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Class Information
Number: 356/630
Name: Optics: measuring and testing > Dimension > Thickness
Description: Subject matter comprising means to measure the distance between opposite surfaces in a direction perpendicular to the length and breath of an object.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6396590 |
Process and system for determination of layer thickness swell of wood composites |
May. 28, 2002 |
| 6381009 |
Elemental concentration measuring methods and instruments |
Apr. 30, 2002 |
| 6381019 |
Ultrasonic generator and detector using an optical mask having a grating for launching a plurality of spatially distributed, time varying strain pulses in a sample |
Apr. 30, 2002 |
| 6368182 |
Apparatus for optical inspection of wafers during polishing |
Apr. 9, 2002 |
| 6366861 |
Method of determining a wafer characteristic using a film thickness monitor |
Apr. 2, 2002 |
| 6348967 |
Method and device for measuring the thickness of opaque and transparent films |
Feb. 19, 2002 |
| 6331890 |
Thickness measuring apparatus, substrate processing method, and substrate processing apparatus |
Dec. 18, 2001 |
| 6307627 |
Optical measurement system using polarized light |
Oct. 23, 2001 |
| 6301006 |
Endpoint detector and method for measuring a change in wafer thickness |
Oct. 9, 2001 |
| 6292265 |
Method and apparatus for monitoring a chemical mechanical planarization process applied to metal-based patterned objects |
Sep. 18, 2001 |
| 6285451 |
Noncontacting optical method for determining thickness and related apparatus |
Sep. 4, 2001 |
| 6281679 |
Web thickness measurement system |
Aug. 28, 2001 |
| 6271921 |
Optical stress generator and detector |
Aug. 7, 2001 |
| 6268919 |
System and method for measuring thin film properties and analyzing two-dimensional histograms using and/not operations |
Jul. 31, 2001 |
| 6256100 |
Method and device for measuring the thickness of thin films near a sample's edge and in a damascene-type structure |
Jul. 3, 2001 |
| 6229610 |
System and method for measuring thin film properties and analyzing two-dimensional histograms using substraction operation |
May. 8, 2001 |
| 6225638 |
Disc discrimination device and disc discrimination method |
May. 1, 2001 |
| 6226086 |
Thickness monitoring |
May. 1, 2001 |
| 6222199 |
Ultrathin layer measurement having a controlled ambient of light path |
Apr. 24, 2001 |
| 6215553 |
Width measurement of an image-bearing sheet |
Apr. 10, 2001 |
| 6204771 |
Load indicating fastener systems method and apparatus |
Mar. 20, 2001 |
| 6204922 |
Rapid and accurate thin film measurement of individual layers in a multi-layered or patterned sample |
Mar. 20, 2001 |
| 6201253 |
Method and apparatus for detecting a planarized outer layer of a semiconductor wafer with a confocal optical system |
Mar. 13, 2001 |
| 6198533 |
High temperature thin film property measurement system and method |
Mar. 6, 2001 |
| 6188478 |
Method and apparatus for film-thickness measurements |
Feb. 13, 2001 |
| 6184986 |
Depositing a material of controlled, variable thickness across a surface for planarization of that surface |
Feb. 6, 2001 |
| 6175416 |
Optical stress generator and detector |
Jan. 16, 2001 |
| 6172756 |
Rapid and accurate end point detection in a noisy environment |
Jan. 9, 2001 |
| 6160621 |
Method and apparatus for in-situ monitoring of plasma etch and deposition processes using a pulsed broadband light source |
Dec. 12, 2000 |
| 6154283 |
Method for evaluating quality of liquid repellent film |
Nov. 28, 2000 |
| 6151119 |
Apparatus and method for determining depth profile characteristics of a dopant material in a semiconductor device |
Nov. 21, 2000 |
| 6142855 |
Polishing apparatus and polishing method |
Nov. 7, 2000 |
| 6144454 |
Method for the characterization of lacquer coated plastic surfaces |
Nov. 7, 2000 |
| 6140662 |
Sensing system and method |
Oct. 31, 2000 |
| 6137115 |
Film inspecting apparatus |
Oct. 24, 2000 |
| 6134011 |
Optical measurement system using polarized light |
Oct. 17, 2000 |
| 6130749 |
System and method for measuring thin film properties and analyzing two-dimensional histograms using a symmetry operation |
Oct. 10, 2000 |
| 6128084 |
Evaluation method of semiconductor layer, method for fabricating semiconductor device, and storage medium |
Oct. 3, 2000 |
| 6128087 |
System for evaluating thin film coatings |
Oct. 3, 2000 |
| 6122064 |
Method for measuring thickness of films |
Sep. 19, 2000 |
| 6111649 |
Thickness measuring apparatus using light from slit |
Aug. 29, 2000 |
| 6111648 |
Black roll for optical measurement, thin film forming apparatus including the dame, and thin film forming method using the same |
Aug. 29, 2000 |
| 6111634 |
Method and apparatus for in-situ monitoring of thickness using a multi-wavelength spectrometer during chemical-mechanical polishing |
Aug. 29, 2000 |
| 6108091 |
Method and apparatus for in-situ monitoring of thickness during chemical-mechanical polishing |
Aug. 22, 2000 |
| 6108092 |
Method and apparatus for detecting the endpoint in chemical-mechanical polishing of semiconductor wafers |
Aug. 22, 2000 |
| 6100986 |
Arrangement for optic measuring of both width and thickness of an object moving along a straight path |
Aug. 8, 2000 |
| 6100985 |
Method and apparatus for measurements of patterned structures |
Aug. 8, 2000 |
| 6091485 |
Method and apparatus for optically determining physical parameters of underlayers |
Jul. 18, 2000 |
| 6088110 |
Digital range sensor system |
Jul. 11, 2000 |
| 6075606 |
Endpoint detector and method for measuring a change in wafer thickness in chemical-mechanical polishing of semiconductor wafers and other microelectronic substrates |
Jun. 13, 2000 |
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