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Class Information
Number: 356/399
Name: Optics: measuring and testing > By alignment in lateral direction
Description: Subject matter where two objects or an object and a light beam are laterally aligned by displacing the objects along an axis essentially normal to the line connecting them or displacing the object and light beam along an axis essentially normal to the light beam.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5848868 |
Wafer conveying apparatus |
Dec. 15, 1998 |
| 5850279 |
Alignment method, projection exposure method, and projection exposure apparatus |
Dec. 15, 1998 |
| 5844683 |
Position sensor system for substrate holders |
Dec. 1, 1998 |
| 5841544 |
Method for positioning optical subassembly for testing |
Nov. 24, 1998 |
| 5839829 |
Aiming adjustment technique for a dual light source aiming mechanism of an infrared heat sensor |
Nov. 24, 1998 |
| 5838449 |
Optical apparatus |
Nov. 17, 1998 |
| 5836694 |
Laser and scope aiming mechanism for a hand-held temperature measuring unit |
Nov. 17, 1998 |
| 5838450 |
Direct reticle to wafer alignment using fluorescence for integrated circuit lithography |
Nov. 17, 1998 |
| 5835227 |
Method and apparatus for determining performance characteristics in lithographic tools |
Nov. 10, 1998 |
| 5835196 |
System and method for alignment of integrated circuits multiple layers |
Nov. 10, 1998 |
| 5830610 |
Method for measuring alignment accuracy in a step and repeat system utilizing different intervals |
Nov. 3, 1998 |
| 5831738 |
Apparatus and methods for viewing identification marks on semiconductor wafers |
Nov. 3, 1998 |
| 5823678 |
Light source aiming system and method for hand-held temperature measuring unit |
Oct. 20, 1998 |
| 5825043 |
Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus |
Oct. 20, 1998 |
| 5823679 |
Method and apparatus for measuring temperature including aiming light |
Oct. 20, 1998 |
| 5818633 |
Laser leveling target with fresnel lens system |
Oct. 6, 1998 |
| 5808910 |
Alignment method |
Sep. 15, 1998 |
| 5798498 |
Method and apparatus for applying laser beams to a working surface, particularly for ablating tissue |
Aug. 25, 1998 |
| 5796485 |
Method and device for the measurement of off-center rotating components |
Aug. 18, 1998 |
| 5796488 |
Optical target alignment and technique |
Aug. 18, 1998 |
| 5793471 |
Projection exposure method and apparatus in which scanning exposure is performed in accordance with a shot layout of mask patterns |
Aug. 11, 1998 |
| 5784182 |
Directional sight for instruments |
Jul. 21, 1998 |
| 5777722 |
Scanning exposure apparatus and method |
Jul. 7, 1998 |
| 5777747 |
Process for positioning a mask relative to a workpiece and device for performing the process |
Jul. 7, 1998 |
| 5774205 |
Exposure and method which tests optical characteristics of optical elements in a projection lens system prior to exposure |
Jun. 30, 1998 |
| 5773180 |
Measuring method of a relative positional deviation of reticle pattern |
Jun. 30, 1998 |
| 5770338 |
Phase shifting overlay mark that measures exposure energy and focus |
Jun. 23, 1998 |
| 5766809 |
Method for testing overlay in a semiconductor device utilizing inclined measuring mark |
Jun. 16, 1998 |
| 5760879 |
Method of detecting coma of projection optical system |
Jun. 2, 1998 |
| 5760878 |
Exposure apparatus and alignment discrimination method |
Jun. 2, 1998 |
| 5757480 |
Method for laser alignment in mask repair |
May. 26, 1998 |
| 5754299 |
Inspection apparatus and method for optical system, exposure apparatus provided with the inspection apparatus, and alignment apparatus and optical system thereof applicable to the exposure app |
May. 19, 1998 |
| 5748323 |
Method and apparatus for wafer-focusing |
May. 5, 1998 |
| 5747200 |
Mask structure having offset patterns for alignment |
May. 5, 1998 |
| 5742397 |
Control device of the position and slope of a target |
Apr. 21, 1998 |
| 5731113 |
Method of reducing registration error in exposure step of semiconductor device |
Mar. 24, 1998 |
| 5729331 |
Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
Mar. 17, 1998 |
| 5727880 |
Method and apparatus for measuring temperature using infrared techniques |
Mar. 17, 1998 |
| 5726757 |
Alignment method |
Mar. 10, 1998 |
| 5726739 |
Projection exposure apparatus and device manufacturing method using the same |
Mar. 10, 1998 |
| 5721607 |
Alignment method and apparatus |
Feb. 24, 1998 |
| 5715063 |
Projection exposure method |
Feb. 3, 1998 |
| 5712707 |
Edge overlay measurement target for sub-0.5 micron ground rules |
Jan. 27, 1998 |
| 5706091 |
Apparatus for detecting a mark pattern on a substrate |
Jan. 6, 1998 |
| 5699193 |
Apparatus and method for the accurate positioning of components for flip-chip mounting |
Dec. 16, 1997 |
| 5699145 |
Scanning type exposure apparatus |
Dec. 16, 1997 |
| 5696590 |
Position control method position control apparatus, and semiconductor manufacturing apparatus |
Dec. 9, 1997 |
| 5694214 |
Surface inspection method and apparatus |
Dec. 2, 1997 |
| 5686991 |
Positioning apparatus having the interferometer and accelerometer positioned such that there signals are in phase |
Nov. 11, 1997 |
| 5686996 |
Device and method for aligning a laser |
Nov. 11, 1997 |
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