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Class Information
Number: 372/57
Name: Coherent light generators > Particular active media > Gas > Excimer or exciplex
Description: Subject matter wherein the active media is a dimer or hetero nuclear complex, which is bound in the excited state and free or essentially free in the lower state.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7620080 |
Laser pulse conditioning |
Nov. 17, 2009 |
| 7609740 |
Method and arrangement for the excitation of a gas laser arrangement |
Oct. 27, 2009 |
| 7596164 |
Control system for a two chamber gas discharge laser |
Sep. 29, 2009 |
| 7586969 |
Method for discriminating anomaly in gas composition and discharge excitation type gas laser oscillator |
Sep. 8, 2009 |
| 7577177 |
Multi-path laser system |
Aug. 18, 2009 |
| 7570683 |
Waveguided laser channels for a gas laser |
Aug. 4, 2009 |
| 7567607 |
Very narrow band, two chamber, high rep-rate gas discharge laser system |
Jul. 28, 2009 |
| 7564888 |
High power excimer laser with a pulse stretcher |
Jul. 21, 2009 |
| 7561611 |
Extended-lifetime elements for excimer lasers |
Jul. 14, 2009 |
| 7558308 |
High power low inductance RF hermetic sealed feed-through for slab CO2 lasers |
Jul. 7, 2009 |
| 7545842 |
Pre-ionizer for pulsed gas-discharge laser |
Jun. 9, 2009 |
| 7505494 |
System and method for controlling wavelength of a laser beam |
Mar. 17, 2009 |
| 7501641 |
Dual hemispherical collectors |
Mar. 10, 2009 |
| 7499482 |
Injection locking type or MOPA type of laser device |
Mar. 3, 2009 |
| 7486707 |
Optical delay module for lenghtening the propagation path of a light beam and pulse multiplication or elongation module |
Feb. 3, 2009 |
| 7482609 |
LPP EUV light source drive laser system |
Jan. 27, 2009 |
| 7480323 |
Laser tube with external adjustable reactance for a gas discharge RF-excited laser |
Jan. 20, 2009 |
| 7469000 |
Gas lasers including nanoscale catalysts and methods for producing such lasers |
Dec. 23, 2008 |
| 7453551 |
Increasing pulse-to-pulse radiation beam uniformity |
Nov. 18, 2008 |
| 7439530 |
LPP EUV light source drive laser system |
Oct. 21, 2008 |
| 7433372 |
Device and method to stabilize beam shape and symmetry for high energy pulsed laser applications |
Oct. 7, 2008 |
| 7426229 |
Line narrowing module, light source of exposure apparatus comprising the same, and method of producing exposure light using line narrowing |
Sep. 16, 2008 |
| 7418022 |
Bandwidth-limited and long pulse master oscillator power oscillator laser systems |
Aug. 26, 2008 |
| 7415056 |
Confocal pulse stretcher |
Aug. 19, 2008 |
| 7408969 |
Optical cavity and laser |
Aug. 5, 2008 |
| 7382815 |
Laser spectral engineering for lithographic process |
Jun. 3, 2008 |
| 7382816 |
Two-stage laser pulse energy control device and two-stage laser system |
Jun. 3, 2008 |
| 7379487 |
Two phase reactor |
May. 27, 2008 |
| 7372887 |
Excimer laser device, laser gas exchange method and partial gas exchange quantity calculation method |
May. 13, 2008 |
| 7366213 |
MOPA excimer or molecular fluorine laser system with improved synchronization |
Apr. 29, 2008 |
| 7366219 |
Line narrowing module |
Apr. 29, 2008 |
| 7339973 |
Electrodes for fluorine gas discharge lasers |
Mar. 4, 2008 |
| 7321607 |
External optics and chamber support system |
Jan. 22, 2008 |
| 7308013 |
Excimer or molecular fluorine laser system with precision timing |
Dec. 11, 2007 |
| 7298770 |
Laser spectral engineering for lithographic process |
Nov. 20, 2007 |
| 7286574 |
Infrared laser |
Oct. 23, 2007 |
| 7283575 |
Narrow band electric discharge gas laser having improved beam direction stability |
Oct. 16, 2007 |
| 7257144 |
Rare gas-halogen excimer lasers with baffles |
Aug. 14, 2007 |
| 7230966 |
Injection locking type or MOPA type of laser device |
Jun. 12, 2007 |
| 7227881 |
Master oscillator--power amplifier excimer laser system |
Jun. 5, 2007 |
| 7209507 |
Method and apparatus for controlling the output of a gas discharge MOPA laser system |
Apr. 24, 2007 |
| 7203216 |
Timing control for two-chamber gas discharge laser system |
Apr. 10, 2007 |
| 7194015 |
Laser oscillating apparatus and laser working machine |
Mar. 20, 2007 |
| 7190708 |
Annealed copper alloy electrodes for fluorine containing gas discharge lasers |
Mar. 13, 2007 |
| 7184216 |
Optical pulse duration extender |
Feb. 27, 2007 |
| 7164703 |
Temperature control systems for excimer lasers |
Jan. 16, 2007 |
| 7158553 |
Master oscillator/power amplifier excimer laser system with pulse energy and pointing control |
Jan. 2, 2007 |
| 7154928 |
Laser output beam wavefront splitter for bandwidth spectrum control |
Dec. 26, 2006 |
| 7141806 |
EUV light source collector erosion mitigation |
Nov. 28, 2006 |
| 7142573 |
Etalon cavity with filler layer for thermal tuning |
Nov. 28, 2006 |
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