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Class Information
Number: 355/76
Name: Photocopying > Projection printing and copying cameras > Detailed holder for original > Including vacuum, fluid or spring pressure
Description: Subject matter wherein the object is held by air or atmospheric pressure caused either by forming a partial vacuum on one side of the object or by blowing air against the object; or wherein the object is held between two members which are being pushed toward each other by a coil or leaf spring.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7605908 |
Near-field exposure mask, near-field exposure apparatus, and near-field exposure method |
Oct. 20, 2009 |
| 7592108 |
Method of detecting relative position of exposure mask and object to be exposed, alignment method, and exposure method using the same |
Sep. 22, 2009 |
| 7525645 |
Exposure apparatus and method, and mask stage therefor |
Apr. 28, 2009 |
| 7428084 |
Scanner with removable image guides |
Sep. 23, 2008 |
| 7423733 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby with docking system for positioning a patterning device |
Sep. 9, 2008 |
| 7315354 |
Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method |
Jan. 1, 2008 |
| 7312853 |
Exposure apparatus and exposing method for elastically deforming a contact mask with control data |
Dec. 25, 2007 |
| 7262828 |
Near-field photomask and near-field exposure apparatus including the photomask |
Aug. 28, 2007 |
| 7253883 |
Machine for exposing printed circuit panels with gas balloons and mechanical spacers |
Aug. 7, 2007 |
| 7239376 |
Method and apparatus for correcting gravitational sag in photomasks used in the production of electronic devices |
Jul. 3, 2007 |
| 7236239 |
Illumination system and exposure apparatus |
Jun. 26, 2007 |
| 7230681 |
Method and apparatus for immersion lithography |
Jun. 12, 2007 |
| 7180572 |
Immersion optical projection system |
Feb. 20, 2007 |
| RE39441 |
Printer with vacuum platen having bimetallic valve sheet providing selectable active area |
Dec. 26, 2006 |
| 7139066 |
Reticle carrier including reticle positioning and location means |
Nov. 21, 2006 |
| 7135692 |
Lithographic apparatus, illumination system and method for providing a projection beam of EUV radiation |
Nov. 14, 2006 |
| 7034924 |
Lithographic apparatus and device manufacturing method |
Apr. 25, 2006 |
| 7026259 |
Liquid-filled balloons for immersion lithography |
Apr. 11, 2006 |
| 7012675 |
Knuckle arm |
Mar. 14, 2006 |
| 6987559 |
Vibration-attenuation devices having low lateral stiffness, and exposure apparatus comprising same |
Jan. 17, 2006 |
| 6965426 |
Positioning system and exposure apparatus having the same |
Nov. 15, 2005 |
| 6957037 |
Image reading apparatus and image forming apparatus having the same |
Oct. 18, 2005 |
| 6921628 |
Exposure device and method of fabricating liquid crystal display panel using the same |
Jul. 26, 2005 |
| 6906782 |
Stage apparatus, scanning type exposure apparatus, and device produced with the same |
Jun. 14, 2005 |
| 6903808 |
Alignable low-profile substrate chuck for large-area projection lithography |
Jun. 7, 2005 |
| 6873402 |
Reticle stop block apparatus and method |
Mar. 29, 2005 |
| 6864962 |
Active anti-vibration apparatus and exposure apparatus and device manufacturing method using the same |
Mar. 8, 2005 |
| 6864955 |
Stage apparatus, exposure apparatus and method for exposing substrate plate |
Mar. 8, 2005 |
| 6844922 |
Gas bearings for use with vacuum chambers and their application in lithographic projection apparatus |
Jan. 18, 2005 |
| 6806945 |
Automatic exposing apparatus and method for exposing both sides of works |
Oct. 19, 2004 |
| 6791669 |
Positioning device and exposure apparatus including the same |
Sep. 14, 2004 |
| 6781673 |
Mask handling apparatus, lithographic projection apparatus, device manufacturing method and device manufactured thereby |
Aug. 24, 2004 |
| 6740891 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
May. 25, 2004 |
| 6720115 |
Exposure method and exposure apparatus using near-field light and exposure mask |
Apr. 13, 2004 |
| 6704127 |
Imaging device and method for imaging photosensitive media of different formats |
Mar. 9, 2004 |
| 6700650 |
Holder for holding a printed circuit for exposure to light |
Mar. 2, 2004 |
| 6674085 |
Gas-actuated stages including reaction-force-canceling mechanisms for use in charged-particle-beam microlithography systems |
Jan. 6, 2004 |
| 6630988 |
Reticle stop block apparatus and method |
Oct. 7, 2003 |
| 6603130 |
Gas bearings for use with vacuum chambers and their application in lithographic projection apparatuses |
Aug. 5, 2003 |
| 6593999 |
Original cover closer |
Jul. 15, 2003 |
| 6590633 |
Stage apparatus and method for producing circuit device utilizing the same |
Jul. 8, 2003 |
| 6573980 |
Removable optical pellicle |
Jun. 3, 2003 |
| 6571702 |
Printer with vacuum platen having bimetallic valve sheet providing selectable active area |
Jun. 3, 2003 |
| 6572095 |
Method of and system for conveying sheet to be scanned |
Jun. 3, 2003 |
| 6549264 |
Extreme-UV lithography vacuum chamber zone seal |
Apr. 15, 2003 |
| 6515736 |
Reticle capturing and handling system |
Feb. 4, 2003 |
| 6512571 |
Anti-vibration system for exposure apparatus |
Jan. 28, 2003 |
| 6480260 |
Mask clamping apparatus, e.g. for a lithographic apparatus |
Nov. 12, 2002 |
| 6473161 |
Lithographic projection apparatus, supporting assembly and device manufacturing method |
Oct. 29, 2002 |
| 6456364 |
Semiconductor manufacturing apparatus, and device manufacturing method |
Sep. 24, 2002 |
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