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Class Information
Number: 355/52
Name: Photocopying > Projection printing and copying cameras > Distortion introducing or rectifying
Description: Subject matter including means to distort the image transferred to the photosensitive paper, such as magnifying or reducing the image in one direction more than in the other, or including means to correct or compensate for distortion present in the original which is to be copied, such as when the original was taken from an airplane which was at an angle to the earth.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7623220 |
Source optimization for image fidelity and throughput |
Nov. 24, 2009 |
| 7604912 |
Local flare correction |
Oct. 20, 2009 |
| 7605905 |
Method for distortion correction in a microlithographic projection exposure apparatus |
Oct. 20, 2009 |
| 7601471 |
Apparatus and method for correcting pattern dimension and photo mask and test photo mask |
Oct. 13, 2009 |
| 7593091 |
Imaging or exposure device, in particular for making an electronic microcircuit |
Sep. 22, 2009 |
| 7583356 |
Exposure apparatus and device manufacturing method |
Sep. 1, 2009 |
| 7538853 |
Exposure process and apparatus using glass photomasks |
May. 26, 2009 |
| 7534552 |
Lithographic apparatus and device manufacturing method |
May. 19, 2009 |
| 7535549 |
System and method for improvement of alignment and overlay for microlithography |
May. 19, 2009 |
| 7532305 |
Lithographic apparatus and device manufacturing method using overlay measurement |
May. 12, 2009 |
| 7522260 |
Method for correcting astigmatism in a microlithography projection exposure apparatus, a projection objective of such a projection exposure apparatus, and a fabrication method for micropattern |
Apr. 21, 2009 |
| 7515250 |
In-situ interferometer arrangement |
Apr. 7, 2009 |
| 7495742 |
Measuring method and apparatus, exposure method and apparatus using the same, and device manufacturing method |
Feb. 24, 2009 |
| 7463333 |
Multi-exposure lithography system providing increased overlay accuracy |
Dec. 9, 2008 |
| 7446852 |
Projection exposure mask acceptance decision system, projection exposure mask acceptance decision method, method for manufacturing semiconductor device, and computer program project |
Nov. 4, 2008 |
| 7442474 |
Reticle for determining rotational error |
Oct. 28, 2008 |
| 7443484 |
Method for exposing a semiconductor wafer by applying periodic movement to a component |
Oct. 28, 2008 |
| 7440079 |
Lithographic apparatus, alignment system, and device manufacturing method |
Oct. 21, 2008 |
| 7440083 |
Printing a mask with maximum possible process window through adjustment of the source distribution |
Oct. 21, 2008 |
| 7440080 |
Method and apparatus for automatic correction of direct exposure apparatus |
Oct. 21, 2008 |
| 7436484 |
Lithographic apparatus and device manufacturing method |
Oct. 14, 2008 |
| 7436489 |
Device for testing an exposure apparatus |
Oct. 14, 2008 |
| 7426013 |
Exposure apparatus and device fabrication method |
Sep. 16, 2008 |
| 7423726 |
Exposure apparatus and device manufacturing method |
Sep. 9, 2008 |
| 7405803 |
Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium |
Jul. 29, 2008 |
| 7405802 |
Large field of view 2X magnification projection optical system for FPD manufacture |
Jul. 29, 2008 |
| 7403264 |
Lithographic projection apparatus and a device manufacturing method using such lithographic projection apparatus |
Jul. 22, 2008 |
| 7397531 |
Lithographic apparatus and device manufacturing method |
Jul. 8, 2008 |
| 7391497 |
Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium |
Jun. 24, 2008 |
| 7388216 |
Pattern writing and forming method |
Jun. 17, 2008 |
| 7388652 |
Wave front sensor with grey filter and lithographic apparatus comprising same |
Jun. 17, 2008 |
| 7379152 |
Exposure apparatus and exposure method |
May. 27, 2008 |
| 7372539 |
Method for distortion correction in a microlithographic projection exposure apparatus |
May. 13, 2008 |
| 7365826 |
Projection optical system, exposure apparatus and method using the same |
Apr. 29, 2008 |
| 7349065 |
Exposure apparatus and device fabrication method |
Mar. 25, 2008 |
| 7349066 |
Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence |
Mar. 25, 2008 |
| 7345735 |
Apparatus for aberration detection and measurement |
Mar. 18, 2008 |
| 7342643 |
Method of aligning wafer using database constructed of alignment data in a photolithography process |
Mar. 11, 2008 |
| 7336340 |
Method of exposure error adjustment in photolithography for multiple products |
Feb. 26, 2008 |
| 7336341 |
Simulator of lithography tool for correcting focus error and critical dimension, simulation method for correcting focus error and critical dimension, and computer medium for storing computer p |
Feb. 26, 2008 |
| 7330237 |
Exposure apparatus equipped with interferometer and method of using same |
Feb. 12, 2008 |
| 7327436 |
Method for evaluating a local flare, correction method for a mask pattern, manufacturing method for a semiconductor device and a computer program product |
Feb. 5, 2008 |
| 7317512 |
Different polarization in cross-section of a radiation beam in a lithographic apparatus and device manufacturing method |
Jan. 8, 2008 |
| 7312851 |
Projection optical system, exposure apparatus, and exposure method in which a reflective projection optical system has a non-circular aperture stop |
Dec. 25, 2007 |
| 7298458 |
Optical error minimization in a semiconductor manufacturing apparatus |
Nov. 20, 2007 |
| 7286207 |
Exposing a semiconductor wafer using two different spectral wavelengths and adjusting for chromatic aberration |
Oct. 23, 2007 |
| 7286208 |
In-situ interferometer arrangement |
Oct. 23, 2007 |
| 7283202 |
In-situ interferometer arrangement |
Oct. 16, 2007 |
| 7274434 |
Lithographic apparatus and device manufacturing method |
Sep. 25, 2007 |
| 7268360 |
Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion |
Sep. 11, 2007 |
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