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Class Information
Number: 257/E21.684
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components or integrated circuits formed in, or on, common substrate (epo) > With subsequent division of substrate into plural individual devices (epo) > To produce devices each consisting of plurality of components, e.g., integrated circuits (epo) > Substrate being semiconductor, using silicon technology (epo) > Field-effect technology (epo) > Mis technology (epo) > Dynamic random access memory structures (dram) (epo) > Read-only memory structures (rom), i.e., nonvolatile memory structures (epo) > Electrically programmable (eprom), i.e., floating gate memory structures (epo) > With conductive layer as control gate (epo) > With source and drain on same level and without cell select transistor (epo) > Simultaneous fabrication of periphery and memory cells (epo) > Including one type of peripheral fet (epo)
Description: This subclass is indented under subclass E21.683. This subclass is substantially the same in scope as ECLA classification H01L21/8247M2P1.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7560342 |
Method of manufacturing a semiconductor device having a plurality of memory and non-memory devices |
Jul. 14, 2009 |
| 7491657 |
Method of manufacturing a semiconductor device having a one time programmable (OTP) erasable and programmable read only memory (EPROM) cell |
Feb. 17, 2009 |
| 7468302 |
Method of forming trench type isolation film of semiconductor device |
Dec. 23, 2008 |
| 7465630 |
Method for manufacturing flash memory device |
Dec. 16, 2008 |
| 7462904 |
Non-volatile memory devices and methods of forming the same |
Dec. 9, 2008 |
| 7166510 |
Method for manufacturing flash memory device |
Jan. 23, 2007 |
| 7091091 |
Nonvolatile memory fabrication methods in which a dielectric layer underlying a floating gate layer is spaced from an edge of an isolation trench and/or an edge of the floating gate layer |
Aug. 15, 2006 |
| 7061044 |
Non-volatile memory device |
Jun. 13, 2006 |
| 7060565 |
Fabrication of dielectric for a nonvolatile memory cell having multiple floating gates |
Jun. 13, 2006 |
| 7045418 |
Semiconductor device including a dielectric layer having a gettering material located therein and a method of manufacture therefor |
May. 16, 2006 |
| 7023047 |
MOS device and process for manufacturing MOS devices using dual-polysilicon layer technology |
Apr. 4, 2006 |
| 7018890 |
Non-volatile semiconductor memory device and manufacturing method thereof |
Mar. 28, 2006 |
| 6949803 |
Manufacturing process for a high voltage transistor integrated on a semiconductor substrate with non-volatile memory cells and corresponding transistor |
Sep. 27, 2005 |
| 6949790 |
Semiconductor device and its manufacturing method |
Sep. 27, 2005 |
| 6927129 |
Narrow wide spacer |
Aug. 9, 2005 |
| 6872667 |
Method of fabricating semiconductor device with separate periphery and cell region etching steps |
Mar. 29, 2005 |
| 6846716 |
Integrated circuit device and method therefor |
Jan. 25, 2005 |
| 6828183 |
Process for high voltage oxide and select gate poly for split-gate flash memory |
Dec. 7, 2004 |
| 6815283 |
Method of manufacturing semiconductor devices |
Nov. 9, 2004 |
| 6815762 |
Semiconductor integrated circuit device and process for manufacturing the same including spacers on bit lines |
Nov. 9, 2004 |
| 6753242 |
Integrated circuit device and method therefor |
Jun. 22, 2004 |
| 6753222 |
Method of manufacturing semiconductor device |
Jun. 22, 2004 |
| 6730564 |
Salicided gate for virtual ground arrays |
May. 4, 2004 |
| 6716701 |
Method of manufacturing a semiconductor memory device |
Apr. 6, 2004 |
| 6709924 |
Fabrication of shallow trench isolation structures with rounded corner and self-aligned gate |
Mar. 23, 2004 |
| 6690051 |
FLASH memory circuitry |
Feb. 10, 2004 |
| 6670227 |
Method for fabricating devices in core and periphery semiconductor regions using dual spacers |
Dec. 30, 2003 |
| 6633057 |
Non-volatile semiconductor memory and fabricating method therefor |
Oct. 14, 2003 |
| 6624022 |
Method of forming FLASH memory |
Sep. 23, 2003 |
| 6621117 |
Semiconductor device having memory cell and peripheral circuitry with dummy electrode |
Sep. 16, 2003 |
| 6613631 |
Method of forming a non-volatile semiconductor memory device with a tunnel barrier film defined by side walls |
Sep. 2, 2003 |
| 6541324 |
Method of forming a semiconductor array of floating gate memory cells having strap regions and a peripheral logic device region |
Apr. 1, 2003 |
| 6528885 |
Anti-deciphering contacts |
Mar. 4, 2003 |
| 6514830 |
Method of manufacturing high voltage transistor with modified field implant mask |
Feb. 4, 2003 |
| 6472327 |
Method and system for etching tunnel oxide to reduce undercutting during memory array fabrication |
Oct. 29, 2002 |
| 6417047 |
Manufacturing method of a non-volatile semiconductor memory device having isolation regions |
Jul. 9, 2002 |
| 6351017 |
High voltage transistor with modified field implant mask |
Feb. 26, 2002 |
| 6306707 |
Double layer hard mask process to improve oxide quality for non-volatile flash memory products |
Oct. 23, 2001 |
| 6294428 |
Method of forming a flash memory device |
Sep. 25, 2001 |
| 6238975 |
Method for improving electrostatic discharge (ESD) robustness |
May. 29, 2001 |
| 6235583 |
Non-volatile semiconductor memory and fabricating method therefor |
May. 22, 2001 |
| 6235587 |
Method of manufacturing a semiconductor device with reduced arc loss in peripheral circuitry region |
May. 22, 2001 |
| 6207509 |
Method of manufacturing a semiconductor device |
Mar. 27, 2001 |
| 6184083 |
Semiconductor device and method of manufacturing the same |
Feb. 6, 2001 |
| 6177312 |
Method for removing contaminate nitrogen from the peripheral gate region of a non-volatile memory device during production of such device |
Jan. 23, 2001 |
| 6133096 |
Process for simultaneously fabricating a stack gate flash memory cell and salicided periphereral devices |
Oct. 17, 2000 |
| 6096602 |
Method for fabricating flash memory cell |
Aug. 1, 2000 |
| 5834351 |
Nitridation process with peripheral region protection |
Nov. 10, 1998 |
| 5763307 |
Block select transistor and method of fabrication |
Jun. 9, 1998 |
| 5756385 |
Dense flash EEPROM cell array and peripheral supporting circuits formed in deposited field oxide with the use of spacers |
May. 26, 1998 |
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