| |
 |
|
Class Information
Number: 355/72
Name: Photocopying > Projection printing and copying cameras > Detailed holder for photosensitive paper
Description: Subject matter including detailed means to maintain the photographic paper in position while the image of the original is being focused on its surface.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7391496 |
Exposure apparatus |
Jun. 24, 2008 |
| 7391495 |
Stage apparatus, exposure system using the same, and device manufacturing method |
Jun. 24, 2008 |
| 7385674 |
Exposure apparatus and device manufacturing method |
Jun. 10, 2008 |
| 7385675 |
Lithographic apparatus and device manufacturing method |
Jun. 10, 2008 |
| 7385678 |
Positioning device and lithographic apparatus |
Jun. 10, 2008 |
| 7385679 |
Lithographic apparatus and actuator |
Jun. 10, 2008 |
| 7382435 |
Exposure apparatus |
Jun. 3, 2008 |
| 7382440 |
Lithographic apparatus and device manufacturing method |
Jun. 3, 2008 |
| 7379162 |
Substrate-holding technique |
May. 27, 2008 |
| 7379156 |
Lithographic apparatus and device manufacturing method |
May. 27, 2008 |
| 7375346 |
Positioning device and method of initializing a positioning device |
May. 20, 2008 |
| 7375795 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
May. 20, 2008 |
| 7375797 |
Utilities transfer system in a lithography system |
May. 20, 2008 |
| 7375800 |
Non-contact pneumatic transfer for stages with small motion |
May. 20, 2008 |
| 7372049 |
Lithographic apparatus including a cleaning device and method for cleaning an optical element |
May. 13, 2008 |
| 7372549 |
Lithographic apparatus and device manufacturing method |
May. 13, 2008 |
| 7365830 |
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method |
Apr. 29, 2008 |
| 7365827 |
Lithographic apparatus and device manufacturing method |
Apr. 29, 2008 |
| 7365513 |
Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device |
Apr. 29, 2008 |
| 7362412 |
Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system |
Apr. 22, 2008 |
| 7359030 |
Lithographic apparatus and device manufacturing method |
Apr. 15, 2008 |
| 7359031 |
Lithographic projection assembly, load lock and method for transferring objects |
Apr. 15, 2008 |
| 7359032 |
Lithographic apparatus and device manufacturing method |
Apr. 15, 2008 |
| 7359034 |
Exposure apparatus and device manufacturing method |
Apr. 15, 2008 |
| 7355676 |
Environmental system including vacuum scavenge for an immersion lithography apparatus |
Apr. 8, 2008 |
| 7355674 |
Lithographic apparatus, device manufacturing method and computer program product |
Apr. 8, 2008 |
| 7352149 |
Method for controlling the position of a movable object, a positioning system, and a lithographic apparatus |
Apr. 1, 2008 |
| 7352436 |
Lithographic apparatus, projection apparatus and device manufacturing method |
Apr. 1, 2008 |
| 7352438 |
Lithographic apparatus and device manufacturing method |
Apr. 1, 2008 |
| 7352440 |
Substrate placement in immersion lithography |
Apr. 1, 2008 |
| 7349064 |
Immersion exposure technique |
Mar. 25, 2008 |
| 7349067 |
Lithographic apparatus and device manufacturing method |
Mar. 25, 2008 |
| 7345742 |
Environmental system including a transport region for an immersion lithography apparatus |
Mar. 18, 2008 |
| 7345736 |
Lithographic apparatus and device manufacturing method |
Mar. 18, 2008 |
| 7342645 |
Stage control apparatus and method, stage apparatus and exposure apparatus |
Mar. 11, 2008 |
| 7339653 |
System for a pellicle frame with heightened bonding surfaces |
Mar. 4, 2008 |
| 7336344 |
Positioning system, exposure apparatus using the same, and device manufacturing method |
Feb. 26, 2008 |
| 7333180 |
Positioning apparatus and exposure apparatus using the same |
Feb. 19, 2008 |
| 7333179 |
Moving mechanism with high bandwidth response and low force transmissibility |
Feb. 19, 2008 |
| 7333174 |
Lithographic apparatus and method for determining Z position errors/variations and substrate table flatness |
Feb. 19, 2008 |
| 7327437 |
Lithographic apparatus and device manufacturing method |
Feb. 5, 2008 |
| 7327438 |
Lithographic apparatus and method of a manufacturing device |
Feb. 5, 2008 |
| 7327439 |
Lithographic apparatus and device manufacturing method |
Feb. 5, 2008 |
| 7321419 |
Exposure apparatus, and device manufacturing method |
Jan. 22, 2008 |
| 7321418 |
Stage apparatus, exposure apparatus, and device manufacturing method |
Jan. 22, 2008 |
| 7321415 |
Environmental system including vacuum scavenge for an immersion lithography apparatus |
Jan. 22, 2008 |
| 7319510 |
Stage device, exposure apparatus using the unit, and device manufacturing method |
Jan. 15, 2008 |
| 7317507 |
Lithographic apparatus and device manufacturing method |
Jan. 8, 2008 |
| 7315348 |
Exposure apparatus, focal point detecting method, exposure method and device manufacturing method |
Jan. 1, 2008 |
| 7315349 |
Exposure equipment with optical system positioning mechanism and related exposure method |
Jan. 1, 2008 |
|
|
|