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Class Information
Number: 257/E29.081
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Semiconductors devices adapted for rectifying, amplifying, oscillating, or switching, capacitors, or resistors with at least one potential-jump barrier or surface barrier (epo) > Electrical characteristics due to properties of entire semiconductor body rather than just surface region (epo) > Characterized by materials of semiconductor body (epo) > Two or more elements from two or more groups of periodic table of elements (e.g., alloys) (epo) > In different semiconductor regions (e.g., heterojunctions) (epo)
Description: This subclass is indented under subclass E29.079. This subclass is substantially the same in scope as ECLA classification H01L29/267.


Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
7405430 Highly uniform group III nitride epitaxial layers on 100 millimeter diameter silicon carbide substrates Jul. 29, 2008
7348606 Nitride-based heterostructure devices Mar. 25, 2008
7304330 Nitride semiconductor device Dec. 4, 2007
7233041 Large-area nanoenabled macroelectronic substrates and uses therefor Jun. 19, 2007
7112830 Super lattice modification of overlying transistor Sep. 26, 2006
7071029 Methods for fabricating final substrates Jul. 4, 2006
7061047 Semiconductor device having trench gate structure and manufacturing method thereof Jun. 13, 2006
7057204 III-V group nitride system semiconductor substrate Jun. 6, 2006
7049678 Diverse band gap energy level semiconductor device May. 23, 2006
7038248 Diverse band gap energy level semiconductor device May. 2, 2006
7019340 Bipolar transistor device and method for fabricating the same Mar. 28, 2006
7015494 Assemblies displaying differential negative resistance Mar. 21, 2006
7002179 ZnO system semiconductor device Feb. 21, 2006
6936900 Integrated transistor devices Aug. 30, 2005
6867067 Methods for fabricating final substrates Mar. 15, 2005
6828628 Diffused MOS devices with strained silicon portions and methods for forming same Dec. 7, 2004
6759719 Edge termination for silicon power devices Jul. 6, 2004
6686646 Diverse band gap energy level semiconductor device Feb. 3, 2004
6657278 Diverse band gap energy level semiconductor device Dec. 2, 2003
6600177 Boron-carbide and boron rich rhombohedral based transistors and tunnel diodes Jul. 29, 2003
6583454 Nitride based transistors on semi-insulating silicon carbide substrates Jun. 24, 2003
6545298 Compound semiconductor rectifier device structure Apr. 8, 2003
6534347 Edge termination for silicon power devices Mar. 18, 2003
6531748 Semiconductor power component with a reduced parasitic bipolar transistor Mar. 11, 2003
6528829 Integrated circuit structure having a charge injection barrier Mar. 4, 2003
6504184 Superior silicon carbide integrated circuits and method of fabricating Jan. 7, 2003
6486502 Nitride based transistors on semi-insulating silicon carbide substrates Nov. 26, 2002
6451711 Epitaxial wafer apparatus Sep. 17, 2002
6445015 Metal sulfide semiconductor transistor devices Sep. 3, 2002
6440786 Boron-carbide and boron rich rhobohedral based transistors and tunnel diodes Aug. 27, 2002
6423990 Vertical heterojunction bipolar transistor Jul. 23, 2002
6403874 High-efficiency heterostructure thermionic coolers Jun. 11, 2002
6380601 Multilayer semiconductor structure with phosphide-passivated germanium substrate Apr. 30, 2002
6362026 Edge termination for silicon power devices Mar. 26, 2002
6323414 Heterostructure thermionic coolers Nov. 27, 2001
6316793 Nitride based transistors on semi-insulating silicon carbide substrates Nov. 13, 2001
6303508 Superior silicon carbide integrated circuits and method of fabricating Oct. 16, 2001
6273950 SiC device and method for manufacturing the same Aug. 14, 2001
6271544 SiC/Si heterostructure semiconductor switch and fabrication thereof Aug. 7, 2001
6246077 Semiconductor device Jun. 12, 2001
6242784 Edge termination for silicon power devices Jun. 5, 2001
6214107 Method for manufacturing a SiC device Apr. 10, 2001
6204522 Switching device Mar. 20, 2001
6194741 MOSgated trench type power semiconductor with silicon carbide substrate and increased gate breakdown voltage and reduced on-resistance Feb. 27, 2001
6187641 Lateral MOSFET having a barrier between the source/drain region and the channel region using a heterostructure raised source/drain region Feb. 13, 2001
6171920 Method of forming heterojunction bipolar transistor having wide bandgap, low interdiffusion base-emitter junction Jan. 9, 2001
6124627 Lateral MOSFET having a barrier between the source/drain region and the channel region using a heterostructure raised source/drain region Sep. 26, 2000
6077760 Structure and method of manufacturing single-crystal silicon carbide/single-crystal silicon heterojunctions with negative differential resistance characteristics Jun. 20, 2000
6064316 Electrical/mechanical access control systems and methods May. 16, 2000
6060331 Method for making heterostructure thermionic coolers May. 9, 2000

1 2 3 4


 
 
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