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Class Information
Number: 355/77
Name: Photocopying > Projection printing and copying cameras > Methods
Description: Subject matter including process steps for use in projecting an image of the subject matter on an original sheet or film strip onto a photosensitive paper to make a copy of the original.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7619717 |
Method for performing a focus test and a device manufacturing method |
Nov. 17, 2009 |
| 7619716 |
Exposure method |
Nov. 17, 2009 |
| 7618755 |
Method and system for automatically detecting exposed substrates having a high probability for defocused exposure fields |
Nov. 17, 2009 |
| 7612865 |
Pattern writing apparatus and pattern writing method |
Nov. 3, 2009 |
| 7609361 |
Substrate processing method and substrate processing system |
Oct. 27, 2009 |
| 7605907 |
Method of forming a substrate for use in calibrating a metrology tool, calibration substrate and metrology tool calibration method |
Oct. 20, 2009 |
| 7602475 |
System and method for providing modified illumination intensity |
Oct. 13, 2009 |
| 7598507 |
Adjustable lithography blocking device and method |
Oct. 6, 2009 |
| 7589821 |
Exposure apparatus and device manufacturing method |
Sep. 15, 2009 |
| 7589820 |
Exposure apparatus and method for producing device |
Sep. 15, 2009 |
| 7589819 |
Method for the generation of variable pitch nested lines and/or contact holes using fixed size pixels for direct-write lithographic systems |
Sep. 15, 2009 |
| 7583362 |
Stray light feedback for dose control in semiconductor lithography systems |
Sep. 1, 2009 |
| 7583359 |
Reduction of fit error due to non-uniform sample distribution |
Sep. 1, 2009 |
| 7583358 |
Systems and methods for retrieving residual liquid during immersion lens photolithography |
Sep. 1, 2009 |
| 7580113 |
Method of reducing a wave front aberration, and computer program product |
Aug. 25, 2009 |
| 7580112 |
Containment system for immersion fluid in an immersion lithography apparatus |
Aug. 25, 2009 |
| 7573560 |
Supporting plate, stage device, exposure apparatus, and exposure method |
Aug. 11, 2009 |
| 7564556 |
Method and apparatus for lens contamination control |
Jul. 21, 2009 |
| 7564535 |
Seamless exposure with projection system comprises array of micromirrors with predefined reflectivity variations |
Jul. 21, 2009 |
| 7564534 |
Alignment system and method |
Jul. 21, 2009 |
| 7563562 |
Lithographic apparatus and device manufacturing method |
Jul. 21, 2009 |
| 7561250 |
Lithographic apparatus having parts with a coated film adhered thereto |
Jul. 14, 2009 |
| 7557900 |
Exposure apparatus, device manufacturing method, maintenance method, and exposure method |
Jul. 7, 2009 |
| 7545497 |
Alignment routine for optically based tools |
Jun. 9, 2009 |
| 7544960 |
Evaluation method and fabrication method of optical element having multilayer film, exposure apparatus having the multilayer film, and device fabrication method |
Jun. 9, 2009 |
| 7542141 |
Stage controller and exposure method in which position of the stage is controlled based on position measurements of first and second laser interferometers |
Jun. 2, 2009 |
| 7538853 |
Exposure process and apparatus using glass photomasks |
May. 26, 2009 |
| 7535550 |
Exposure apparatus, exposure method, and method for producing device |
May. 19, 2009 |
| 7525646 |
Multiple pattern generator integration with single post expose bake station |
Apr. 28, 2009 |
| 7522266 |
Lithographic apparatus and device manufacturing method |
Apr. 21, 2009 |
| 7522261 |
Lithographic apparatus and device manufacturing method |
Apr. 21, 2009 |
| 7518703 |
Lithographic apparatus and method |
Apr. 14, 2009 |
| 7515249 |
Substrate carrying apparatus, exposure apparatus, and device manufacturing method |
Apr. 7, 2009 |
| 7515245 |
Lithographic apparatus and device manufacturing method |
Apr. 7, 2009 |
| 7511797 |
Lithography system, control system and device manufacturing method |
Mar. 31, 2009 |
| 7505113 |
Lithographic apparatus and device manufacturing method |
Mar. 17, 2009 |
| 7502097 |
Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly |
Mar. 10, 2009 |
| 7499147 |
Generation method of light intensity distribution, generation apparatus of light intensity distribution, and light modulation element assembly |
Mar. 3, 2009 |
| 7495745 |
Patterning method and computer readable medium therefor |
Feb. 24, 2009 |
| 7495742 |
Measuring method and apparatus, exposure method and apparatus using the same, and device manufacturing method |
Feb. 24, 2009 |
| 7486381 |
Lithographic apparatus and device manufacturing method |
Feb. 3, 2009 |
| 7486380 |
Wafer table for immersion lithography |
Feb. 3, 2009 |
| 7486379 |
Exposure apparatus, method applied to the apparatus, and device manufacturing method |
Feb. 3, 2009 |
| 7483117 |
Exposure method, exposure apparatus, and method for producing device |
Jan. 27, 2009 |
| 7482110 |
Method for adapting structure dimensions during the photolithographic projection of a pattern of structure elements onto a semiconductor wafer |
Jan. 27, 2009 |
| 7477403 |
Optical position assessment apparatus and method |
Jan. 13, 2009 |
| 7477390 |
Exposure method and apparatus, and device manufacturing method |
Jan. 13, 2009 |
| 7477370 |
Method of detecting incomplete edge bead removal from a disk-like object |
Jan. 13, 2009 |
| 7477353 |
Lithography apparatus, method of forming pattern and method of manufacturing semiconductor device |
Jan. 13, 2009 |
| 7474386 |
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method |
Jan. 6, 2009 |
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