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Class Information
Number: 355/55
Name: Photocopying > Projection printing and copying cameras > Focus or magnification control
Description: Subject matter including means to move the holder for the original, the objective lens, and the photosensitive paper holder relative to each other for focusing or changing and degree of magnification or reduction; or including structure adapted to allow interchanging of objective lenses of different focal lengths.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7145638 |
Alignment apparatus, exposure apparatus, and device manufacturing method |
Dec. 5, 2006 |
| 7145630 |
Lithographic apparatus and device manufacturing method |
Dec. 5, 2006 |
| 7142284 |
Position detector, position detecting method, and exposure apparatus having the same |
Nov. 28, 2006 |
| 7139064 |
Optical system for providing a hexapole illumination and method of forming a photoresist pattern on a substrate using the same |
Nov. 21, 2006 |
| 7136146 |
Exposure device and exposure method |
Nov. 14, 2006 |
| 7136149 |
Lithographic apparatus with autofocus system |
Nov. 14, 2006 |
| 7136165 |
Substrate alignment apparatus and method, and exposure apparatus |
Nov. 14, 2006 |
| 7136142 |
Lithographic apparatus having a gas flushing device |
Nov. 14, 2006 |
| 7133118 |
Lithographic apparatus and device manufacturing method |
Nov. 7, 2006 |
| 7133119 |
Systems for simulating high NA and polarization effects in aerial images |
Nov. 7, 2006 |
| 7130021 |
Exposure apparatus, and device manufacturing method |
Oct. 31, 2006 |
| 7126668 |
Apparatus and process for determination of dynamic scan field curvature |
Oct. 24, 2006 |
| 7126670 |
Position measurement technique |
Oct. 24, 2006 |
| 7126669 |
Method and system for automated process correction using model parameters, and lithographic apparatus using such method and system |
Oct. 24, 2006 |
| 7123346 |
Projection exposure apparatus with line width calculator controlled diaphragm unit |
Oct. 17, 2006 |
| 7116401 |
Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method |
Oct. 3, 2006 |
| 7113257 |
Assembly comprising a sensor for determining at least one of tilt and height of a substrate, a method therefor and a lithographic projection apparatus |
Sep. 26, 2006 |
| 7113259 |
Lithographic apparatus and device manufacturing method |
Sep. 26, 2006 |
| 7106419 |
Exposure method and apparatus |
Sep. 12, 2006 |
| 7102731 |
Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method |
Sep. 5, 2006 |
| 7098994 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
Aug. 29, 2006 |
| 7092068 |
Reticle, exposure monitoring method, exposure method and manufacturing method for semiconductor device |
Aug. 15, 2006 |
| 7092069 |
Projection exposure method and projection exposure system |
Aug. 15, 2006 |
| 7088426 |
Projection optical system adjustment method, prediction method, evaluation method, adjustment method, exposure method and exposure apparatus, program, and device manufacturing method |
Aug. 8, 2006 |
| 7084958 |
Lithographic apparatus, control system and device manufacturing method |
Aug. 1, 2006 |
| 7084962 |
Method for detecting positioning errors of circuit patterns during the transfer by means of a mask into layers of a substrate of a semiconductor wafer |
Aug. 1, 2006 |
| 7084957 |
Scanning exposure technique |
Aug. 1, 2006 |
| 7084952 |
Lithographic apparatus, device manufacturing method, and computer-readable storage medium |
Aug. 1, 2006 |
| 7081948 |
System for automated focus measuring of a lithography tool |
Jul. 25, 2006 |
| 7081943 |
Lithographic apparatus and device manufacturing method |
Jul. 25, 2006 |
| 7081947 |
Lithographic apparatus and device manufacturing method |
Jul. 25, 2006 |
| 7079235 |
Reticle design inspection system |
Jul. 18, 2006 |
| 7079219 |
Method for manufacturing semiconductor device and exposure system |
Jul. 18, 2006 |
| 7075620 |
Lithographic apparatus, device manufacturing method, and device manufactured thereby |
Jul. 11, 2006 |
| 7075622 |
Projection lens and optical projector provided with the same |
Jul. 11, 2006 |
| 7072023 |
Position detection apparatus having a plurality of detection sections, and exposure apparatus |
Jul. 4, 2006 |
| 7072040 |
Mask for inspecting an exposure apparatus, a method of inspecting an exposure apparatus, and an exposure apparatus |
Jul. 4, 2006 |
| 7072024 |
Lithographic projection method and apparatus |
Jul. 4, 2006 |
| 7068349 |
Method of and preventing focal plane anomalies in the focal plane of a projection system |
Jun. 27, 2006 |
| 7060994 |
Exposure apparatus and method |
Jun. 13, 2006 |
| 7057707 |
Method and device for adjusting an alignment microscope by means of a reflective alignment mask |
Jun. 6, 2006 |
| 7053980 |
Lithographic alignment system |
May. 30, 2006 |
| 7053984 |
Method and systems for improving focus accuracy in a lithography system |
May. 30, 2006 |
| 7050147 |
Method of adjusting a height of protrusions on a support surface of a support table, a lithographic projection apparatus, and a support table for supporting an article in a lithographic appara |
May. 23, 2006 |
| 7050151 |
Exposure apparatus, exposure method, and device manufacturing method |
May. 23, 2006 |
| 7046334 |
Displacement correction apparatus, exposure system, exposure method and a computer program product |
May. 16, 2006 |
| 7046333 |
Exposure method |
May. 16, 2006 |
| 7046413 |
System and method for dose control in a lithographic system |
May. 16, 2006 |
| 7042552 |
Alignment strategy optimization method |
May. 9, 2006 |
| 7042551 |
Method of patterning process metrology based on the intrinsic focus offset |
May. 9, 2006 |
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