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Class Information
Number: 355/55
Name: Photocopying > Projection printing and copying cameras > Focus or magnification control
Description: Subject matter including means to move the holder for the original, the objective lens, and the photosensitive paper holder relative to each other for focusing or changing and degree of magnification or reduction; or including structure adapted to allow interchanging of objective lenses of different focal lengths.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7619714 |
Immersion exposure technique |
Nov. 17, 2009 |
| 7619717 |
Method for performing a focus test and a device manufacturing method |
Nov. 17, 2009 |
| 7618755 |
Method and system for automatically detecting exposed substrates having a high probability for defocused exposure fields |
Nov. 17, 2009 |
| 7599043 |
Position measurement system and lithographic apparatus |
Oct. 6, 2009 |
| 7589818 |
Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus |
Sep. 15, 2009 |
| 7583359 |
Reduction of fit error due to non-uniform sample distribution |
Sep. 1, 2009 |
| 7580113 |
Method of reducing a wave front aberration, and computer program product |
Aug. 25, 2009 |
| 7580114 |
Exposure apparatus and method for manufacturing device |
Aug. 25, 2009 |
| 7570344 |
Exposure apparatus and device manufacturing method |
Aug. 4, 2009 |
| 7567340 |
Lithographic apparatus and device manufacturing method |
Jul. 28, 2009 |
| 7566893 |
Best focus detection method, exposure method, and exposure apparatus |
Jul. 28, 2009 |
| 7564535 |
Seamless exposure with projection system comprises array of micromirrors with predefined reflectivity variations |
Jul. 21, 2009 |
| 7564553 |
Polarization evaluation mask, polarization evaluation method, and polarization determination device |
Jul. 21, 2009 |
| 7562336 |
Contrast based resolution enhancement for photolithographic processing |
Jul. 14, 2009 |
| 7561253 |
Method for a multiple exposure, microlithography projection exposure installation and a projection system |
Jul. 14, 2009 |
| 7561248 |
Immersion exposure technique |
Jul. 14, 2009 |
| 7541601 |
Ion beam irradiating apparatus and method of adjusting uniformity of a beam |
Jun. 2, 2009 |
| 7538854 |
Measuring apparatus and exposure apparatus having the same |
May. 26, 2009 |
| 7538858 |
Photolithographic systems and methods for producing sub-diffraction-limited features |
May. 26, 2009 |
| 7538875 |
Lithographic apparatus and methods for use thereof |
May. 26, 2009 |
| 7535551 |
Projection lens unit with focus and level control, related exposure apparatus and method |
May. 19, 2009 |
| 7535001 |
Method and system for focusing a charged particle beam |
May. 19, 2009 |
| 7534552 |
Lithographic apparatus and device manufacturing method |
May. 19, 2009 |
| 7532307 |
Focus determination method, device manufacturing method, and mask |
May. 12, 2009 |
| 7528393 |
Charged particle beam processing apparatus |
May. 5, 2009 |
| 7528931 |
Lithographic apparatus and device manufacturing method |
May. 5, 2009 |
| 7528934 |
Lithographic apparatus and device manufacturing method |
May. 5, 2009 |
| 7525639 |
Exposure apparatus and method, and device manufacturing method using the same |
Apr. 28, 2009 |
| 7525638 |
Lithographic apparatus and device manufacturing method |
Apr. 28, 2009 |
| 7522266 |
Lithographic apparatus and device manufacturing method |
Apr. 21, 2009 |
| 7518706 |
Exposure apparatus, a tilting device method for performing a tilted focus test, and a device manufactured accordingly |
Apr. 14, 2009 |
| 7515250 |
In-situ interferometer arrangement |
Apr. 7, 2009 |
| 7505112 |
Multiple exposure method |
Mar. 17, 2009 |
| 7502097 |
Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly |
Mar. 10, 2009 |
| 7502098 |
Exposure apparatus |
Mar. 10, 2009 |
| 7498106 |
Method and apparatus for controlling etch processes during fabrication of semiconductor devices |
Mar. 3, 2009 |
| 7498596 |
Exposure method that obtains, prior to exposure, reticle surface form data and measurement position error, for scanning control |
Mar. 3, 2009 |
| 7492442 |
Adjustable resolution interferometric lithography system |
Feb. 17, 2009 |
| 7489386 |
System and method for projecting a pattern from a mask onto a substrate |
Feb. 10, 2009 |
| 7486381 |
Lithographic apparatus and device manufacturing method |
Feb. 3, 2009 |
| 7486382 |
Imaging device in a projection exposure machine |
Feb. 3, 2009 |
| 7483121 |
Microlithograph system |
Jan. 27, 2009 |
| 7480028 |
Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer program |
Jan. 20, 2009 |
| 7477355 |
Projection exposure apparatus and projection optical system |
Jan. 13, 2009 |
| 7474381 |
Exposure apparatus and device manufacturing method |
Jan. 6, 2009 |
| 7474382 |
Method for determining focus deviation amount in pattern exposure and pattern exposure method |
Jan. 6, 2009 |
| 7474383 |
Mask making method, mask making device, and mask drawing device |
Jan. 6, 2009 |
| 7474384 |
Lithographic apparatus, device manufacturing method, and a projection element for use in the lithographic apparatus |
Jan. 6, 2009 |
| 7474385 |
Adjustable resolution interferometric lithography system |
Jan. 6, 2009 |
| 7474386 |
Wafer flatness evaluation method, wafer flatness evaluation apparatus carrying out the evaluation method, wafer manufacturing method using the evaluation method, wafer quality assurance method |
Jan. 6, 2009 |
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