from a set of shapes |
Oct. 30, 2007 |
| 7286284 |
Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection |
Oct. 23, 2007 |
| 7283659 |
Apparatus and methods for searching through and analyzing defect images and wafer maps |
Oct. 16, 2007 |
| 7283658 |
Topographic measurement using stereoscopic picture frames |
Oct. 16, 2007 |
| 7274814 |
Overlay marks, methods of overlay mark design and methods of overlay measurements |
Sep. 25, 2007 |
| 7261984 |
Exposure pattern or mask and inspection method and manufacture method for the same |
Aug. 28, 2007 |
| 7257247 |
Mask defect analysis system |
Aug. 14, 2007 |
| 7252913 |
Method for projection of a circuit pattern, which is arranged on a mask, onto a semiconductor wafer |
Aug. 7, 2007 |
| 7249343 |
In-plane distribution data compression method, in-plane distribution measurement method, in-plane distribution optimization method, process apparatus control method, and process control method |
Jul. 24, 2007 |
| 7243331 |
Method and system for controlling the quality of a reticle |
Jul. 10, 2007 |
| 7239735 |
Pattern inspection method and pattern inspection device |
Jul. 3, 2007 |
| 7234128 |
Method for improving the critical dimension uniformity of patterned features on wafers |
Jun. 19, 2007 |
| 7233887 |
Method of photomask correction and its optimization using localized frequency analysis |
Jun. 19, 2007 |
| 7228257 |
Architecture for general purpose programmable semiconductor processing system and methods therefor |
Jun. 5, 2007 |
| 7224828 |
Time resolved non-invasive diagnostics system |
May. 29, 2007 |
| 7221788 |
Method of inspecting a mask or reticle for detecting a defect, and mask or reticle inspection system |
May. 22, 2007 |
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