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Class Information
Number: 355/55
Name: Photocopying > Projection printing and copying cameras > Focus or magnification control
Description: Subject matter including means to move the holder for the original, the objective lens, and the photosensitive paper holder relative to each other for focusing or changing and degree of magnification or reduction; or including structure adapted to allow interchanging of objective lenses of different focal lengths.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7403338 |
Microlens for projection lithography and method of preparation thereof |
Jul. 22, 2008 |
| 7394523 |
Exposure apparatus and method of controlling exposure apparatus |
Jul. 1, 2008 |
| 7391499 |
Lithographic apparatus and device manufacturing method |
Jun. 24, 2008 |
| 7388651 |
Focus monitoring method |
Jun. 17, 2008 |
| 7385700 |
Management system, apparatus, and method, exposure apparatus, and control method therefor |
Jun. 10, 2008 |
| 7385675 |
Lithographic apparatus and device manufacturing method |
Jun. 10, 2008 |
| 7379154 |
Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle |
May. 27, 2008 |
| 7379157 |
Exposure apparatus and method for manufacturing device |
May. 27, 2008 |
| 7379159 |
Lithographic apparatus and device manufacturing method |
May. 27, 2008 |
| 7372545 |
Method for adjusting a projection objective |
May. 13, 2008 |
| 7372546 |
Optical axis adjustment device and exposure apparatus using the same |
May. 13, 2008 |
| 7369214 |
Lithographic apparatus and device manufacturing method utilizing a metrology system with sensors |
May. 6, 2008 |
| 7365830 |
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method |
Apr. 29, 2008 |
| 7357518 |
Projector |
Apr. 15, 2008 |
| 7351348 |
Evaporation control using coating |
Apr. 1, 2008 |
| 7352435 |
Lithographic apparatus and device manufacturing method |
Apr. 1, 2008 |
| 7352440 |
Substrate placement in immersion lithography |
Apr. 1, 2008 |
| 7349064 |
Immersion exposure technique |
Mar. 25, 2008 |
| 7349068 |
Lithographic apparatus and device manufacturing method |
Mar. 25, 2008 |
| 7349071 |
Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing method |
Mar. 25, 2008 |
| 7345739 |
Lithographic alignment system and device manufacturing method |
Mar. 18, 2008 |
| 7342645 |
Stage control apparatus and method, stage apparatus and exposure apparatus |
Mar. 11, 2008 |
| 7342643 |
Method of aligning wafer using database constructed of alignment data in a photolithography process |
Mar. 11, 2008 |
| 7342642 |
Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing method |
Mar. 11, 2008 |
| 7342641 |
Autofocus methods and devices for lithography |
Mar. 11, 2008 |
| 7336340 |
Method of exposure error adjustment in photolithography for multiple products |
Feb. 26, 2008 |
| 7336341 |
Simulator of lithography tool for correcting focus error and critical dimension, simulation method for correcting focus error and critical dimension, and computer medium for storing computer p |
Feb. 26, 2008 |
| 7333176 |
De-focus uniformity correction |
Feb. 19, 2008 |
| 7333175 |
Method and system for aligning a first and second marker |
Feb. 19, 2008 |
| 7332733 |
System and method to correct for field curvature of multi lens array |
Feb. 19, 2008 |
| 7324186 |
Lithographic apparatus and device manufacturing method |
Jan. 29, 2008 |
| 7317508 |
Optical system and method for the production of micro-structured components by microlithography |
Jan. 8, 2008 |
| 7317509 |
Method and system for automated process correction using model parameters, and lithographic apparatus using such method and system |
Jan. 8, 2008 |
| 7315350 |
Exposure apparatus, reticle shape measurement apparatus and method |
Jan. 1, 2008 |
| 7315348 |
Exposure apparatus, focal point detecting method, exposure method and device manufacturing method |
Jan. 1, 2008 |
| 7315033 |
Method and apparatus for reducing biological contamination in an immersion lithography system |
Jan. 1, 2008 |
| 7307692 |
Exposure apparatus and device manufacturing method |
Dec. 11, 2007 |
| 7307707 |
Method and system for measuring the imaging quality of an optical imaging system |
Dec. 11, 2007 |
| 7304716 |
Method for purging an optical lens |
Dec. 4, 2007 |
| 7304717 |
Imaging device in a projection exposure facility |
Dec. 4, 2007 |
| 7301604 |
Method to predict and identify defocus wafers |
Nov. 27, 2007 |
| 7298455 |
Lithographic apparatus and device manufacturing method |
Nov. 20, 2007 |
| 7297911 |
Lithographic apparatus, illumination system, illumination controller and control method |
Nov. 20, 2007 |
| 7295291 |
Apparatus and process for the determination of static lens field curvature |
Nov. 13, 2007 |
| 7292309 |
Exposure apparatus and device manufacturing method |
Nov. 6, 2007 |
| 7292311 |
Scanning exposure technique |
Nov. 6, 2007 |
| 7289192 |
Projection exposure device |
Oct. 30, 2007 |
| 7286207 |
Exposing a semiconductor wafer using two different spectral wavelengths and adjusting for chromatic aberration |
Oct. 23, 2007 |
| 7286208 |
In-situ interferometer arrangement |
Oct. 23, 2007 |
| 7283202 |
In-situ interferometer arrangement |
Oct. 16, 2007 |
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