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Class Information
Number: 372/57
Name: Coherent light generators > Particular active media > Gas > Excimer or exciplex
Description: Subject matter wherein the active media is a dimer or hetero nuclear complex, which is bound in the excited state and free or essentially free in the lower state.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7453551 |
Increasing pulse-to-pulse radiation beam uniformity |
Nov. 18, 2008 |
| 7439530 |
LPP EUV light source drive laser system |
Oct. 21, 2008 |
| 7433372 |
Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications |
Oct. 7, 2008 |
| 7426229 |
Line narrowing module, light source of exposure apparatus comprising the same, and method of producing exposure light using line narrowing |
Sep. 16, 2008 |
| 7418022 |
Bandwidth-limited and long pulse master oscillator power oscillator laser systems |
Aug. 26, 2008 |
| 7415056 |
Confocal pulse stretcher |
Aug. 19, 2008 |
| 7408969 |
Optical cavity and laser |
Aug. 5, 2008 |
| 7382816 |
Two-stage laser pulse energy control device and two-stage laser system |
Jun. 3, 2008 |
| 7382815 |
Laser spectral engineering for lithographic process |
Jun. 3, 2008 |
| 7379487 |
Two phase reactor |
May. 27, 2008 |
| 7372887 |
Excimer laser device, laser gas exchange method and partial gas exchange quantity calculation method |
May. 13, 2008 |
| 7366213 |
MOPA excimer or molecular fluorine laser system with improved synchronization |
Apr. 29, 2008 |
| 7366219 |
Line narrowing module |
Apr. 29, 2008 |
| 7339973 |
Electrodes for fluorine gas discharge lasers |
Mar. 4, 2008 |
| 7321607 |
External optics and chamber support system |
Jan. 22, 2008 |
| 7308013 |
Excimer or molecular fluorine laser system with precision timing |
Dec. 11, 2007 |
| 7298770 |
Laser spectral engineering for lithographic process |
Nov. 20, 2007 |
| 7286574 |
Infrared laser |
Oct. 23, 2007 |
| 7283575 |
Narrow band electric discharge gas laser having improved beam direction stability |
Oct. 16, 2007 |
| 7257144 |
Rare gas-halogen excimer lasers with baffles |
Aug. 14, 2007 |
| 7230966 |
Injection locking type or MOPA type of laser device |
Jun. 12, 2007 |
| 7227881 |
Master oscillator--power amplifier excimer laser system |
Jun. 5, 2007 |
| 7209507 |
Method and apparatus for controlling the output of a gas discharge MOPA laser system |
Apr. 24, 2007 |
| 7203216 |
Timing control for two-chamber gas discharge laser system |
Apr. 10, 2007 |
| 7194015 |
Laser oscillating apparatus and laser working machine |
Mar. 20, 2007 |
| 7190708 |
Annealed copper alloy electrodes for fluorine containing gas discharge lasers |
Mar. 13, 2007 |
| 7184216 |
Optical pulse duration extender |
Feb. 27, 2007 |
| 7164703 |
Temperature control systems for excimer lasers |
Jan. 16, 2007 |
| 7158553 |
Master oscillator/power amplifier excimer laser system with pulse energy and pointing control |
Jan. 2, 2007 |
| 7154928 |
Laser output beam wavefront splitter for bandwidth spectrum control |
Dec. 26, 2006 |
| 7141806 |
EUV light source collector erosion mitigation |
Nov. 28, 2006 |
| 7142573 |
Etalon cavity with filler layer for thermal tuning |
Nov. 28, 2006 |
| 7139301 |
Laser spectral engineering for lithographic process |
Nov. 21, 2006 |
| 7122814 |
Arrangement for the stabilization of the radiation emission of a plasma |
Oct. 17, 2006 |
| 7095762 |
Laser irradiation method, laser irradiation apparatus, and semiconductor device |
Aug. 22, 2006 |
| 7088758 |
Relax gas discharge laser lithography light source |
Aug. 8, 2006 |
| 7085302 |
Laser apparatus, exposure apparatus and method |
Aug. 1, 2006 |
| 7075963 |
Tunable laser with stabilized grating |
Jul. 11, 2006 |
| 7072375 |
Line-narrowed gas laser system |
Jul. 4, 2006 |
| 7061961 |
Very narrow band, two chamber, high rep-rate gas discharge laser system |
Jun. 13, 2006 |
| 7061959 |
Laser thin film poly-silicon annealing system |
Jun. 13, 2006 |
| 7039086 |
Control system for a two chamber gas discharge laser |
May. 2, 2006 |
| 7035012 |
Optical pulse duration extender |
Apr. 25, 2006 |
| 7031364 |
Gas laser device and exposure apparatus using the same |
Apr. 18, 2006 |
| 7023893 |
Low-pressure axial direction excitation type F.sub.2 laser oscillator |
Apr. 4, 2006 |
| 7006546 |
Gas laser electrode, laser chamber employing the electrode, and gas laser device |
Feb. 28, 2006 |
| 7006547 |
Very high repetition rate narrow band gas discharge laser system |
Feb. 28, 2006 |
| 7006548 |
Excimer laser device and gas for excimer laser |
Feb. 28, 2006 |
| 6993052 |
System and method for delay compensation for a pulsed laser |
Jan. 31, 2006 |
| 6987790 |
Excimer or molecular fluorine laser with several discharge chambers |
Jan. 17, 2006 |
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