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Class Information
Number: 355/71
Name: Photocopying > Projection printing and copying cameras > Illumination systems or details > Including shutter, diaphragm, polarizer or filter
Description: Subject matter including an opaque element which is insertable in the optical path to temporarily block the light or a diaphragm, polarizer, or filter in the optical path to partially block the light.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7612867 |
Lithographic apparatus |
Nov. 3, 2009 |
| 7609362 |
Scanning lithographic apparatus and device manufacturing method |
Oct. 27, 2009 |
| 7602475 |
System and method for providing modified illumination intensity |
Oct. 13, 2009 |
| 7602474 |
Exposure apparatus |
Oct. 13, 2009 |
| 7593095 |
System for reducing the coherence of laser radiation |
Sep. 22, 2009 |
| 7586113 |
EUV illumination system |
Sep. 8, 2009 |
| 7573563 |
Exposure apparatus and device manufacturing method |
Aug. 11, 2009 |
| 7554648 |
Blind devices and methods for providing continuous thermophoretic protection of lithographic reticle |
Jun. 30, 2009 |
| 7551263 |
Device for adjusting the illumination dose on a photosensitive layer |
Jun. 23, 2009 |
| 7548302 |
Lithographic apparatus and device manufacturing method |
Jun. 16, 2009 |
| 7545483 |
Optical element unit for exposure processes |
Jun. 9, 2009 |
| 7545478 |
Lithographic apparatus, thermal conditioning system, and method for manufacturing a device |
Jun. 9, 2009 |
| 7542127 |
Lithographic apparatus and method for manufacturing a device |
Jun. 2, 2009 |
| 7541601 |
Ion beam irradiating apparatus and method of adjusting uniformity of a beam |
Jun. 2, 2009 |
| 7538875 |
Lithographic apparatus and methods for use thereof |
May. 26, 2009 |
| 7538854 |
Measuring apparatus and exposure apparatus having the same |
May. 26, 2009 |
| 7532309 |
Immersion lithography system and method having an immersion fluid containment plate for submerging the substrate to be imaged in immersion fluid |
May. 12, 2009 |
| 7532308 |
Lithographic apparatus and device manufacturing method |
May. 12, 2009 |
| 7528929 |
Lithographic apparatus and device manufacturing method |
May. 5, 2009 |
| 7525642 |
Lithographic apparatus and device manufacturing method |
Apr. 28, 2009 |
| 7525640 |
Lithographic apparatus and device manufacturing method |
Apr. 28, 2009 |
| 7525635 |
Contamination barrier and lithographic apparatus |
Apr. 28, 2009 |
| 7518707 |
Exposure apparatus |
Apr. 14, 2009 |
| 7518706 |
Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly |
Apr. 14, 2009 |
| 7518705 |
Lithographic apparatus and device manufacturing method |
Apr. 14, 2009 |
| 7515248 |
Illumination optical system, exposure apparatus, and exposure method with polarized state detection result and adjustment |
Apr. 7, 2009 |
| 7515247 |
Illumination optical system, exposure apparatus, and exposure method with polarized state fluctuation correcting device |
Apr. 7, 2009 |
| 7511886 |
Optical beam transformation system and illumination system comprising an optical beam transformation system |
Mar. 31, 2009 |
| 7511884 |
Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems |
Mar. 31, 2009 |
| 7511799 |
Lithographic projection apparatus and a device manufacturing method |
Mar. 31, 2009 |
| 7508598 |
Apparatus for measuring aerial images produced by an optical lithography system |
Mar. 24, 2009 |
| 7508580 |
8-mirror microlithography projection objective |
Mar. 24, 2009 |
| 7508493 |
Exposure apparatus and device manufacturing method |
Mar. 24, 2009 |
| 7505117 |
Polarizing element, method of manufacturing polarizing element, method of evaluating exposure apparatus, method of manufacturing semiconductor device, and exposure apparatus |
Mar. 17, 2009 |
| 7499148 |
Polarizer, projection lens system, exposure apparatus and exposing method |
Mar. 3, 2009 |
| 7495744 |
Exposure method, exposure apparatus, and method for producing device |
Feb. 24, 2009 |
| 7492510 |
Optical element having antireflection film, and exposure apparatus |
Feb. 17, 2009 |
| 7489387 |
Exposure apparatus and device fabrication method |
Feb. 10, 2009 |
| 7483122 |
Projection optical system, exposure apparatus, and exposure method |
Jan. 27, 2009 |
| 7483121 |
Microlithograph system |
Jan. 27, 2009 |
| 7482110 |
Method for adapting structure dimensions during the photolithographic projection of a pattern of structure elements onto a semiconductor wafer |
Jan. 27, 2009 |
| 7477357 |
Exposure apparatus and device manufacturing method |
Jan. 13, 2009 |
| 7471375 |
Correction of optical proximity effects by intensity modulation of an illumination arrangement |
Dec. 30, 2008 |
| 7471371 |
Exposure apparatus and device fabrication method |
Dec. 30, 2008 |
| 7469058 |
Method and system for a maskless lithography rasterization technique based on global optimization |
Dec. 23, 2008 |
| 7468781 |
Exposure apparatus |
Dec. 23, 2008 |
| 7468238 |
Maskless photolithography for using photoreactive agents |
Dec. 23, 2008 |
| 7466394 |
Lithographic apparatus and device manufacturing method using a compensation scheme for a patterning array |
Dec. 16, 2008 |
| 7463418 |
Polarization element unit and polarization light emitting apparatus |
Dec. 9, 2008 |
| 7463413 |
Spectral purity filter for a multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and devi |
Dec. 9, 2008 |
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