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Class Information
Number: 356/509
Name: Optics: measuring and testing > By light interference (e.g., interferometer) > For dimensional measurement > For orientation or alignment > Between mask and wafer
Description: Orientation or alignment wherein a reference plane is a mask and a surface is a wafer.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7567699 |
Center determination of rotationally symmetrical alignment marks |
Jul. 28, 2009 |
| 7528962 |
Apparatus and methods for reducing non-cyclic non-linear errors in interferometry |
May. 5, 2009 |
| 7528961 |
Compensation of turbulent effects of gas in measurement paths of multi-axis interferometers |
May. 5, 2009 |
| 7511826 |
Symmetrical illumination forming system and method |
Mar. 31, 2009 |
| 7433051 |
Determination of lithography misalignment based on curvature and stress mapping data of substrates |
Oct. 7, 2008 |
| 7423725 |
Lithographic method |
Sep. 9, 2008 |
| 7379190 |
Stage alignment in lithography tools |
May. 27, 2008 |
| 7349069 |
Lithographic apparatus and positioning apparatus |
Mar. 25, 2008 |
| 7349101 |
Lithographic apparatus, overlay detector, device manufacturing method, and device manufactured thereby |
Mar. 25, 2008 |
| 7319506 |
Alignment system and method |
Jan. 15, 2008 |
| 7247843 |
Long-range gap detection with interferometric sensitivity using spatial phase of interference patterns |
Jul. 24, 2007 |
| 7193726 |
Optical interferometry |
Mar. 20, 2007 |
| 7120514 |
Method and apparatus for performing field-to-field compensation |
Oct. 10, 2006 |
| 7095499 |
Method of measuring alignment of a substrate with respect to a reference alignment mark |
Aug. 22, 2006 |
| 6961116 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
Nov. 1, 2005 |
| 6937334 |
Method of measuring alignment of a substrate with respect to a reference alignment mark |
Aug. 30, 2005 |
| 6906784 |
Spatial filtering in interferometry |
Jun. 14, 2005 |
| 6856931 |
Mark detection method and unit, exposure method and apparatus, and device manufacturing method and device |
Feb. 15, 2005 |
| 6819434 |
Multi-axis interferometer |
Nov. 16, 2004 |
| 6806961 |
Interferometric cyclic error compensation |
Oct. 19, 2004 |
| 6798505 |
Method and apparatus for article inspection including speckle reduction |
Sep. 28, 2004 |
| 6791693 |
Multiple-pass interferometry |
Sep. 14, 2004 |
| 6762845 |
Multiple-pass interferometry |
Jul. 13, 2004 |
| 6700667 |
Exposure apparatus and method |
Mar. 2, 2004 |
| 6649923 |
Positional deviation detecting method and device manufacturing method using the same |
Nov. 18, 2003 |
| 6628406 |
Self referencing mark independent alignment sensor |
Sep. 30, 2003 |
| 6628390 |
Wafer alignment sensor using a phase-shifted microlens array |
Sep. 30, 2003 |
| 6556294 |
Method of and apparatus for article inspection including speckle reduction |
Apr. 29, 2003 |
| 6552798 |
Position detecting method and system for use in exposure apparatus |
Apr. 22, 2003 |
| 6462828 |
Exposure apparatus |
Oct. 8, 2002 |
| 6211965 |
Photolithographic position measuring laser interferometer with relitively moving measuring intereometer |
Apr. 3, 2001 |
| 6046792 |
Differential interferometer system and lithographic step-and-scan apparatus provided with such a system |
Apr. 4, 2000 |
| 6020964 |
Interferometer system and lithograph apparatus including an interferometer system |
Feb. 1, 2000 |
| 5978094 |
Alignment device and method based on imaging characteristics of the image pickup system |
Nov. 2, 1999 |
| 5963324 |
Exposure apparatus and method responsive to light beam wavelength variation |
Oct. 5, 1999 |
| 5959732 |
Stage apparatus and a stage control method |
Sep. 28, 1999 |
| 5920430 |
Lensless joint transform optical correlator for precision industrial positioning systems |
Jul. 6, 1999 |
| 5850291 |
Projection exposure apparatus and method for controlling a stage on the basis of a value corrected by ABBE error |
Dec. 15, 1998 |
| 5838449 |
Optical apparatus |
Nov. 17, 1998 |
| 5808742 |
Optical alignment apparatus having multiple parallel alignment marks |
Sep. 15, 1998 |
| 5801833 |
Method of producing master and working pattern plates for etching and photolithographic apparatus therefor |
Sep. 1, 1998 |
| 5801832 |
Method of and device for repetitively imaging a mask pattern on a substrate using five measuring axes |
Sep. 1, 1998 |
| 5796483 |
Method and apparatus for position sensing |
Aug. 18, 1998 |
| 5790253 |
Method and apparatus for correcting linearity errors of a moving mirror and stage |
Aug. 4, 1998 |
| 5784166 |
Position resolution of an interferometrially controlled moving stage by regression analysis |
Jul. 21, 1998 |
| 5757160 |
Moving interferometer wafer stage |
May. 26, 1998 |
| 5689339 |
Alignment apparatus |
Nov. 18, 1997 |
| 5686997 |
Scanning projection exposure method and projection exposure apparatus |
Nov. 11, 1997 |
| 5621499 |
Scanning exposure apparatus |
Apr. 15, 1997 |
| 5610718 |
Apparatus and method for detecting a relative displacement between first and second diffraction gratings arranged close to each other wherein said gratings have different pitch sizes |
Mar. 11, 1997 |
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