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Browse by Category: Main > Optical & Optics
Class Information
Number: 372/57
Name: Coherent light generators > Particular active media > Gas > Excimer or exciplex
Description: Subject matter wherein the active media is a dimer or hetero nuclear complex, which is bound in the excited state and free or essentially free in the lower state.


Patents under this class:
1 2 3 4 5 6 7 8 9 10

Patent Number Title Of Patent Date Issued
6768762 High repetition rate UV excimer laser Jul. 27, 2004
6768765 High power excimer or molecular fluorine laser system Jul. 27, 2004
6765946 Fan for gas discharge laser Jul. 20, 2004
6765945 Injection seeded F2 laser with pre-injection filter Jul. 20, 2004
6763048 Line narrowing of molecular fluorine laser emission Jul. 13, 2004
6763049 Very high repetition rate power supply system and method Jul. 13, 2004
6757315 Corona preionization assembly for a gas laser Jun. 29, 2004
6757316 Four KHz gas discharge laser Jun. 29, 2004
6754247 ArF excimer laser devices, KrF excimer laser devices and fluorine alser devices Jun. 22, 2004
6741627 Photolithographic molecular fluorine laser system May. 25, 2004
6738406 Precision measurement of wavelengths emitted by a molecular fluorine laser at 157nm May. 18, 2004
6735225 Chirp compensation method and apparatus May. 11, 2004
6735232 Laser with versatile output energy May. 11, 2004
6735233 Gas discharge laser with means for removing gas impurities May. 11, 2004
6735236 High power gas discharge laser with line narrowing unit May. 11, 2004
6721345 Electrostatic precipitator corona discharge ignition voltage probe for gas status detection and control system for gas discharge lasers Apr. 13, 2004
6721340 Bandwidth control technique for a laser Apr. 13, 2004
6714576 Excimer laser and method of operating an excimer laser Mar. 30, 2004
6714577 Energy stabilized gas discharge laser Mar. 30, 2004
6704339 Lithography laser with beam delivery and beam pointing control Mar. 9, 2004
6700916 E-diagnostic, laser simulator, automated testing and deconvolution of spectra for lithographic exposure radiation generating systems such as excimer or molecular fluorine laser or EUV source s Mar. 2, 2004
6700915 Narrow band excimer laser with a resonator containing an optical element for making wavefront corrections Mar. 2, 2004
6690703 Molecular fluorine laser system Feb. 10, 2004
6690706 High rep-rate laser with improved electrodes Feb. 10, 2004
6690702 Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube Feb. 10, 2004
6678291 Molecular fluorine laser Jan. 13, 2004
6671294 Laser spectral engineering for lithographic process Dec. 30, 2003
6671302 Device for self-initiated UV pre-ionization of a repetitively pulsed gas laser Dec. 30, 2003
RE38372 Narrow band excimer laser and wavelength detecting apparatus Dec. 30, 2003
6665326 Light source device Dec. 16, 2003
6661826 Laser chamber insulator with sealed electrode feedthrough Dec. 9, 2003
6650666 Laser wavelength control unit with piezoelectric driver Nov. 18, 2003
6643312 ArF excimer laser device and a fluoride laser device Nov. 4, 2003
6639929 Pulse oscillating gas laser device Oct. 28, 2003
6636546 ArF and KrF excimer laser apparatus and fluorine laser apparatus for lithography Oct. 21, 2003
6628682 Wavelength detection device for line-narrowed laser apparatus and ultra line-narrowed fluorine laser apparatus Sep. 30, 2003
6621846 Electric discharge laser with active wavelength chirp correction Sep. 16, 2003
6621847 Narrow-band excimer laser apparatus Sep. 16, 2003
6614828 Wavelength selector for laser with adjustable angular dispersion Sep. 2, 2003
6609540 Method and apparatus for supplying fluorine gas Aug. 26, 2003
6608853 Discharge electrodes structure for laser apparatus and laser apparatus therewith Aug. 19, 2003
6608848 Method and apparatus for wavelength calibration Aug. 19, 2003
6603786 Excimer laser oscillation apparatus and method, excimer laser exposure apparatus, and laser tube Aug. 5, 2003
6603787 Discharge-pumped excimer laser device Aug. 5, 2003
6603790 Gas laser and a dedusting unit thereof Aug. 5, 2003
6603789 Narrow band excimer or molecular fluorine laser with improved beam parameters Aug. 5, 2003
6603788 Resonator for single line selection Aug. 5, 2003
6594291 Ultra narrow band fluorine laser apparatus and fluorine exposure apparatus Jul. 15, 2003
6590922 Injection seeded F2 laser with line selection and discrimination Jul. 8, 2003
6590921 Narrow beam ArF excimer laser device Jul. 8, 2003

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