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Class Information
Number: 257/E21.654
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components or integrated circuits formed in, or on, common substrate (epo) > With subsequent division of substrate into plural individual devices (epo) > To produce devices each consisting of plurality of components, e.g., integrated circuits (epo) > Substrate being semiconductor, using silicon technology (epo) > Field-effect technology (epo) > Mis technology (epo) > Dynamic random access memory structures (dram) (epo) > Characterized by type of capacitor (epo) > Characterized by type of transistor; manufacturing of transistor (epo)
Description: This subclass is indented under subclass E21.646. This subclass is substantially the same in scope as ECLA classification H01L21/8242C.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.655 Transistor in u- or v-shaped trench in substrate (epo) 321


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14

Patent Number Title Of Patent Date Issued
8546271 Method of improving oxide growth rate of selective oxidation processes Oct. 1, 2013
8436409 Semiconductor device May. 7, 2013
8124475 Integrated circuit arrangement with capacitor and fabrication method Feb. 28, 2012
8097531 Methods of manufacturing charge trap type memory devices Jan. 17, 2012
8084307 Method for manufacturing thin film transistor Dec. 27, 2011
7955927 Semiconductor device and fabricating method thereof Jun. 7, 2011
7951728 Method of improving oxide growth rate of selective oxidation processes May. 31, 2011
7902582 Tantalum lanthanide oxynitride films Mar. 8, 2011
7820505 Integrated circuit arrangement with capacitor and fabrication method Oct. 26, 2010
7821058 Nonvolatile semiconductor memory and method for manufacturing the same Oct. 26, 2010
7816730 Semiconductor device and method for fabricating the same Oct. 19, 2010
7700426 Nonvolatile memory device and method of forming the same Apr. 20, 2010
7696040 Method for fabrication of fin memory structure Apr. 13, 2010
7674703 Gridded contacts in semiconductor devices Mar. 9, 2010
7632744 Semiconductor integrated circuit device and process for manufacturing the same Dec. 15, 2009
7470585 Integrated circuit and fabrication process Dec. 30, 2008
7365403 Semiconductor topography including a thin oxide-nitride stack and method for making the same Apr. 29, 2008
7232705 Integrated circuit bond pad structures and methods of making Jun. 19, 2007
7091588 Semiconductor device including primary and secondary side circuits on first and second substrates with capacitive insulation Aug. 15, 2006
7060555 Semiconductor device and method of manufacturing the same Jun. 13, 2006
7061050 Semiconductor device utilizing both fully and partially depleted devices Jun. 13, 2006
7057242 Transistor structures having access gates with narrowed central portions Jun. 6, 2006
7052997 Method to form etch and/or CMP stop layers May. 30, 2006
7053459 Semiconductor integrated circuit device and process for producing the same May. 30, 2006
7049649 Semiconductor memory device and method for fabricating the same May. 23, 2006
7049187 Manufacturing method of polymetal gate electrode May. 23, 2006
7046543 Semiconductor memory device with improved data retention characteristics May. 16, 2006
7042052 Transistor constructions and electronic devices May. 9, 2006
7037775 Applying epitaxial silicon in disposable spacer flow May. 2, 2006
7037862 Dielectric layer forming method and devices formed therewith May. 2, 2006
7022530 Semiconductor device and method for fabricating the same Apr. 4, 2006
7012313 MOS transistor in a single-transistor memory cell having a locally thickened gate oxide Mar. 14, 2006
7005393 Method of fabricating a semiconductor device containing nitrogen in an oxide film Feb. 28, 2006
7005342 Method to fabricate surface p-channel CMOS Feb. 28, 2006
6995418 Integrated semiconductor storage with at least a storage cell and procedure Feb. 7, 2006
6992347 Semiconductor storage device Jan. 31, 2006
6987041 Semiconductor device having both memory and logic circuit and its manufacture Jan. 17, 2006
6987069 Fabrication process of a semiconductor integrated circuit device Jan. 17, 2006
6982466 Semiconductor devices including a silicide layer Jan. 3, 2006
6979658 Method of fabricating a semiconductor device containing nitrogen in a gate oxide film Dec. 27, 2005
6979631 Methods of forming semiconductor circuitry Dec. 27, 2005
6979607 Technique to control tunneling currents in DRAM capacitors, cells, and devices Dec. 27, 2005
6977421 Semiconductor constructions Dec. 20, 2005
6977228 Semiconductor device using damascene technique and manufacturing method therefor Dec. 20, 2005
6972223 Use of atomic oxygen process for improved barrier layer Dec. 6, 2005
6967132 Methods of forming semiconductor circuitry Nov. 22, 2005
6967887 Semiconductor memory device including a double-gate dynamic random access memory cell having reduced current leakage Nov. 22, 2005
6965148 Semiconductor memory device and manufacturing method of the same Nov. 15, 2005
6953730 Low-temperature grown high quality ultra-thin CoTiO3 gate dielectrics Oct. 11, 2005
6953975 Semiconductor integrated circuit device Oct. 11, 2005

1 2 3 4 5 6 7 8 9 10 11 12 13 14










 
 
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