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Class Information
Number: 355/68
Name: Photocopying > Projection printing and copying cameras > Illumination systems or details > Including photocell or phototube
Description: Subject matter including a photoelectric cell or photomultiplier tube and related electric circuitry to detect the intensity of light in some part of the optical path.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7595862 |
Exposure apparatus and method of manufacturing device |
Sep. 29, 2009 |
| 7580116 |
Exposure apparatus and device fabrication method |
Aug. 25, 2009 |
| 7541601 |
Ion beam irradiating apparatus and method of adjusting uniformity of a beam |
Jun. 2, 2009 |
| 7525638 |
Lithographic apparatus and device manufacturing method |
Apr. 28, 2009 |
| 7521700 |
Raster frame beam system for electron beam lithography |
Apr. 21, 2009 |
| 7466396 |
Lithography apparatus and method utilizing pendulum interferometer system |
Dec. 16, 2008 |
| 7432492 |
Image reading apparatus capable of reading infrared and visible images |
Oct. 7, 2008 |
| 7417709 |
Method and apparatus for exposing semiconductor substrates |
Aug. 26, 2008 |
| 7403263 |
Exposure apparatus |
Jul. 22, 2008 |
| 7375353 |
Lithographic apparatus and device manufacturing method |
May. 20, 2008 |
| 7324187 |
Illumination system and exposure apparatus |
Jan. 29, 2008 |
| 7317506 |
Variable illumination source |
Jan. 8, 2008 |
| 7265815 |
System and method utilizing an illumination beam adjusting system |
Sep. 4, 2007 |
| 7233384 |
Lithographic apparatus and device manufacturing method, and device manufactured thereby for calibrating an imaging system with a sensor |
Jun. 19, 2007 |
| 7230220 |
Method of determining optical properties and projection exposure system comprising a wavefront detection system |
Jun. 12, 2007 |
| 7221431 |
Exposure apparatus |
May. 22, 2007 |
| 7213963 |
Lithographic apparatus and device manufacturing method |
May. 8, 2007 |
| 7209218 |
Exposure apparatus and method for manufacturing device using the exposure apparatus |
Apr. 24, 2007 |
| 7187431 |
Lithographic apparatus, method of determining properties thereof and computer program |
Mar. 6, 2007 |
| 7161660 |
Photolithography system and method of monitoring the same |
Jan. 9, 2007 |
| 7158232 |
Substrate processing apparatus |
Jan. 2, 2007 |
| 7130021 |
Exposure apparatus, and device manufacturing method |
Oct. 31, 2006 |
| 7113261 |
Radiation system, lithographic apparatus, device manufacturing method and device manufactured thereby |
Sep. 26, 2006 |
| 7012690 |
Substrate processing apparatus |
Mar. 14, 2006 |
| 6980276 |
Luminous source apparatus, image projecting apparatus and image projection converting apparatus |
Dec. 27, 2005 |
| 6958806 |
Lithographic apparatus and device manufacturing method |
Oct. 25, 2005 |
| 6956640 |
Light energy detecting apparatus for exposure condition control in semiconductor manufacturing apparatus |
Oct. 18, 2005 |
| 6934007 |
Method for photolithography using multiple illuminations and a single fine feature mask |
Aug. 23, 2005 |
| 6919952 |
Direct write lithography system |
Jul. 19, 2005 |
| 6909489 |
Luminous source apparatus, image projecting apparatus and image projection converting apparatus |
Jun. 21, 2005 |
| 6903800 |
Film-processing method and film-processing apparatus |
Jun. 7, 2005 |
| 6894764 |
Illumination optical system, exposure apparatus having the same, and device fabricating method |
May. 17, 2005 |
| 6888618 |
Exposure apparatus and exposure method |
May. 3, 2005 |
| 6882407 |
Exposure apparatus |
Apr. 19, 2005 |
| 6879382 |
Substrate processing apparatus |
Apr. 12, 2005 |
| 6875971 |
Wafer edge exposure apparatus, and wafer edge exposure method |
Apr. 5, 2005 |
| 6870603 |
Lithographic apparatus and method to determine beam characteristics |
Mar. 22, 2005 |
| 6859264 |
Projection exposure apparatus having aberration measurement device |
Feb. 22, 2005 |
| 6856378 |
Method of photolithographic exposure dose control as a function of resist sensitivity |
Feb. 15, 2005 |
| 6844913 |
Optical exposure apparatus for forming an alignment layer |
Jan. 18, 2005 |
| 6839126 |
Photolithography process with multiple exposures |
Jan. 4, 2005 |
| 6825481 |
Exposure apparatus, control method thereof, and device manufacturing method using the same |
Nov. 30, 2004 |
| 6803991 |
Exposure amount control method in exposure apparatus |
Oct. 12, 2004 |
| 6801296 |
Image processing method, image processing apparatus and image recording apparatus |
Oct. 5, 2004 |
| 6798495 |
Exposure apparatus, exposure method and device production method |
Sep. 28, 2004 |
| 6788390 |
LIGHT RECEIVING APPARATUS, MARK DETECTING APPARATUS USING LIGHT RECEIVING APPARATUS, EXPOSING APPARATUS, MAINTENANCE METHOD OF EXPOSING APPARATUS, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE |
Sep. 7, 2004 |
| 6765648 |
Image sensor unit and image reader using the same |
Jul. 20, 2004 |
| 6741326 |
Methods, apparatus, and systems for detecting partial-shading encodement filtering |
May. 25, 2004 |
| 6721033 |
Exposure apparatus and exposure method |
Apr. 13, 2004 |
| 6717652 |
Exposure apparatus, exposure method and semiconductor device fabricated with the exposure method |
Apr. 6, 2004 |
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