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Class Information
Number: 356/630
Name: Optics: measuring and testing > Dimension > Thickness
Description: Subject matter comprising means to measure the distance between opposite surfaces in a direction perpendicular to the length and breath of an object.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6992781 |
Film thickness measuring method and measuring apparatus for organic thin film for use in organic electroluminesce device |
Jan. 31, 2006 |
| 6987572 |
Methods and systems for lithography process control |
Jan. 17, 2006 |
| 6982797 |
Apparatus for devices for determining properties of applied layers |
Jan. 3, 2006 |
| 6972853 |
Methods of calibrating and controlling stepper exposure processes and tools, and system for accomplishing same |
Dec. 6, 2005 |
| 6970256 |
Apparatus and methods for measuring thickness and refractive index |
Nov. 29, 2005 |
| 6967726 |
Means for in-place automated calibration of optically-based thickness sensor |
Nov. 22, 2005 |
| 6963407 |
Process end point detection apparatus and method, polishing apparatus, semiconductor device manufacturing method, and recording medium recorded with signal processing program |
Nov. 8, 2005 |
| 6961133 |
Method and apparatus for non-contact thickness measurement |
Nov. 1, 2005 |
| 6956660 |
System and method for measuring properties of an object using a phase difference between two reflected light signals |
Oct. 18, 2005 |
| 6952231 |
Apparatus based on a telecentric imaging system for forming an image of a linear zone of an object |
Oct. 4, 2005 |
| 6950196 |
Methods and systems for determining a thickness of a structure on a specimen and at least one additional property of the specimen |
Sep. 27, 2005 |
| 6950186 |
Polarization analyzing method |
Sep. 27, 2005 |
| 6946394 |
Methods and systems for determining a characteristic of a layer formed on a specimen by a deposition process |
Sep. 20, 2005 |
| 6943902 |
Method for the quality control of material layers |
Sep. 13, 2005 |
| 6940604 |
Thin-film inspection method and device |
Sep. 6, 2005 |
| 6940592 |
Calibration as well as measurement on the same workpiece during fabrication |
Sep. 6, 2005 |
| 6937352 |
Positioning device for RAM testing system |
Aug. 30, 2005 |
| 6937351 |
Non-destructive method of measuring the thickness of a semiconductor wafer |
Aug. 30, 2005 |
| 6937333 |
Apparatus for measuring film thickness formed on object, apparatus and method of measuring spectral reflectance of object, and apparatus and method of inspecting foreign material on object |
Aug. 30, 2005 |
| 6937350 |
Apparatus and methods for optically monitoring thickness |
Aug. 30, 2005 |
| 6934040 |
Optical techniques for measuring layer thicknesses and other surface characteristics of objects such as semiconductor wafers |
Aug. 23, 2005 |
| 6934025 |
Thin film optical measurement system and method with calibrating ellipsometer |
Aug. 23, 2005 |
| 6927864 |
Method and system for determining dimensions of optically recognizable features |
Aug. 9, 2005 |
| 6922253 |
Planarizing machines and control systems for mechanical and/or chemical-mechanical planarization of microelectronic substrates |
Jul. 26, 2005 |
| 6922252 |
Automated positioning method for contouring measurements using a mobile range measurement system |
Jul. 26, 2005 |
| 6917433 |
Methods and systems for determining a property of a specimen prior to, during, or subsequent to an etch process |
Jul. 12, 2005 |
| 6912056 |
Apparatus and method for measuring each thickness of a multilayer stacked on a substrate |
Jun. 28, 2005 |
| 6903358 |
Paper thickness detecting device |
Jun. 7, 2005 |
| 6900892 |
Parametric profiling using optical spectroscopic systems |
May. 31, 2005 |
| 6897964 |
Thickness measuring apparatus, thickness measuring method, and wet etching apparatus and wet etching method utilizing them |
May. 24, 2005 |
| 6891629 |
Method and apparatus for detecting a substrate feature |
May. 10, 2005 |
| 6885466 |
Method for measuring thickness of oxide film |
Apr. 26, 2005 |
| 6885467 |
Method and apparatus for thickness decomposition of complicated layer structures |
Apr. 26, 2005 |
| 6882437 |
Method of detecting the thickness of thin film disks or wafers |
Apr. 19, 2005 |
| 6882421 |
Apparatus for optical measurements of nitrogen concentration in thin films |
Apr. 19, 2005 |
| 6879744 |
Optical monitoring of thin film deposition |
Apr. 12, 2005 |
| 6876454 |
Apparatus and method for in-situ endpoint detection for chemical mechanical polishing operations |
Apr. 5, 2005 |
| 6859282 |
Optical probe for determining the fat/lean interface in cuts of meat |
Feb. 22, 2005 |
| 6849859 |
Fabrication of precision optics using an imbedded reference surface |
Feb. 1, 2005 |
| 6850322 |
Method and apparatus for controlling wafer thickness uniformity in a multi-zone vertical furnace |
Feb. 1, 2005 |
| 6847463 |
Method and apparatus for detecting the presence and thickness of carbon and oxide layers on EUV reflective surfaces |
Jan. 25, 2005 |
| 6836324 |
Method and apparatus for measurements of patterned structures |
Dec. 28, 2004 |
| 6831742 |
Monitoring substrate processing using reflected radiation |
Dec. 14, 2004 |
| 6825938 |
Film thickness measuring method and step measuring method |
Nov. 30, 2004 |
| 6808942 |
Method for controlling a critical dimension (CD) in an etch process |
Oct. 26, 2004 |
| 6806971 |
Method and apparatus for process control in semiconductor manufacture |
Oct. 19, 2004 |
| 6806969 |
Optical measurement for measuring a small space through a transparent surface |
Oct. 19, 2004 |
| 6806970 |
Thin film thickness measuring method and apparatus, and method and apparatus for manufacturing a thin film device using the same |
Oct. 19, 2004 |
| 6801875 |
Methods, systems, and software for performing measurements |
Oct. 5, 2004 |
| 6801326 |
Method and apparatus for monitoring a chemical mechanical planarization process applied to metal-based patterned objects |
Oct. 5, 2004 |
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