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Class Information
Number: 355/71
Name: Photocopying > Projection printing and copying cameras > Illumination systems or details > Including shutter, diaphragm, polarizer or filter
Description: Subject matter including an opaque element which is insertable in the optical path to temporarily block the light or a diaphragm, polarizer, or filter in the optical path to partially block the light.










Patents under this class:

Patent Number Title Of Patent Date Issued
8692974 Lithographic apparatus and device manufacturing method using pupil filling by telecentricity control Apr. 8, 2014
8687170 Asymmetric complementary dipole illuminator Apr. 1, 2014
8687169 Optical aperture device Apr. 1, 2014
8675178 Microlithographic projection exposure apparatus Mar. 18, 2014
8675177 Exposure method and apparatus, and method for fabricating device with light amount distribution having light larger in first and second pairs of areas Mar. 18, 2014
8675176 Parameter control in a lithographic apparatus using polarization Mar. 18, 2014
8665420 Spectral purity filter and lithographic apparatus Mar. 4, 2014
8654313 Exposing method and method of manufacturing semiconductor device Feb. 18, 2014
8643825 Microlithography illumination systems, components and methods Feb. 4, 2014
8638420 Optical integrator, illuminating optical device, exposure apparatus and device manufacturing method Jan. 28, 2014
8634064 Optical system for increasing illumination efficiency of a patterning device by producing a plurality of beams Jan. 21, 2014
8634063 Wafer with design printed outside active region and spaced by design tolerance of reticle blind Jan. 21, 2014
8629974 Optical component for maskless exposure apparatus Jan. 14, 2014
8629973 Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensation Jan. 14, 2014
8619235 Lithographic apparatus and device manufacturing method Dec. 31, 2013
8605257 Projection system with compensation of intensity variations and compensation element therefor Dec. 10, 2013
8598552 System and method to optimize extreme ultraviolet light generation Dec. 3, 2013
8593618 Optical system of a microlithographic projection exposure apparatus and microlithographic exposure method Nov. 26, 2013
8587768 EUV collector system with enhanced EUV radiation collection Nov. 19, 2013
8587767 Illumination optics for EUV microlithography and related system and apparatus Nov. 19, 2013
8587766 Lithographic apparatus and device manufacturing method Nov. 19, 2013
8587764 Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method Nov. 19, 2013
8576378 Illumination optical system, exposure apparatus, and device manufacturing method Nov. 5, 2013
8576373 Lithographic apparatus and method Nov. 5, 2013
8566756 Processing condition determining method and apparatus, display method and apparatus, processing apparatus, measurement apparatus and exposure apparatus, substrate processing system, and progra Oct. 22, 2013
8564762 Photolithography exposure apparatus having blinding plates and method of driving the same Oct. 22, 2013
8564761 Surface shape measuring apparatus, exposure apparatus, and device manufacturing method Oct. 22, 2013
8558988 Thin film continuous spatially modulated grey attenuators and filters Oct. 15, 2013
8547526 Photolithography systems and associated methods of selective die exposure Oct. 1, 2013
8547525 EUV radiation generation apparatus Oct. 1, 2013
8531649 Exposure apparatus and device fabrication method Sep. 10, 2013
8525972 Optimization of focused spots for maskless lithography Sep. 3, 2013
8525134 Lithography system Sep. 3, 2013
8508717 Illumination optical system, exposure apparatus, and device manufacturing method Aug. 13, 2013
8502962 Computer readable storage medium including effective light source calculation program, and exposure method Aug. 6, 2013
8497979 Exposure method and exposure apparatus Jul. 30, 2013
8497978 Exposure apparatus and method of manufacturing device Jul. 30, 2013
8488104 Projection objective with diaphragms Jul. 16, 2013
8482717 Polarization-modulating optical element Jul. 9, 2013
8467034 Light shielding unit, variable slit apparatus, and exposure apparatus Jun. 18, 2013
8467033 Method for operating an illumination system of a microlithographic projection exposure apparatus Jun. 18, 2013
8462317 Illumination optical system, exposure apparatus, and device manufacturing method Jun. 11, 2013
8451510 Image processing apparatus and image processing method thereof May. 28, 2013
8451430 Illumination optical system, exposure apparatus, and device manufacturing method May. 28, 2013
8451429 Dichroic mirror, method for manufacturing a dichroic mirror, lithographic apparatus, semiconductor device and method of manufacturing therefor May. 28, 2013
8451427 Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method May. 28, 2013
8450046 Methods for enhancing photolithography patterning May. 28, 2013
8441613 Projection objective and projection exposure apparatus for microlithography May. 14, 2013
8436985 Combination stop for catoptric projection arrangement May. 7, 2013
8436984 Lithographic apparatus and method of irradiating at least two target portions May. 7, 2013











 
 
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