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Class Information
Number: 315/111.11
Name: Electric lamp and discharge devices: systems > Discharge device load with fluent material supply to the discharge space > With tangential fluent material supply
Description: Subject matter including means for directing the fluent material in a direction which is tangential to the discharge space.










Patents under this class:

Patent Number Title Of Patent Date Issued
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8030849 Pulsed plasma device and method for generating pulsed plasma Oct. 4, 2011
7795818 Microwave plasma generation method and microwave plasma generator Sep. 14, 2010
7701145 Solid expellant plasma generator Apr. 20, 2010
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7368876 Plasma processing apparatus May. 6, 2008
7193369 Method for generating gas plasma Mar. 20, 2007
7109660 Plasma processing device and baffle plate thereof Sep. 19, 2006
6608316 Ion implantation beam monitor Aug. 19, 2003
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6420699 Method and apparatus for altering the velocity of molecules Jul. 16, 2002
6087992 Acoustically driven plasma antenna Jul. 11, 2000
4975648 Discharge ionization detector Dec. 4, 1990
4968918 Apparatus for plasma treatment Nov. 6, 1990
4886966 Apparatus for introducing samples into an inductively coupled, plasma source mass spectrometer Dec. 12, 1989
4803405 Plasma processing apparatus and method Feb. 7, 1989
4517495 Multi-electrode plasma source May. 14, 1985
4479075 Capacitatively coupled plasma device Oct. 23, 1984
4426597 Ionized gas generator at very high temperature and very high pressure Jan. 17, 1984
4355262 Electric arc apparatus Oct. 19, 1982
4309187 Metastable energy transfer for analytical luminescence Jan. 5, 1982
4207499 Device and method of starting a long radiation source Jun. 10, 1980
3995189 Low-disturbance transparent electrode for supersonic flow channel Nov. 30, 1976











 
 
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