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Class Information
Number: 315/111.41
Name: Electric lamp and discharge devices: systems > Discharge device load with fluent material supply to the discharge space > Plasma generating > With magnetic field
Description: Subject matter including means for generating a magnetic field.


Sub-classes under this class:

Class Number Class Name Patents
315/111.61 Acceleration 93
315/111.51 Induction type 309
315/111.71 Plasma containment 185


Patents under this class:
1 2 3 4 5 6 7

Patent Number Title Of Patent Date Issued
7411352 Dual plasma beam sources and method Aug. 12, 2008
7408303 Pulsed plasma accelerator and method Aug. 5, 2008
7404879 Ionized physical vapor deposition apparatus using helical self-resonant coil Jul. 29, 2008
7405411 Ion source with multi-piece outer cathode Jul. 29, 2008
7400096 Large area plasma source Jul. 15, 2008
7391160 Controlled fusion in a field reversed configuration and direct energy conversion Jun. 24, 2008
7371991 Iron beam irradiation device and insulating spacer for the device May. 13, 2008
7372059 Plasma-based EUV light source May. 13, 2008
7342236 Fluid-cooled ion source Mar. 11, 2008
7342361 Plasma source Mar. 11, 2008
7327089 Beam plasma source Feb. 5, 2008
7323821 Device for generating and/or influencing electromagnetic radiation from a plasma Jan. 29, 2008
7319295 High-frequency power supply structure and plasma CVD device using the same Jan. 15, 2008
7316199 Method and apparatus for controlling the magnetic field intensity in a plasma enhanced semiconductor wafer processing chamber Jan. 8, 2008
7315128 Magnetically enhanced capacitive plasma source for ionized physical vapor deposition Jan. 1, 2008
7312579 Hall-current ion source for ion beams of low and high energy for technological applications Dec. 25, 2007
7259378 Closed drift ion source Aug. 21, 2007
7253572 Electromagnetic induced accelerator based on coil-turn modulation Aug. 7, 2007
7250727 High power, long focus electron source for beam processing Jul. 31, 2007
7208878 Method of manufacturing a rotation-magnetron-in-magnetron (RMIM) electrode Apr. 24, 2007
7193369 Method for generating gas plasma Mar. 20, 2007
7180242 Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma Feb. 20, 2007
7180243 Plasma accelerator with closed electron drift Feb. 20, 2007
7129656 Apparatus for magnetic and electrostatic confinement of plasma Oct. 31, 2006
7126283 System and method for generating a discharge in high pressure gases Oct. 24, 2006
7126284 Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma Oct. 24, 2006
7119489 Rotation-magnetron-in-magnetron (RMIM) electrode, method of manufacturing the RMIM electrode, and sputtering apparatus including the RMIM electrode Oct. 10, 2006
7116054 High-efficient ion source with improved magnetic field Oct. 3, 2006
7115185 Pulsed excitation of inductively coupled plasma sources Oct. 3, 2006
7102292 Method and device for removing harmonics in semiconductor plasma processing systems Sep. 5, 2006
7090742 Device for producing inductively coupled plasma and method thereof Aug. 15, 2006
7084572 Plasma-accelerator configuration Aug. 1, 2006
7084573 Magnetically enhanced capacitive plasma source for ionized physical vapor deposition Aug. 1, 2006
7081710 Elementary plasma source and plasma generation apparatus using the same Jul. 25, 2006
7026763 Apparatus for magnetic and electrostatic confinement of plasma Apr. 11, 2006
7015646 Magnetic and electrostatic confinement of plasma with tuning of electrostatic field Mar. 21, 2006
7002148 Controlled fusion in a field reversed configuration and direct energy conversion Feb. 21, 2006
6995515 Formation of a field reversed configuration for magnetic and electrostatic confinement of plasma Feb. 7, 2006
6982520 Hall effect thruster with anode having magnetic field barrier Jan. 3, 2006
6960888 Method of producing and accelerating an ion beam Nov. 1, 2005
6922021 Microwave energized plasma lamp with solid dielectric waveguide Jul. 26, 2005
6906469 Radio frequency ion source with maneuverable electrode(s) Jun. 14, 2005
6900596 Capacitively coupled plasma reactor with uniform radial distribution of plasma May. 31, 2005
6897616 Slow-wave induction plasma transport May. 24, 2005
6894298 Arrangement for generating extreme ultraviolet (EUV) radiation based on a gas discharge May. 17, 2005
6885154 Discharge plasma processing system Apr. 26, 2005
6876154 Plasma processing apparatus Apr. 5, 2005
6873114 Method for toolmatching and troubleshooting a plasma processing system Mar. 29, 2005
6864486 Ion sources Mar. 8, 2005
6853141 Capacitively coupled plasma reactor with magnetic plasma control Feb. 8, 2005

1 2 3 4 5 6 7


 
 
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