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Browse by Category: Main > Optical & Optics
Class Information
Number: 356/636
Name: Optics: measuring and testing > Dimension > Width or diameter > Line width
Description: Subject matter comprising means for measuring the width of a feature on a surface.










Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8703369 Method of determining focus and dose of an apparatus of optical micro-lithography Apr. 22, 2014
8576409 Method for measuring the internal space of an aircraft Nov. 5, 2013
8488128 Line edge roughness measuring technique and test structure Jul. 16, 2013
8441639 Metrology systems and methods May. 14, 2013
8355122 Non-contacting aligning method for planes in three-dimensional environment Jan. 15, 2013
8189195 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method May. 29, 2012
8142965 Method and system for measuring in patterned structures Mar. 27, 2012
8054473 Measurement method for determining dimensions of features resulting from enhanced patterning methods Nov. 8, 2011
8040497 Method and test structure for estimating focus settings in a lithography process based on CD measurements Oct. 18, 2011
8035824 Differential critical dimension and overlay metrology apparatus and measurement method Oct. 11, 2011
8007968 Substrate processing method, program, computer-readable storage medium and substrate processing system Aug. 30, 2011
7995199 Method for detection of oversized sub-resolution assist features Aug. 9, 2011
7968173 Sheet with a copy-resistant region of reduced opacity Jun. 28, 2011
7952696 Exposure measurement method and apparatus, and semiconductor device manufacturing method May. 31, 2011
7938587 Substrate processing method, computer storage medium and substrate processing system May. 10, 2011
7916284 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method Mar. 29, 2011
7883762 Double sided printed security document Feb. 8, 2011
7829852 Device having etched feature with shrinkage carryover Nov. 9, 2010
7803506 Methods of measuring critical dimensions and related devices Sep. 28, 2010
7777184 Method for photoresist characterization and analysis Aug. 17, 2010
7751046 Methods and systems for determining a critical dimension and overlay of a specimen Jul. 6, 2010
7700247 Differential critical dimension and overlay metrology apparatus and measurement method Apr. 20, 2010
7656512 Method for determining lithographic focus and exposure Feb. 2, 2010
7642019 Methods for monitoring and adjusting focus variation in a photolithographic process using test features printed from photomask test pattern images; and machine readable program storage device Jan. 5, 2010
7639371 Line profile asymmetry measurement Dec. 29, 2009
7636171 Storage media monitoring method for archive management Dec. 22, 2009
7632616 Controlling system and method for operating the same Dec. 15, 2009
7595869 Optical metrology system optimized with a plurality of design goals Sep. 29, 2009
7595482 Standard component for length measurement, method for producing the same, and electron beam metrology system using the same Sep. 29, 2009
7589845 Process control using an optical metrology system optimized with signal criteria Sep. 15, 2009
7567353 Automated process control using optical metrology and photoresist parameters Jul. 28, 2009
7564557 Apparatus and methods for detecting overlay errors using scatterometry Jul. 21, 2009
7527205 Automated package dimensioning system May. 5, 2009
7525672 Efficient characterization of symmetrically illuminated symmetric 2-D gratings Apr. 28, 2009
7522295 Consecutive measurement of structures formed on a semiconductor wafer using a polarized reflectometer Apr. 21, 2009
7518740 Evaluating a profile model to characterize a structure to be examined using optical metrology Apr. 14, 2009
7515253 System for measuring a sample with a layer containing a periodic diffracting structure Apr. 7, 2009
7515283 Parallel profile determination in optical metrology Apr. 7, 2009
7515279 Line profile asymmetry measurement Apr. 7, 2009
7483156 Method for measuring overlay and overlay mark used therefor Jan. 27, 2009
7483133 Multiple angle of incidence spectroscopic scatterometer system Jan. 27, 2009
7480062 Automated process control using parameters determined from a photomask covered by a pellicle Jan. 20, 2009
7476856 Sample dimension-measuring method and charged particle beam apparatus Jan. 13, 2009
7433037 System for measuring periodic structures Oct. 7, 2008
7430052 Method for correlating the line width roughness of gratings and method for measurement Sep. 30, 2008
7423269 Automated feature analysis with off-axis tilting Sep. 9, 2008
7417750 Consecutive measurement of structures formed on a semiconductor wafer using an angle-resolved spectroscopic scatterometer Aug. 26, 2008
7409309 Method of deciding the quality of the measurement value by the edge width Aug. 5, 2008
7405032 Combination of non-lithographic shrink techniques and trim process for gate formation and line-edge roughness reduction Jul. 29, 2008
7391524 System and method for efficient characterization of diffracting structures with incident plane parallel to grating lines Jun. 24, 2008

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