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Class Information
Number: 382/144
Name: Image analysis > Applications > Manufacturing or product inspection > Mask inspection (e.g., semiconductor photomask)
Description: Subject matter wherein photomasks for semiconductor or printed circuit board fabrication are scanned for defects, holes, etc.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7614031 |
Drawing apparatus with drawing data correction function |
Nov. 3, 2009 |
| 7604912 |
Local flare correction |
Oct. 20, 2009 |
| 7602961 |
Reference data generating method, pattern defect checking apparatus, pattern defect checking method, reference data generating program, and semiconductor device manufacturing method |
Oct. 13, 2009 |
| 7602996 |
Microscope system and method |
Oct. 13, 2009 |
| 7587700 |
Process monitoring system and method for processing a large number of sub-micron measurement targets |
Sep. 8, 2009 |
| 7585600 |
Method and apparatus for performing target-image-based optical proximity correction |
Sep. 8, 2009 |
| 7583376 |
Method and device for examination of nonuniformity defects of patterns |
Sep. 1, 2009 |
| 7580557 |
Method of design analysis of existing integrated circuits |
Aug. 25, 2009 |
| 7580558 |
Screen printing apparatus |
Aug. 25, 2009 |
| 7577288 |
Sample inspection apparatus, image alignment method, and program-recorded readable recording medium |
Aug. 18, 2009 |
| 7574051 |
Comparison of patterns |
Aug. 11, 2009 |
| 7571423 |
Optimized photomasks for photolithography |
Aug. 4, 2009 |
| 7570815 |
Comparing patterns |
Aug. 4, 2009 |
| 7570797 |
Methods and systems for generating an inspection process for an inspection system |
Aug. 4, 2009 |
| 7570796 |
Methods and systems for utilizing design data in combination with inspection data |
Aug. 4, 2009 |
| 7567699 |
Center determination of rotationally symmetrical alignment marks |
Jul. 28, 2009 |
| 7567700 |
Dynamic metrology sampling with wafer uniformity control |
Jul. 28, 2009 |
| 7564545 |
Inspection methods and systems for lithographic masks |
Jul. 21, 2009 |
| 7565032 |
Image density-adapted automatic mode switchable pattern correction scheme for workpiece inspection |
Jul. 21, 2009 |
| 7562336 |
Contrast based resolution enhancement for photolithographic processing |
Jul. 14, 2009 |
| 7562337 |
OPC verification using auto-windowed regions |
Jul. 14, 2009 |
| 7558419 |
System and method for detecting integrated circuit pattern defects |
Jul. 7, 2009 |
| 7559047 |
Method and apparatus for creating imaging recipe |
Jul. 7, 2009 |
| 7553678 |
Method for detecting semiconductor manufacturing conditions |
Jun. 30, 2009 |
| 7551767 |
Pattern inspection apparatus |
Jun. 23, 2009 |
| 7550235 |
Method and apparatus for performing model based placement of phase-balanced scattering bars for sub-wavelength optical lithography |
Jun. 23, 2009 |
| 7541201 |
Apparatus and methods for determining overlay of structures having rotational or mirror symmetry |
Jun. 2, 2009 |
| 7542599 |
Reducing number of relatively unimportant shapes from a set of shapes |
Jun. 2, 2009 |
| 7537865 |
Method of adjusting size of photomask pattern |
May. 26, 2009 |
| 7539583 |
Method and system for defect detection |
May. 26, 2009 |
| 7532749 |
Light processing apparatus |
May. 12, 2009 |
| 7526405 |
Statistical signatures used with multivariate statistical analysis for fault detection and isolation and abnormal condition prevention in a process |
Apr. 28, 2009 |
| 7525089 |
Method of measuring a critical dimension of a semiconductor device and a related apparatus |
Apr. 28, 2009 |
| 7512259 |
Defect inspection method and apparatus |
Mar. 31, 2009 |
| 7508972 |
Topographic measurement using stereoscopic picture frames |
Mar. 24, 2009 |
| 7508973 |
Method of inspecting defects |
Mar. 24, 2009 |
| 7505619 |
System and method for conducting adaptive fourier filtering to detect defects in dense logic areas of an inspection surface |
Mar. 17, 2009 |
| 7499582 |
Method for inspecting a defect in a photomask, method for manufacturing a semiconductor device and method for producing a photomask |
Mar. 3, 2009 |
| 7498105 |
Method for checking phase shift angle of phase shift mask, lithography process and phase shift mask |
Mar. 3, 2009 |
| 7496882 |
Optimization to avoid sidelobe printing |
Feb. 24, 2009 |
| 7492940 |
Mask defect analysis system |
Feb. 17, 2009 |
| 7492941 |
Mask defect analysis system |
Feb. 17, 2009 |
| 7486814 |
Local bias map using line width measurements |
Feb. 3, 2009 |
| 7487491 |
Pattern inspection system using image correction scheme with object-sensitive automatic mode switchability |
Feb. 3, 2009 |
| 7483559 |
Method and apparatus for deblurring mask images |
Jan. 27, 2009 |
| 7478360 |
Approximating wafer intensity change to provide fast mask defect scoring |
Jan. 13, 2009 |
| 7475382 |
Method and apparatus for determining an improved assist feature configuration in a mask layout |
Jan. 6, 2009 |
| 7469057 |
System and method for inspecting errors on a wafer |
Dec. 23, 2008 |
| 7469058 |
Method and system for a maskless lithography rasterization technique based on global optimization |
Dec. 23, 2008 |
| 7466852 |
Time resolved non-invasive diagnostics system |
Dec. 16, 2008 |
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