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Class Information
Number: 372/60
Name: Coherent light generators > Particular active media > Gas > Including a specified gas additive
Description: Subject matter wherein a gas different from the active medium is added to the active medium.

Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
8432949 High-power, high-throughput microwave discharge singlet oxygen generator for advanced electrical oxygen-iodine lasers Apr. 30, 2013
8428095 Laser resonator Apr. 23, 2013
8411720 System and method for automatic gas optimization in a two-chamber gas discharge laser system Apr. 2, 2013
8089998 Ultra-short pulse laser system and method for producing femtosecond or picosecond pulses Jan. 3, 2012
7920616 Laser system Apr. 5, 2011
7822092 Laser system Oct. 26, 2010
7817699 High-power, high-throughput microwave discharge singlet oxygen generator for advanced electrical oxygen-iodine lasers Oct. 19, 2010
7778302 Laser system Aug. 17, 2010
7756182 RF excited CO.sub.2 slab laser tube housing and electrodes cooling Jul. 13, 2010
7668222 Dual flow common combustor chemical laser Feb. 23, 2010
7656916 Semiconductor light emitting device and method for fabricating same Feb. 2, 2010
7505504 Laser processing device Mar. 17, 2009
7453917 Supersonic all gas-phase iodine laser Nov. 18, 2008
7266137 Laser gas replenishment method Sep. 4, 2007
7082148 Diode pumped alkali vapor fiber laser Jul. 25, 2006
7075963 Tunable laser with stabilized grating Jul. 11, 2006
7061961 Very narrow band, two chamber, high rep-rate gas discharge laser system Jun. 13, 2006
7023893 Low-pressure axial direction excitation type F.sub.2 laser oscillator Apr. 4, 2006
7006546 Gas laser electrode, laser chamber employing the electrode, and gas laser device Feb. 28, 2006
7006548 Excimer laser device and gas for excimer laser Feb. 28, 2006
6970492 DUV and VUV laser with on-line pulse energy monitor Nov. 29, 2005
6965624 Laser gas replenishment method Nov. 15, 2005
6963595 Automatic gas control system for a gas discharge laser Nov. 8, 2005
6922428 Gas laser apparatus for lithography Jul. 26, 2005
6879617 Two stage laser system Apr. 12, 2005
6868106 Resonator optics for high power UV lasers Mar. 15, 2005
6859482 Modular gas laser discharge unit Feb. 22, 2005
6819698 Energy monitor for F2 molecular fluorine laser and method of energy stabilization Nov. 16, 2004
6798812 Two chamber F2 laser system with F2 pressure based line selection Sep. 28, 2004
6795473 Narrow band excimer laser with a prism-grating as line-narrowing optical element Sep. 21, 2004
6738406 Precision measurement of wavelengths emitted by a molecular fluorine laser at 157nm May. 18, 2004
6714577 Energy stabilized gas discharge laser Mar. 30, 2004
6678305 Surface catalyst infra red laser Jan. 13, 2004
6643312 ArF excimer laser device and a fluoride laser device Nov. 4, 2003
6609540 Method and apparatus for supplying fluorine gas Aug. 26, 2003
6603790 Gas laser and a dedusting unit thereof Aug. 5, 2003
6584131 ArF excimer laser device for exposure Jun. 24, 2003
6577665 Molecular fluorine laser Jun. 10, 2003
6560254 Line-narrowing module for high power laser May. 6, 2003
6553049 ArF laser with low pulse energy and high rep rate Apr. 22, 2003
RE38054 Reliable, modular, production quality narrow-band high rep rate F2 laser Apr. 1, 2003
6539042 Ultra pure component purge system for gas discharge laser Mar. 25, 2003
6522679 Gas laser discharge unit Feb. 18, 2003
6496527 Ultraviolet laser apparatus and gas for ultraviolet laser Dec. 17, 2002
6490307 Method and procedure to automatically stabilize excimer laser output parameters Dec. 3, 2002
6490308 Laser gas replenishment method Dec. 3, 2002
6487229 Beam delivery system for molecular fluorine (F2) laser Nov. 26, 2002
6480517 Shadow device for a gas laser Nov. 12, 2002
6426966 Molecular fluorine (F2) laser with narrow spectral linewidth Jul. 30, 2002
6404795 Internal wavelength calibration for tunable ArF-excimer laser using atomic carbon and molecular oxygen absorption lines Jun. 11, 2002

1 2 3

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