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Class Information
Number: 356/503
Name: Optics: measuring and testing > By light interference (e.g., interferometer) > For dimensional measurement > Thickness
Description: Dimensional measurement including measurement of an extent of an object in its smallest direction.

Sub-classes under this class:

Class Number Class Name Patents
356/504 Refraction from surfaces of different refractive index 176

Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8681340 Microvolume analysis system Mar. 25, 2014
8670128 Profile measuring apparatus Mar. 11, 2014
8670124 Apparatus and method for converting sensor input signals into digital output signals Mar. 11, 2014
8654343 Interference measurement apparatus and method for measuring interference Feb. 18, 2014
8649023 Film thickness measurement device and measurement method Feb. 11, 2014
8619263 Film thickness measuring apparatus using interference and film thickness measuring method using interference Dec. 31, 2013
8554356 Processing end point detection method, polishing method, and polishing apparatus Oct. 8, 2013
8554503 Method for calibrating a thickness gauge Oct. 8, 2013
8537369 Method and apparatus for measuring the shape and thickness variation of a wafer by two single-shot phase-shifting interferometers Sep. 17, 2013
8462350 Optically enhanced holographic interferometric testing methods for the development and evaluation of semiconductor devices, materials, wafers, and for monitoring all phases of development and Jun. 11, 2013
8426857 Semiconductor device and method for producing the same Apr. 23, 2013
8300232 Method of measuring coating thickness using infrared light Oct. 30, 2012
8279447 Method for measuring thickness Oct. 2, 2012
8199332 Apparatus for measuring thickness Jun. 12, 2012
8184300 Method and apparatus for reducing probe wavelength in laser excited surface acoustic wave spectroscopy May. 22, 2012
8174708 Analysis of molecular interactions on and/or in thin layers May. 8, 2012
8138483 Method of measuring phase of phase shift mask Mar. 20, 2012
8139228 Methods for optically enhanced holographic interferometric testing for test and evaluation of semiconductor devices and materials Mar. 20, 2012
8130382 Determining endpoint in a substrate process Mar. 6, 2012
8112146 Three-dimensional imaging using a luminescent surface and a differentially attenuating medium Feb. 7, 2012
8068234 Method and apparatus for measuring shape or thickness information of a substrate Nov. 29, 2011
7978336 Three wavelength quantitative imaging systems Jul. 12, 2011
7969581 Determining endpoint in a substrate process Jun. 28, 2011
7920274 Method of measuring topology of functional liquid droplet in pixel, topology measuring apparatus of functional liquid in pixel, liquid ejection apparatus, method of manufacturing electro-optic Apr. 5, 2011
7876438 Apparatus and methods for determining overlay and uses of same Jan. 25, 2011
7864339 Method for the contactless measurement of three-dimensional objects with two layers by single-view backlit shadowgraphy Jan. 4, 2011
7852488 Method and device for characterising a structure by wavelength effect in a photoacoustic system Dec. 14, 2010
7847954 Measuring the shape and thickness variation of a wafer with high slopes Dec. 7, 2010
7808651 Determining endpoint in a substrate process Oct. 5, 2010
7790480 Method for determining relative swing curve amplitude Sep. 7, 2010
7755768 Apparatus for and a method of determining a characteristic of a layer or layers Jul. 13, 2010
7733499 Method for optically testing semiconductor devices Jun. 8, 2010
7710579 Measuring method and apparatus for measuring depth of trench pattern May. 4, 2010
7711217 Active sensor, multipoint active sensor, method for diagnosing deterioration of pipe, and apparatus for diagnosing deterioration of pipe, and apparatus for diagnosis deterioration of pipe May. 4, 2010
7667852 Measuring the shape, thickness variation, and material inhomogeneity of a wafer Feb. 23, 2010
7651873 Method relating to the accurate positioning of a semiconductor wafer Jan. 26, 2010
7652774 Interferometric endpoint determination in a substrate etching process Jan. 26, 2010
7612891 Measurement of thin films using fourier amplitude Nov. 3, 2009
7545510 Method of characterizing transparent thin-films using differential optical sectioning interference microscopy Jun. 9, 2009
7522287 Photothermal conversion measurement apparatus, photothermal conversion measurement method, and sample cell Apr. 21, 2009
7495772 Multi-cavity Fabry-Perot interferometric thin-film sensor with built-in temperature compensation Feb. 24, 2009
7492465 Method for determining optimal resist thickness Feb. 17, 2009
7477408 System and method for thickness measurement Jan. 13, 2009
7471396 Dual polarization interferometers for measuring opposite sides of a workpiece Dec. 30, 2008
7466428 Method of measuring thickness of thin layer in semiconductor device and apparatus for performing method Dec. 16, 2008
7446881 System, apparatus, and method for determining temperature/thickness of an object using light interference measurements Nov. 4, 2008
7428057 Interferometer for determining characteristics of an object surface, including processing and calibration Sep. 23, 2008
7426039 Optically balanced instrument for high accuracy measurement of dimensional change Sep. 16, 2008
7417743 Interferometry systems and methods Aug. 26, 2008
7411684 Film thickness measuring method of member to be processed using emission spectroscopy and processing method of the member using the measuring method Aug. 12, 2008

1 2 3 4 5

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