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Class Information
Number: 359/731
Name: Optical: systems and elements > Lens > With reflecting element > Including concave or convex reflecting surface > Reflectors in series > With concave and convex reflectors in series
Description: Subject matter where the lens system includes both concave and convex reflecting elements consecutively receiving light.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7463373 |
Controller for an inkjet printer |
Dec. 9, 2008 |
| 7446952 |
Catadioptric projection objective |
Nov. 4, 2008 |
| 7414781 |
Catoptric objectives and systems using catoptric objectives |
Aug. 19, 2008 |
| 7252411 |
Device for depicting a linear optical marking |
Aug. 7, 2007 |
| 7218445 |
Microlithographic reduction projection catadioptric objective |
May. 15, 2007 |
| 7158215 |
Large field of view protection optical system with aberration correctability for flat panel displays |
Jan. 2, 2007 |
| 7088526 |
Lens collimator and method of producing optical signals with reduced aberrations |
Aug. 8, 2006 |
| 7075726 |
Projection optical system and projection exposure apparatus |
Jul. 11, 2006 |
| 7016124 |
Image-formation optical system and optical apparatus |
Mar. 21, 2006 |
| 6995886 |
Optical scanning device |
Feb. 7, 2006 |
| 6947210 |
Catoptric projection optical system, exposure apparatus and device fabrication method using same |
Sep. 20, 2005 |
| 6947189 |
Apparatus and method for optical raster-scanning in a micromechanical system |
Sep. 20, 2005 |
| 6940803 |
Optical head, recording and reproducing apparatus and solid immersion lens |
Sep. 6, 2005 |
| 6902282 |
Fast, wide-field-of-view, relayed multimirror optical system |
Jun. 7, 2005 |
| 6900951 |
Display optical system |
May. 31, 2005 |
| 6890081 |
Optical element and optical system having the same |
May. 10, 2005 |
| 6873476 |
Microlithographic reduction projection catadioptric objective |
Mar. 29, 2005 |
| 6867913 |
6-mirror microlithography projection objective |
Mar. 15, 2005 |
| 6813094 |
Surface formed complex polymer lenses diffuse reflector |
Nov. 2, 2004 |
| 6801492 |
Solid immersion mirror type objective lens and optical pickup device adopting the same |
Oct. 5, 2004 |
| 6728044 |
Zoom lens |
Apr. 27, 2004 |
| 6727980 |
Apparatus and method for pattern exposure and method for adjusting the apparatus |
Apr. 27, 2004 |
| 6637899 |
Optical element and optical system having the same |
Oct. 28, 2003 |
| 6636350 |
Microlithographic reduction projection catadioptric objective |
Oct. 21, 2003 |
| 6631036 |
Catadioptric objective |
Oct. 7, 2003 |
| 6577443 |
Reduction objective for extreme ultraviolet lithography |
Jun. 10, 2003 |
| 6560039 |
Double mirror catadioptric objective lens system with three optical surface multifunction component |
May. 6, 2003 |
| 6535340 |
Optical element and picture taking system including the optical element |
Mar. 18, 2003 |
| 6522475 |
Zoom lens |
Feb. 18, 2003 |
| 6485153 |
Exposure apparatus and method |
Nov. 26, 2002 |
| 6459530 |
Small-sized variable magnification optical system |
Oct. 1, 2002 |
| 6441957 |
Directionally adjustable telescope arrangement |
Aug. 27, 2002 |
| 6356576 |
Deep ultraviolet catadioptric anamorphic telescope |
Mar. 12, 2002 |
| 6333826 |
Omniramic optical system having central coverage means which is associated with a camera, projector, or similar article |
Dec. 25, 2001 |
| 6313942 |
Small-sized variable magnification optical system |
Nov. 6, 2001 |
| 6262826 |
Reflective optical imaging method and circuit |
Jul. 17, 2001 |
| 6262836 |
High numerical aperture ring field projection system for extreme ultraviolet lithography |
Jul. 17, 2001 |
| 6259564 |
Finder optical system |
Jul. 10, 2001 |
| 6244717 |
Reduction objective for extreme ultraviolet lithography |
Jun. 12, 2001 |
| RE37175 |
Image display apparatus |
May. 15, 2001 |
| 6188513 |
High numerical aperture ring field projection system for extreme ultraviolet lithography |
Feb. 13, 2001 |
| 6169627 |
Catadioptric microlithographic reduction objective |
Jan. 2, 2001 |
| 6169637 |
Catadioptric lens |
Jan. 2, 2001 |
| 6163400 |
Variable magnification optical system and image pickup apparatus using the same |
Dec. 19, 2000 |
| 6142641 |
Four-mirror extreme ultraviolet (EUV) lithography projection system |
Nov. 7, 2000 |
| 6118474 |
Omnidirectional imaging apparatus |
Sep. 12, 2000 |
| 6094315 |
Image-forming optical system |
Jul. 25, 2000 |
| 6084706 |
High efficiency laser pattern generator |
Jul. 4, 2000 |
| 6061188 |
Projecting printing apparatus, projection printing method, mask pattern for estimating amplitude aberrations, method of estimating the quantity of amplitude aberration, and amplitude-aberratio |
May. 9, 2000 |
| 6033079 |
High numerical aperture ring field projection system for extreme ultraviolet lithography |
Mar. 7, 2000 |
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