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Class Information
Number: 315/111.31
Name: Electric lamp and discharge devices: systems > Discharge device load with fluent material supply to the discharge space > Plasma generating > With extraction electrode
Description: Subject matter including means for removing ions of one charge from the plasma or discharge space.


Patents under this class:
1 2 3

Patent Number Title Of Patent Date Issued
7622721 Focused anode layer ion source with converging and charge compensated beam (falcon) Nov. 24, 2009
7598500 Ion source and metals used in making components thereof and method of making same Oct. 6, 2009
7595594 Arrangement for switching high electric currents by a gas discharge Sep. 29, 2009
7569837 Ion source Aug. 4, 2009
7564042 Ion beam apparatus having plasma sheath controller Jul. 21, 2009
7498592 Non-ambipolar radio-frequency plasma electron source and systems and methods for generating electron beams Mar. 3, 2009
7486758 Combined plasma source and liner implosion system Feb. 3, 2009
7476868 Apparatus and method for generating ions of an ion implanter Jan. 13, 2009
7476849 Technique for monitoring and controlling a plasma process Jan. 13, 2009
7453059 Technique for monitoring and controlling a plasma process Nov. 18, 2008
7420181 Liquid metal ion gun Sep. 2, 2008
7405415 Ion source with particular grid assembly Jul. 29, 2008
7372059 Plasma-based EUV light source May. 13, 2008
7342361 Plasma source Mar. 11, 2008
7321198 Ion source with uniformity of radial distribution of ion beam intensity Jan. 22, 2008
7279845 Plasma processing method and apparatus Oct. 9, 2007
7244475 Plasma treatment apparatus and control method thereof Jul. 17, 2007
7235945 Energy conversion systems Jun. 26, 2007
7204921 Vacuum apparatus and vacuum processing method Apr. 17, 2007
7196337 Particle processing apparatus and methods Mar. 27, 2007
7078862 Beam source and beam processing apparatus Jul. 18, 2006
7071626 Plasma generator Jul. 4, 2006
7045793 Multi-grid ion beam source for generating a highly collimated ion beam May. 16, 2006
7038403 Method and apparatus for maintaining alignment of a cyclotron dee May. 2, 2006
7005782 Charged particle beam extraction and formation apparatus Feb. 28, 2006
6956329 Apparatus and method for forming a high pressure plasma discharge column Oct. 18, 2005
6929712 Plasma processing apparatus capable of evaluating process performance Aug. 16, 2005
6909086 Neutral particle beam processing apparatus Jun. 21, 2005
6909087 Method of processing a surface of a workpiece Jun. 21, 2005
6894298 Arrangement for generating extreme ultraviolet (EUV) radiation based on a gas discharge May. 17, 2005
6885153 Plasma processing apparatus and method Apr. 26, 2005
6870321 High-frequency electron source Mar. 22, 2005
6861643 Neutral particle beam processing apparatus Mar. 1, 2005
6858838 Neutral particle beam processing apparatus Feb. 22, 2005
6759807 Multi-grid ion beam source for generating a highly collimated ion beam Jul. 6, 2004
6717133 Grating pattern and arrangement for mass spectrometers Apr. 6, 2004
6700329 Method and apparatus for providing flow-stabilized microdischarges in metal capillaries Mar. 2, 2004
6670623 Thermal regulation of an ion implantation system Dec. 30, 2003
6563907 Radiation source with shaped emission May. 13, 2003
6554968 Method for measuring and controlling beam current in ion beam processing Apr. 29, 2003
6545419 Double chamber ion implantation system Apr. 8, 2003
6528948 Plasma valve Mar. 4, 2003
6417625 Apparatus and method for forming a high pressure plasma discharge column Jul. 9, 2002
6414438 Method of producing short-wave radiation from a gas-discharge plasma and device for implementing it Jul. 2, 2002
6388381 Constricted glow discharge plasma source May. 14, 2002
6320321 Ion beam processing apparatus for processing work piece with ion beam being neutralized uniformly Nov. 20, 2001
6300720 Plasma gun and methods for the use thereof Oct. 9, 2001
6278241 Four-nozzle plasma generator for forming an activated jet Aug. 21, 2001
6172324 Plasma focus radiation source Jan. 9, 2001
6169370 Method and device for producing plasma with electrodes having openings twice the diameter of the isolator opening Jan. 2, 2001

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