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Class Information
Number: 378/35
Name: X-ray or gamma ray systems or devices > Specific application > Lithography > Pattern mask
Description: Subject matter restricted to the mask itself which is made up of adjacent areas of X-ray opaque and X-ray transparent material arranged in a selected pattern (usually of an electronic circuit) and used for X-ray lithos:graphic production of plural copies of the pattern.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7623935 |
Method for electrochemically fabricating three-dimensional structures including pseudo-rasterization of data |
Nov. 24, 2009 |
| 7613538 |
Compensation for distortion in contact lithography |
Nov. 3, 2009 |
| 7608367 |
Vitreous carbon mask substrate for X-ray lithography |
Oct. 27, 2009 |
| 7609805 |
Mask used for LIGA process, method of manufacturing the mask, and method of manufacturing microstructure using LIGA process |
Oct. 27, 2009 |
| 7595207 |
Method of exposing layer with light and method of manufacturing thin film transistor substrate for liquid crystal display device using the same |
Sep. 29, 2009 |
| 7592612 |
Method and apparatus for surface potential reflection electron mask lithography |
Sep. 22, 2009 |
| 7590966 |
Data path for high performance pattern generator |
Sep. 15, 2009 |
| 7587704 |
System and method for mask verification using an individual mask error model |
Sep. 8, 2009 |
| 7576328 |
Radiation image detector |
Aug. 18, 2009 |
| 7562337 |
OPC verification using auto-windowed regions |
Jul. 14, 2009 |
| 7549143 |
Method and device for checking lithography data |
Jun. 16, 2009 |
| 7549142 |
Method and device for checking lithography data |
Jun. 16, 2009 |
| 7549140 |
Method and apparatus for decomposing semiconductor device patterns into phase and chrome regions for chromeless phase lithography |
Jun. 16, 2009 |
| 7539970 |
Method of manufacturing mask |
May. 26, 2009 |
| 7536671 |
Mask for forming fine pattern and method of forming the same |
May. 19, 2009 |
| 7528929 |
Lithographic apparatus and device manufacturing method |
May. 5, 2009 |
| 7499149 |
Holographic mask for lithographic apparatus and device manufacturing method |
Mar. 3, 2009 |
| 7495744 |
Exposure method, exposure apparatus, and method for producing device |
Feb. 24, 2009 |
| 7493590 |
Process window optical proximity correction |
Feb. 17, 2009 |
| 7483119 |
Exposure method, substrate stage, exposure apparatus, and device manufacturing method |
Jan. 27, 2009 |
| 7480890 |
Method for correcting and configuring optical mask pattern |
Jan. 20, 2009 |
| 7475383 |
Method of fabricating photo mask |
Jan. 6, 2009 |
| 7458058 |
Verifying a process margin of a mask pattern using intermediate stage models |
Nov. 25, 2008 |
| 7456931 |
Device manufacturing method, computer program product and lithographic apparatus |
Nov. 25, 2008 |
| 7448018 |
System and method for employing patterning process statistics for ground rules waivers and optimization |
Nov. 4, 2008 |
| 7440078 |
Lithographic apparatus and device manufacturing method using interferometric and maskless exposure units |
Oct. 21, 2008 |
| 7433015 |
Lithographic apparatus and device manufacturing method |
Oct. 7, 2008 |
| 7430731 |
Method for electrochemically fabricating three-dimensional structures including pseudo-rasterization of data |
Sep. 30, 2008 |
| 7428037 |
Optical component that includes a material having a thermal longitudinal expansion with a zero crossing |
Sep. 23, 2008 |
| 7423721 |
Lithographic apparatus |
Sep. 9, 2008 |
| 7420650 |
Method of setting processing condition in photolithography process, apparatus for setting processing condition in photolithography process, program, and computer readable recording medium |
Sep. 2, 2008 |
| 7417707 |
Introduction of an intermediary refractive layer for immersion lithography |
Aug. 26, 2008 |
| 7418694 |
Method for generating test patterns utilized in manufacturing semiconductor device |
Aug. 26, 2008 |
| 7413831 |
Reflective exposure mask, and method for producing and using the same |
Aug. 19, 2008 |
| 7414700 |
Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithograph |
Aug. 19, 2008 |
| 7405809 |
Illumination system particularly for microlithography |
Jul. 29, 2008 |
| 7403262 |
Projection optical system and exposure apparatus having the same |
Jul. 22, 2008 |
| 7404167 |
Method for improving design window |
Jul. 22, 2008 |
| 7401319 |
Method and system for reticle-wide hierarchy management for representational and computational reuse in integrated circuit layout design |
Jul. 15, 2008 |
| 7379154 |
Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle |
May. 27, 2008 |
| 7368744 |
Photon sieve for optical systems in micro-lithography |
May. 6, 2008 |
| 7352438 |
Lithographic apparatus and device manufacturing method |
Apr. 1, 2008 |
| 7315032 |
Lithographic apparatus and a device manufacturing method |
Jan. 1, 2008 |
| 7315999 |
Method and apparatus for identifying assist feature placement problems |
Jan. 1, 2008 |
| 7312459 |
Apparatus for evaluating EUV light source, and evaluation method using the same |
Dec. 25, 2007 |
| 7290242 |
Pattern generation on a semiconductor surface |
Oct. 30, 2007 |
| 7287240 |
Designing method and device for phase shift mask |
Oct. 23, 2007 |
| 7279252 |
Substrate for the micro-lithography and process of manufacturing thereof |
Oct. 9, 2007 |
| 7261980 |
X-ray mask blank and x-ray mask |
Aug. 28, 2007 |
| 7256407 |
Lithographic projection apparatus and reflector assembly for use therein |
Aug. 14, 2007 |
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