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Class Information
Number: 355/67
Name: Photocopying > Projection printing and copying cameras > Illumination systems or details
Description: Subject matter including a plural or particular light source, or means such as a reflector, condenser lens or diffusing plate to direct light from the source to the original, or means to control the intensity or time interval of light reaching the photosensitive paper, or means to regulate the contrast or relative brightness of one portion of a picture or margin with another portion.

Sub-classes under this class:

Class Number Class Name Patents
355/69 Electricity to lamp controlled 459
355/68 Including photocell or phototube 496
355/71 Including shutter, diaphragm, polarizer or filter 1,338
355/70 Plural lamps 209

Patents under this class:

Patent Number Title Of Patent Date Issued
8018577 Illumination-sensor calibration methods, and exposure methods and apparatus and device-manufacturing methods including same, and reflective masks used in same Sep. 13, 2011
8018572 Lithographic apparatus and radiation system Sep. 13, 2011
8014069 Polarization converter, optical system, method and applications Sep. 6, 2011
8013980 Exposure apparatus equipped with interferometer and exposure apparatus using the same Sep. 6, 2011
8013979 Illumination system with low telecentricity error and dynamic telecentricity correction Sep. 6, 2011
8004767 Process for making microlens arrays and masterforms Aug. 23, 2011
8004766 Illuminating device, illuminating method, image signal processing device, image signal processing method, and image projecting apparatus Aug. 23, 2011
8004658 Lighting optical device, exposure system, and exposure method Aug. 23, 2011
8004657 Exposure apparatus, control method for the same, and device manufacturing method Aug. 23, 2011
8004656 Illumination system for a microlithographic projection exposure apparatus Aug. 23, 2011
8003960 Reflective optical element, optical system and EUV lithography device Aug. 23, 2011
7999917 Illumination system and microlithographic projection exposure apparatus including same Aug. 16, 2011
7999916 Microlithographic projection exposure apparatus Aug. 16, 2011
7999915 Laser system Aug. 16, 2011
7999914 Lithographic apparatus and device manufacturing method Aug. 16, 2011
7993018 Projection optical system and light amount adjusting component used in the same Aug. 9, 2011
7990520 Microlithography illumination systems, components and methods Aug. 2, 2011
7989783 Nanolithography system Aug. 2, 2011
7982856 Lithographic apparatus and device manufacturing method Jul. 19, 2011
7982854 Projection exposure system, method for manufacturing a micro-structured structural member by the aid of such a projection exposure system and polarization-optical element adapted for use in su Jul. 19, 2011
7982853 Lithographic method for maskless pattern transfer onto a photosensitive substrate Jul. 19, 2011
7978310 Projection optical system, exposure system, and exposure method Jul. 12, 2011
7974819 Methods and systems for intensity modeling including polarization Jul. 5, 2011
7969556 Illumination optical system for microlithography and illumination system and projection exposure system with an illumination optical system of this type Jun. 28, 2011
7969555 Lens structure, optical system having the same, and lithography method using the optical system Jun. 28, 2011
7969554 Method, computer program, apparatus and system providing printing for an illumination mask for three-dimensional images Jun. 28, 2011
7965380 Lithographic apparatus and device manufacturing method Jun. 21, 2011
7965378 Optical system and method for illumination of reflective spatial light modulators in maskless lithography Jun. 21, 2011
7965373 Lithographic apparatus and device manufacturing method utilizing a datapath having a balanced calculation load Jun. 21, 2011
7961298 Polarization rotator and a crystalline-quartz plate for use in an optical imaging system Jun. 14, 2011
7961297 Method for determining intensity distribution in the image plane of a projection exposure arrangement Jun. 14, 2011
7961296 Lithographic apparatus and device manufacturing method Jun. 14, 2011
7961294 Imaging device in a projection exposure facility Jun. 14, 2011
7956987 Measurement apparatus, exposure apparatus, and device manufacturing method Jun. 7, 2011
7956984 Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus Jun. 7, 2011
7956983 Exposure equipment having auxiliary photo mask and exposure method using the same Jun. 7, 2011
7955767 Method for examining a wafer with regard to a contamination limit and EUV projection exposure system Jun. 7, 2011
7952803 Lithographic apparatus and device manufacturing method May. 31, 2011
7952780 Microactuator, optical device and exposure apparatus, and device manufacturing method May. 31, 2011
7952726 Measurement apparatus, exposure apparatus having the same, and device manufacturing method May. 31, 2011
7952684 Light-modulating nano/micro scale aperture array device having immersion layer and high speed nano scale pattern recording system using the same May. 31, 2011
RE42338 Capping layer for EUV optical elements May. 10, 2011
7940464 Optical system and corresponding optical element May. 10, 2011
7940375 Transmission filter apparatus May. 10, 2011
7936446 Exposure apparatus and device manufacturing method May. 3, 2011
7936445 Altering pattern data based on measured optical element characteristics May. 3, 2011
7936442 Exposure apparatus, exposure method, and device fabrication method May. 3, 2011
7936441 Projection optical system, exposure apparatus, and exposure method May. 3, 2011
7932998 Exposure apparatus having the same ID bias Apr. 26, 2011
7932997 Reconfigurable mask method and device using MEMS for manufacturing integrated circuits Apr. 26, 2011

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