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Class Information
Number: 372/60
Name: Coherent light generators > Particular active media > Gas > Including a specified gas additive
Description: Subject matter wherein a gas different from the active medium is added to the active medium.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7505504 |
Laser processing device |
Mar. 17, 2009 |
| 7453917 |
Supersonic all gas-phase iodine laser |
Nov. 18, 2008 |
| 7266137 |
Laser gas replenishment method |
Sep. 4, 2007 |
| 7082148 |
Diode pumped alkali vapor fiber laser |
Jul. 25, 2006 |
| 7075963 |
Tunable laser with stabilized grating |
Jul. 11, 2006 |
| 7061961 |
Very narrow band, two chamber, high rep-rate gas discharge laser system |
Jun. 13, 2006 |
| 7023893 |
Low-pressure axial direction excitation type F.sub.2 laser oscillator |
Apr. 4, 2006 |
| 7006546 |
Gas laser electrode, laser chamber employing the electrode, and gas laser device |
Feb. 28, 2006 |
| 7006548 |
Excimer laser device and gas for excimer laser |
Feb. 28, 2006 |
| 6970492 |
DUV and VUV laser with on-line pulse energy monitor |
Nov. 29, 2005 |
| 6965624 |
Laser gas replenishment method |
Nov. 15, 2005 |
| 6963595 |
Automatic gas control system for a gas discharge laser |
Nov. 8, 2005 |
| 6922428 |
Gas laser apparatus for lithography |
Jul. 26, 2005 |
| 6879617 |
Two stage laser system |
Apr. 12, 2005 |
| 6868106 |
Resonator optics for high power UV lasers |
Mar. 15, 2005 |
| 6859482 |
Modular gas laser discharge unit |
Feb. 22, 2005 |
| 6819698 |
Energy monitor for F2 molecular fluorine laser and method of energy stabilization |
Nov. 16, 2004 |
| 6798812 |
Two chamber F2 laser system with F2 pressure based line selection |
Sep. 28, 2004 |
| 6795473 |
Narrow band excimer laser with a prism-grating as line-narrowing optical element |
Sep. 21, 2004 |
| 6738406 |
Precision measurement of wavelengths emitted by a molecular fluorine laser at 157nm |
May. 18, 2004 |
| 6714577 |
Energy stabilized gas discharge laser |
Mar. 30, 2004 |
| 6678305 |
Surface catalyst infra red laser |
Jan. 13, 2004 |
| 6643312 |
ArF excimer laser device and a fluoride laser device |
Nov. 4, 2003 |
| 6609540 |
Method and apparatus for supplying fluorine gas |
Aug. 26, 2003 |
| 6603790 |
Gas laser and a dedusting unit thereof |
Aug. 5, 2003 |
| 6584131 |
ArF excimer laser device for exposure |
Jun. 24, 2003 |
| 6577665 |
Molecular fluorine laser |
Jun. 10, 2003 |
| 6560254 |
Line-narrowing module for high power laser |
May. 6, 2003 |
| 6553049 |
ArF laser with low pulse energy and high rep rate |
Apr. 22, 2003 |
| RE38054 |
Reliable, modular, production quality narrow-band high rep rate F2 laser |
Apr. 1, 2003 |
| 6539042 |
Ultra pure component purge system for gas discharge laser |
Mar. 25, 2003 |
| 6522679 |
Gas laser discharge unit |
Feb. 18, 2003 |
| 6496527 |
Ultraviolet laser apparatus and gas for ultraviolet laser |
Dec. 17, 2002 |
| 6490307 |
Method and procedure to automatically stabilize excimer laser output parameters |
Dec. 3, 2002 |
| 6490308 |
Laser gas replenishment method |
Dec. 3, 2002 |
| 6487229 |
Beam delivery system for molecular fluorine (F2) laser |
Nov. 26, 2002 |
| 6480517 |
Shadow device for a gas laser |
Nov. 12, 2002 |
| 6426966 |
Molecular fluorine (F2) laser with narrow spectral linewidth |
Jul. 30, 2002 |
| 6404795 |
Internal wavelength calibration for tunable ArF-excimer laser using atomic carbon and molecular oxygen absorption lines |
Jun. 11, 2002 |
| 6381257 |
Very narrow band injection seeded F2 lithography laser |
Apr. 30, 2002 |
| 6327290 |
Beam delivery system for molecular fluorine (F2) laser |
Dec. 4, 2001 |
| 6317448 |
Bandwidth estimating technique for narrow band laser |
Nov. 13, 2001 |
| 6263007 |
Pulsed discharge gas laser having non-integral supply reservoir |
Jul. 17, 2001 |
| 6243405 |
Very stable excimer or molecular fluorine laser |
Jun. 5, 2001 |
| 6188710 |
Narrow band gas discharge laser with gas additive |
Feb. 13, 2001 |
| 6175583 |
Metal vapour laser |
Jan. 16, 2001 |
| 6157662 |
F.sub.2 (157nm) laser employing neon as the buffer gas |
Dec. 5, 2000 |
| 6018537 |
Reliable, modular, production quality narrow-band high rep rate F.sub.2 laser |
Jan. 25, 2000 |
| 6014398 |
Narrow band excimer laser with gas additive |
Jan. 11, 2000 |
| 5982800 |
Narrow band excimer laser |
Nov. 9, 1999 |
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