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Class Information
Number: 355/30
Name: Photocopying > Projection printing and copying cameras > With temperature or foreign particle control
Description: Subject matter including means to heat, cool, or ventilate any part of the projection or photographing system; or including means to prevent moisture, dust or other foreign matter from coming in contact with the projection or photographing system or including means to remove such foreign matter from the projection or photographing system.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7619714 |
Immersion exposure technique |
Nov. 17, 2009 |
| 7616383 |
Lithographic apparatus and device manufacturing method |
Nov. 10, 2009 |
| 7612353 |
Lithographic apparatus, contaminant trap, and device manufacturing method |
Nov. 3, 2009 |
| 7609361 |
Substrate processing method and substrate processing system |
Oct. 27, 2009 |
| 7604424 |
Substrate processing apparatus |
Oct. 20, 2009 |
| 7602472 |
Contamination prevention system, lithographic apparatus, radiation source, and method for manufacturing a device |
Oct. 13, 2009 |
| 7602470 |
Lithographic apparatus and device manufacturing method |
Oct. 13, 2009 |
| 7602471 |
Apparatus and method for particle monitoring in immersion lithography |
Oct. 13, 2009 |
| 7598507 |
Adjustable lithography blocking device and method |
Oct. 6, 2009 |
| 7595861 |
Exposure apparatus and method of manufacturing device |
Sep. 29, 2009 |
| 7593092 |
Lithographic apparatus and device manufacturing method |
Sep. 22, 2009 |
| 7593093 |
Lithographic apparatus and device manufacturing method |
Sep. 22, 2009 |
| 7589821 |
Exposure apparatus and device manufacturing method |
Sep. 15, 2009 |
| 7589820 |
Exposure apparatus and method for producing device |
Sep. 15, 2009 |
| 7586582 |
Exposure apparatus |
Sep. 8, 2009 |
| 7586113 |
EUV illumination system |
Sep. 8, 2009 |
| 7583361 |
System for controlling a dual mover assembly for an exposure apparatus |
Sep. 1, 2009 |
| 7583358 |
Systems and methods for retrieving residual liquid during immersion lens photolithography |
Sep. 1, 2009 |
| 7583357 |
Lithographic apparatus and device manufacturing method |
Sep. 1, 2009 |
| 7580111 |
Liquid for immersion exposure and immersion exposure method |
Aug. 25, 2009 |
| 7580109 |
Substrate supporting unit, and substrate temperature control apparatus and method |
Aug. 25, 2009 |
| 7580112 |
Containment system for immersion fluid in an immersion lithography apparatus |
Aug. 25, 2009 |
| 7576833 |
Gas curtain type immersion lithography tool using porous material for fluid removal |
Aug. 18, 2009 |
| 7576835 |
Substrate handler, lithographic apparatus and device manufacturing method |
Aug. 18, 2009 |
| 7573560 |
Supporting plate, stage device, exposure apparatus, and exposure method |
Aug. 11, 2009 |
| 7570342 |
Radiation exposure apparatus comprising a gas flushing system |
Aug. 4, 2009 |
| 7570343 |
Microlithographic projection exposure apparatus |
Aug. 4, 2009 |
| 7564535 |
Seamless exposure with projection system comprises array of micromirrors with predefined reflectivity variations |
Jul. 21, 2009 |
| 7561247 |
Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithograph |
Jul. 14, 2009 |
| 7561248 |
Immersion exposure technique |
Jul. 14, 2009 |
| 7561249 |
Exposure apparatus, exposure method, and device manufacturing method |
Jul. 14, 2009 |
| 7561250 |
Lithographic apparatus having parts with a coated film adhered thereto |
Jul. 14, 2009 |
| 7561251 |
Lithographic apparatus and device manufacturing method |
Jul. 14, 2009 |
| 7557900 |
Exposure apparatus, device manufacturing method, maintenance method, and exposure method |
Jul. 7, 2009 |
| 7554648 |
Blind devices and methods for providing continuous thermophoretic protection of lithographic reticle |
Jun. 30, 2009 |
| 7554107 |
Writing method and writing apparatus of charged particle beam, positional deviation measuring method, and position measuring apparatus |
Jun. 30, 2009 |
| 7551265 |
Contact material and system for ultra-clean applications |
Jun. 23, 2009 |
| 7548304 |
Chuck plate assembly with cooling means |
Jun. 16, 2009 |
| 7545479 |
Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine |
Jun. 9, 2009 |
| 7545478 |
Lithographic apparatus, thermal conditioning system, and method for manufacturing a device |
Jun. 9, 2009 |
| 7541601 |
Ion beam irradiating apparatus and method of adjusting uniformity of a beam |
Jun. 2, 2009 |
| 7542127 |
Lithographic apparatus and method for manufacturing a device |
Jun. 2, 2009 |
| 7542128 |
Exposure apparatus, exposure method, and method for producing device |
Jun. 2, 2009 |
| 7538852 |
Exposure apparatus and device manufacturing method |
May. 26, 2009 |
| 7530749 |
Coater/developer and coating/developing method |
May. 12, 2009 |
| 7532304 |
Lithographic apparatus and device manufacturing method |
May. 12, 2009 |
| 7532306 |
Microlithographic projection exposure apparatus |
May. 12, 2009 |
| 7528930 |
Exposure apparatus and device manufacturing method |
May. 5, 2009 |
| 7528929 |
Lithographic apparatus and device manufacturing method |
May. 5, 2009 |
| 7525635 |
Contamination barrier and lithographic apparatus |
Apr. 28, 2009 |
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