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Class Information
Number: 355/67
Name: Photocopying > Projection printing and copying cameras > Illumination systems or details
Description: Subject matter including a plural or particular light source, or means such as a reflector, condenser lens or diffusing plate to direct light from the source to the original, or means to control the intensity or time interval of light reaching the photosensitive paper, or means to regulate the contrast or relative brightness of one portion of a picture or margin with another portion.










Sub-classes under this class:

Class Number Class Name Patents
355/69 Electricity to lamp controlled 459
355/68 Including photocell or phototube 500
355/71 Including shutter, diaphragm, polarizer or filter 1,346
355/70 Plural lamps 210


Patents under this class:

Patent Number Title Of Patent Date Issued
8711332 Mirror elements for EUV lithography and production methods therefor Apr. 29, 2014
8711323 Lithographic apparatus and device manufacturing method Apr. 29, 2014
8705006 Method and device for connecting an optical element to a frame Apr. 22, 2014
8705005 Microlithographic illumination system Apr. 22, 2014
8705004 Lithographic method and apparatus Apr. 22, 2014
8705003 Photosensing device for digital stereo spliced picture projection imaging and operation method thereof Apr. 22, 2014
8705000 Illumination optics and projection exposure apparatus Apr. 22, 2014
8704199 Alignment of collector device in lithographic apparatus Apr. 22, 2014
8692977 Optical system, inspection system and manufacturing method Apr. 8, 2014
8692974 Lithographic apparatus and device manufacturing method using pupil filling by telecentricity control Apr. 8, 2014
8692973 Exposure apparatus and method for producing device Apr. 8, 2014
8691481 Local exposure method and local exposure apparatus Apr. 8, 2014
8687169 Optical aperture device Apr. 1, 2014
8687166 Lithographic apparatus having an encoder position sensor system Apr. 1, 2014
8686381 Source-collector module with GIC mirror and tin vapor LPP target system Apr. 1, 2014
8685632 Radiation source, lithographic apparatus and device manufacturing method Apr. 1, 2014
8681315 Tunable two-mirror interference lithography system Mar. 25, 2014
8681313 Diffraction elements for alignment targets Mar. 25, 2014
8681312 Inspection apparatus for lithography Mar. 25, 2014
8681308 Lithographic apparatus and device manufacturing method Mar. 25, 2014
8680495 Extreme ultraviolet light source Mar. 25, 2014
8675180 Maskless exposure apparatus and method of alignment for overlay in maskless exposure Mar. 18, 2014
8675178 Microlithographic projection exposure apparatus Mar. 18, 2014
8675176 Parameter control in a lithographic apparatus using polarization Mar. 18, 2014
8675175 Lithographic apparatus and device manufacturing method Mar. 18, 2014
8670107 Maskless exposure apparatus and control method thereof Mar. 11, 2014
8665420 Spectral purity filter and lithographic apparatus Mar. 4, 2014
8665419 Device for an optical arrangement and method for positioning an optical element of an optical arrangement Mar. 4, 2014
8665418 Projection optical system, exposure apparatus, and device manufacturing method Mar. 4, 2014
8665417 Apparatus and method for inspecting a substrate Mar. 4, 2014
8665416 Exposure apparatus and method of manufacturing device Mar. 4, 2014
8665415 Exposure apparatus and device manufacturing method Mar. 4, 2014
8663881 Radiation source, method of controlling a radiation source, lithographic apparatus, and method for manufacturing a device Mar. 4, 2014
8660786 Positioning module Feb. 25, 2014
8659745 Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations Feb. 25, 2014
8654313 Exposing method and method of manufacturing semiconductor device Feb. 18, 2014
8654312 Optical component for maskless exposure apparatus Feb. 18, 2014
8654311 Lithographic apparatus and device manufacturing method Feb. 18, 2014
8654308 Method for determining exposure condition, exposure method, exposure apparatus, and method for manufacturing device Feb. 18, 2014
8654307 Scanning type exposure apparatus, method of manufacturing micro-apparatus, mask, projection optical apparatus, and method of manufacturing mask Feb. 18, 2014
8654305 Systems and methods for insitu lens cleaning in immersion lithography Feb. 18, 2014
8643826 Method for increasing throughput and reducing blurriness due to movement Feb. 4, 2014
8643825 Microlithography illumination systems, components and methods Feb. 4, 2014
8643824 Projection optics for microlithography Feb. 4, 2014
8638420 Optical integrator, illuminating optical device, exposure apparatus and device manufacturing method Jan. 28, 2014
8636386 Filter device for the compensation of an asymmetric pupil illumination Jan. 28, 2014
8634062 Actuator system, lithographic apparatus, method of controlling the position of a component and device manufacturing method Jan. 21, 2014
8634060 Method for a multiple exposure, microlithography projection exposure installation and a projection system Jan. 21, 2014
8634055 Apparatus and method to control vacuum at porous material using multiple porous materials Jan. 21, 2014
8633460 Reflective optical element, optical system EUV and lithography device Jan. 21, 2014











 
 
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