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Class Information
Number: 372/58
Name: Coherent light generators > Particular active media > Gas > With means for controlling gas flow
Description: Subject matter having means for moving gas through an activation area.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6819699 |
Arf excimer laser device, scanning type exposure device and ultraviolet laser device |
Nov. 16, 2004 |
| 6813301 |
Structure of reflux fan for excimer laser apparatus |
Nov. 2, 2004 |
| 6804286 |
Gas laser device |
Oct. 12, 2004 |
| 6804285 |
Gas supply path structure for a gas laser |
Oct. 12, 2004 |
| 6801554 |
Laser oscillating apparatus, exposure apparatus, and device fabrication method |
Oct. 5, 2004 |
| 6798812 |
Two chamber F2 laser system with F2 pressure based line selection |
Sep. 28, 2004 |
| 6798814 |
Gas discharge laser, method of operating a gas discharge laser, and use of a sintered filter |
Sep. 28, 2004 |
| 6795473 |
Narrow band excimer laser with a prism-grating as line-narrowing optical element |
Sep. 21, 2004 |
| 6785314 |
Electric discharge gas laser |
Aug. 31, 2004 |
| 6778584 |
High power gas discharge laser with helium purged line narrowing unit |
Aug. 17, 2004 |
| 6771684 |
Compact, flexible, rapid-pulsed, molecular gas laser |
Aug. 3, 2004 |
| 6768761 |
Gas laser oscillator |
Jul. 27, 2004 |
| 6768762 |
High repetition rate UV excimer laser |
Jul. 27, 2004 |
| 6765946 |
Fan for gas discharge laser |
Jul. 20, 2004 |
| 6763048 |
Line narrowing of molecular fluorine laser emission |
Jul. 13, 2004 |
| 6763049 |
Very high repetition rate power supply system and method |
Jul. 13, 2004 |
| 6757316 |
Four KHz gas discharge laser |
Jun. 29, 2004 |
| 6738406 |
Precision measurement of wavelengths emitted by a molecular fluorine laser at 157nm |
May. 18, 2004 |
| 6735232 |
Laser with versatile output energy |
May. 11, 2004 |
| 6721345 |
Electrostatic precipitator corona discharge ignition voltage probe for gas status detection and control system for gas discharge lasers |
Apr. 13, 2004 |
| 6717973 |
Wavelength and bandwidth monitor for excimer or molecular fluorine laser |
Apr. 6, 2004 |
| 6711202 |
Discharge laser with porous insulating layer covering anode discharge surface |
Mar. 23, 2004 |
| 6704340 |
Lithography laser system with in-place alignment tool |
Mar. 9, 2004 |
| 6704339 |
Lithography laser with beam delivery and beam pointing control |
Mar. 9, 2004 |
| 6700915 |
Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections |
Mar. 2, 2004 |
| 6693939 |
Laser lithography light source with beam delivery |
Feb. 17, 2004 |
| 6690702 |
Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube |
Feb. 10, 2004 |
| 6690704 |
Control system for a two chamber gas discharge laser |
Feb. 10, 2004 |
| 6674780 |
Gas drawing/refilling and sealing structure for gas laser |
Jan. 6, 2004 |
| 6665327 |
Gas laser device |
Dec. 16, 2003 |
| 6654403 |
Flow shaping electrode with erosion pad for gas discharge laser |
Nov. 25, 2003 |
| 6650681 |
Sealed exhaust chemical oxygen-iodine laser system |
Nov. 18, 2003 |
| 6646503 |
Circuit configuration for detecting a functional disturbance |
Nov. 11, 2003 |
| 6618421 |
High repetition rate gas discharge laser with precise pulse timing control |
Sep. 9, 2003 |
| 6609540 |
Method and apparatus for supplying fluorine gas |
Aug. 26, 2003 |
| 6603786 |
Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube |
Aug. 5, 2003 |
| 6603787 |
Discharge-pumped excimer laser device |
Aug. 5, 2003 |
| 6584131 |
ArF excimer laser device for exposure |
Jun. 24, 2003 |
| 6580742 |
Laser oscillating apparatus |
Jun. 17, 2003 |
| 6577664 |
Excimer laser device |
Jun. 10, 2003 |
| 6577665 |
Molecular fluorine laser |
Jun. 10, 2003 |
| 6577663 |
Narrow bandwidth oscillator-amplifier system |
Jun. 10, 2003 |
| 6570901 |
Excimer or molecular fluorine laser having lengthened electrodes |
May. 27, 2003 |
| 6570899 |
Gas laser device |
May. 27, 2003 |
| 6567450 |
Very narrow band, two chamber, high rep rate gas discharge laser system |
May. 20, 2003 |
| 6556609 |
Discharge unit for a high repetition rate excimer or molecular fluorine laser |
Apr. 29, 2003 |
| RE38054 |
Reliable, modular, production quality narrow-band high rep rate F2 laser |
Apr. 1, 2003 |
| 6539043 |
Discharge-pumped excimer laser device |
Mar. 25, 2003 |
| 6539042 |
Ultra pure component purge system for gas discharge laser |
Mar. 25, 2003 |
| 6535539 |
Excimer laser device |
Mar. 18, 2003 |
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