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Class Information
Number: 372/57
Name: Coherent light generators > Particular active media > Gas > Excimer or exciplex
Description: Subject matter wherein the active media is a dimer or hetero nuclear complex, which is bound in the excited state and free or essentially free in the lower state.


Patents under this class:
1 2 3 4 5 6 7 8 9 10

Patent Number Title Of Patent Date Issued
6466601 Beam seal for line narrowed production laser Oct. 15, 2002
6466602 Gas discharge laser long life electrodes Oct. 15, 2002
6466598 F2-laser with line selection Oct. 15, 2002
6466599 Discharge unit for a high repetition rate excimer or molecular fluorine laser Oct. 15, 2002
6463084 Device for on-line control of output power of vacuum-UV laser Oct. 8, 2002
6463086 Molecular fluorine laser with spectral linewidth of less than 1 pm Oct. 8, 2002
6459720 Excimer laser Oct. 1, 2002
6456642 Optical coupling device Sep. 24, 2002
6442181 Extreme repetition rate gas discharge laser Aug. 27, 2002
6430205 Discharge unit for a high repetition rate excimer or molecular fluorine laser Aug. 6, 2002
6426966 Molecular fluorine (F2) laser with narrow spectral linewidth Jul. 30, 2002
6421365 Narrow band excimer or molecular fluorine laser having an output coupling interferometer Jul. 16, 2002
6417591 Magnetic coupling mechanism for use in laser apparatus Jul. 9, 2002
6414979 Gas discharge laser with blade-dielectric electrode Jul. 2, 2002
6414978 Discharge unit for a high repetition rate excimer or molecular fluorine laser Jul. 2, 2002
6408260 Laser lithography quality alarm system Jun. 18, 2002
6404796 Laser resonator for improving narrow band emission of an excimer laser Jun. 11, 2002
6404795 Internal wavelength calibration for tunable ArF-excimer laser using atomic carbon and molecular oxygen absorption lines Jun. 11, 2002
6404794 Excimer laser apparatus Jun. 11, 2002
6396582 Wavelength reference for laser May. 28, 2002
6393042 Beam homogenizer and laser irradiation apparatus May. 21, 2002
6393040 Molecular fluorine (F2) excimer laser with reduced coherence length May. 21, 2002
6393037 Wavelength selector for laser with adjustable angular dispersion May. 21, 2002
6392743 Control technique for microlithography lasers May. 21, 2002
6389048 Detector with frequency converting coating May. 14, 2002
6381256 Molecular fluorine laser with spectral linewidth of less than 1 pm Apr. 30, 2002
6381257 Very narrow band injection seeded F2 lithography laser Apr. 30, 2002
6373869 System and method for generating coherent radiation at ultraviolet wavelengths Apr. 16, 2002
6370174 Injection seeded F2 lithography laser Apr. 9, 2002
6359922 Single chamber gas discharge laser with line narrowed seed beam Mar. 19, 2002
6345065 F2-laser with line selection Feb. 5, 2002
6337872 Once through fan for excimer laser apparatus Jan. 8, 2002
6331994 Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube Dec. 18, 2001
6330267 Performance control system and method for gas discharge lasers Dec. 11, 2001
6330261 Reliable, modular, production quality narrow-band high rep rate ArF excimer laser Dec. 11, 2001
6330260 F2 laser with visible red and IR control Dec. 11, 2001
6327290 Beam delivery system for molecular fluorine (F2) laser Dec. 4, 2001
6320892 Energy efficient lithography laser Nov. 20, 2001
6317447 Electric discharge laser with acoustic chirp correction Nov. 13, 2001
6317448 Bandwidth estimating technique for narrow band laser Nov. 13, 2001
6314119 Excimer laser with pulse and beam multiplier Nov. 6, 2001
6310903 Gas laser device and integrated gas purifying means Oct. 30, 2001
6301284 Narrow band UV laser with visible light guide laser Oct. 9, 2001
6298080 Narrow band excimer or molecular fluorine laser with adjustable bandwidth Oct. 2, 2001
6285701 Laser resonator for improving narrow band emission of an excimer laser Sep. 4, 2001
6282221 Excimer laser oscillation apparatus Aug. 28, 2001
6282222 Electron beam irradiation of gases and light source using the same Aug. 28, 2001
6272158 Method and apparatus for wavelength calibration Aug. 7, 2001
6269110 Internal wavelength calibration for tunable ArF-excimer laser using atomic carbon and molecular oxygen absorption lines Jul. 31, 2001
6243405 Very stable excimer or molecular fluorine laser Jun. 5, 2001

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