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Class Information
Number: 359/649
Name: Optical: systems and elements > Lens > With field curvature shaping > Projection type
Description: Subject matter wherein an image of an image plane is caused to be visible at an object plane.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7619827 |
Projection optical system and method for photolithography and exposure apparatus and method using same |
Nov. 17, 2009 |
| 7619828 |
Projection lens unit having reflection mirror in projection lens system and method of and equipment for fixing reflection mirror |
Nov. 17, 2009 |
| 7612946 |
Wide-angle lenses |
Nov. 3, 2009 |
| 7609454 |
Imaging lens system with high resolution and compact size |
Oct. 27, 2009 |
| 7609455 |
Projection optical system and method for photolithography and exposure apparatus and method using same |
Oct. 27, 2009 |
| 7589904 |
Projection type image display device |
Sep. 15, 2009 |
| 7589903 |
Projection objective adapted for use with different immersion fluids or liquids, method of conversion of such and production method |
Sep. 15, 2009 |
| 7586697 |
Lens device and lens holding method |
Sep. 8, 2009 |
| 7586687 |
Projecting optical unit and projecting type image display apparatus therewith |
Sep. 8, 2009 |
| 7580194 |
Projection lens with high resolution and reduced overall length |
Aug. 25, 2009 |
| 7580197 |
Projection optical system and method for photolithography and exposure apparatus and method using same |
Aug. 25, 2009 |
| 7580207 |
Optical apparatus comprising an optical component and an adjustment device and method for influencing a polarization state of the optical component |
Aug. 25, 2009 |
| 7576921 |
Zoom lens and image projection apparatus |
Aug. 18, 2009 |
| 7576923 |
Zoom lens and image projection apparatus having the same |
Aug. 18, 2009 |
| 7570431 |
Optical arrangement of autofocus elements for use with immersion lithography |
Aug. 4, 2009 |
| 7557997 |
Immersion objective optical system, exposure apparatus, device fabrication method, and boundary optical element |
Jul. 7, 2009 |
| 7557996 |
Projection objective |
Jul. 7, 2009 |
| 7558002 |
Projection zoom lens and projection-type display device |
Jul. 7, 2009 |
| 7551361 |
Lithography lens system and projection exposure system provided with at least one lithography lens system of this type |
Jun. 23, 2009 |
| 7551362 |
Projection optical system and method for photolithography and exposure apparatus and method using same |
Jun. 23, 2009 |
| RE40743 |
Projection exposure system having a reflective reticle |
Jun. 16, 2009 |
| 7545572 |
Projection objective with fixed focal length formed of several subassemblies for digital projection |
Jun. 9, 2009 |
| 7542217 |
Beam reshaping unit for an illumination system of a microlithographic projection exposure apparatus |
Jun. 2, 2009 |
| 7538951 |
Robust family of microdisplay projection lenses |
May. 26, 2009 |
| 7538952 |
Lithographic apparatus, aberration correction device and device manufacturing method |
May. 26, 2009 |
| 7529032 |
Projection optical system and image display apparatus |
May. 5, 2009 |
| 7529033 |
Projection lens device and projection display apparatus using the same |
May. 5, 2009 |
| 7529036 |
Projection zoom lens and projection display device |
May. 5, 2009 |
| 7511890 |
Refractive optical imaging system, in particular projection objective for microlithography |
Mar. 31, 2009 |
| 7511897 |
Projector optical system |
Mar. 31, 2009 |
| 7505209 |
Fixed-focus lens |
Mar. 17, 2009 |
| 7495840 |
Very high-aperture projection objective |
Feb. 24, 2009 |
| 7492509 |
Projection optical system |
Feb. 17, 2009 |
| 7489448 |
Optical scanning device |
Feb. 10, 2009 |
| 7474469 |
Arrangement of optical elements in a microlithographic projection exposure apparatus |
Jan. 6, 2009 |
| 7474468 |
Off-axis projection optics and extreme ultraviolet lithography apparatus employing the same |
Jan. 6, 2009 |
| 7471465 |
Optical apparatus |
Dec. 30, 2008 |
| 7466489 |
Projection objective having a high aperture and a planar end surface |
Dec. 16, 2008 |
| 7466501 |
Fixed-focus lens |
Dec. 16, 2008 |
| 7463423 |
Lithography projection objective, and a method for correcting image defects of the same |
Dec. 9, 2008 |
| 7460309 |
Variable lens and exposure system |
Dec. 2, 2008 |
| 7457042 |
Projection optical system, exposure apparatus, and exposure method |
Nov. 25, 2008 |
| 7457043 |
Projection exposure system |
Nov. 25, 2008 |
| 7453645 |
Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby |
Nov. 18, 2008 |
| 7450312 |
Optical projection lens system |
Nov. 11, 2008 |
| 7443595 |
Optical system for projector and imaging method thereof |
Oct. 28, 2008 |
| 7438424 |
Illumination optical apparatus and projection type display apparatus |
Oct. 21, 2008 |
| 7436597 |
Projection lens |
Oct. 14, 2008 |
| 7435482 |
Article or transparent component having liquid repellent layer, optical lens having liquid repellent layer and production process thereof, and projection type display apparatus using the lens |
Oct. 14, 2008 |
| 7428105 |
Objectives as a microlithography projection objective with at least one liquid lens |
Sep. 23, 2008 |
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