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Class Information
Number: 257/E21.639
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components or integrated circuits formed in, or on, common substrate (epo) > With subsequent division of substrate into plural individual devices (epo) > To produce devices each consisting of plurality of components, e.g., integrated circuits (epo) > Substrate being semiconductor, using silicon technology (epo) > Field-effect technology (epo) > Mis technology (epo) > Complementary field-effect transistors, e.g., cmos (epo) > With particular manufacturing method of gate insulating layer, e.g., different gate insulating layer thicknesses, particular gate insulator materials or particular gate insulator implants (epo)
Description: This subclass is indented under subclass E21.632. This subclass is substantially the same in scope as ECLA classification H01L21/8238J.
Patents under this class:
Patent Number |
Title Of Patent |
Date Issued |
8685815 |
Hafnium tantalum titanium oxide films |
Apr. 1, 2014 |
8664066 |
Formation of a channel semiconductor alloy by forming a nitride based hard mask layer |
Mar. 4, 2014 |
8617954 |
Formation of nitrogen containing dielectric layers having an improved nitrogen distribution |
Dec. 31, 2013 |
8597995 |
Metal gate device with low temperature oxygen scavenging |
Dec. 3, 2013 |
8569812 |
Floating body memory cell having gates favoring different conductivity type regions |
Oct. 29, 2013 |
8563444 |
ALD of metal silicate films |
Oct. 22, 2013 |
8552507 |
Semiconductor device and method of manufacturing the same |
Oct. 8, 2013 |
8546211 |
Replacement gate having work function at valence band edge |
Oct. 1, 2013 |
8546271 |
Method of improving oxide growth rate of selective oxidation processes |
Oct. 1, 2013 |
8541275 |
Single metal gate CMOS integration by intermixing polarity specific capping layers |
Sep. 24, 2013 |
8536005 |
Semiconductor integrated circuit device and manufacturing method thereof |
Sep. 17, 2013 |
8530286 |
Low power semiconductor transistor structure and method of fabrication thereof |
Sep. 10, 2013 |
8524554 |
Semiconductor device and method for fabricating the same |
Sep. 3, 2013 |
8513076 |
Non-volatile memory device and method for fabricating the same |
Aug. 20, 2013 |
8501558 |
Semiconductor device and manufacturing method of the same |
Aug. 6, 2013 |
8487384 |
Semiconductor device, power-supply unit, amplifier and method of manufacturing semiconductor device |
Jul. 16, 2013 |
8445344 |
Uniform high-k metal gate stacks by adjusting threshold voltage for sophisticated transistors by diffusing a metal species prior to gate patterning |
May. 21, 2013 |
8440521 |
Method of manufacturing a semiconductor device |
May. 14, 2013 |
8435848 |
PMOS SiGe-last integration process |
May. 7, 2013 |
8426267 |
Semiconductor device and method of manufacturing the same |
Apr. 23, 2013 |
8415731 |
Semiconductor storage device with integrated capacitor and having transistor overlapping sections |
Apr. 9, 2013 |
8405167 |
Hafnium tantalum titanium oxide films |
Mar. 26, 2013 |
8399934 |
Transistor device |
Mar. 19, 2013 |
8399320 |
Electronic apparatus containing lanthanide yttrium aluminum oxide |
Mar. 19, 2013 |
8350341 |
Method and structure for work function engineering in transistors including a high dielectric constant gate insulator and metal gate (HKMG) |
Jan. 8, 2013 |
8334177 |
Methods for forming isolated fin structures on bulk semiconductor material |
Dec. 18, 2012 |
8334183 |
Semiconductor device containing a buried threshold voltage adjustment layer and method of forming |
Dec. 18, 2012 |
8330193 |
Silicon oxide film, production method therefor and semiconductor device having gate insulation film using the same |
Dec. 11, 2012 |
8329540 |
Semiconductor device and manufacturing method thereof |
Dec. 11, 2012 |
8313993 |
Semiconductor device and method for fabricating the same |
Nov. 20, 2012 |
8288832 |
Semiconductor devices including a layer of polycrystalline silicon having a smooth morphology |
Oct. 16, 2012 |
8278165 |
Methods for protecting film layers while removing hardmasks during fabrication of semiconductor devices |
Oct. 2, 2012 |
8247258 |
Method of interconnect for image sensor |
Aug. 21, 2012 |
8247282 |
Enhancing interface characteristics between a channel semiconductor alloy and a gate dielectric by an oxidation process |
Aug. 21, 2012 |
8217435 |
Floating body memory cell having gates favoring different conductivity type regions |
Jul. 10, 2012 |
8207584 |
Semiconductor device and manufacturing method of the same |
Jun. 26, 2012 |
8198155 |
Semiconductor device and method of manufacturing the same |
Jun. 12, 2012 |
8193048 |
Semiconductor device and method of manufacturing a semiconductor device |
Jun. 5, 2012 |
8187961 |
Threshold adjustment for high-K gate dielectric CMOS |
May. 29, 2012 |
8183641 |
Semiconductor device and method for manufacturing same |
May. 22, 2012 |
8153514 |
Method of forming metal/high-.kappa. gate stacks with high mobility |
Apr. 10, 2012 |
8153538 |
Process for annealing semiconductor wafers with flat dopant depth profiles |
Apr. 10, 2012 |
8138045 |
Method of forming sidewall spacers to reduce formation of recesses in the substrate and increase dopant retention in a semiconductor device |
Mar. 20, 2012 |
8129792 |
Semiconductor device and method for manufacturing the same |
Mar. 6, 2012 |
8114727 |
Disposable spacer integration with stress memorization technique and silicon-germanium |
Feb. 14, 2012 |
8110469 |
Graded dielectric layers |
Feb. 7, 2012 |
8088677 |
Method of manufacturing semiconductor device, and semiconductor device |
Jan. 3, 2012 |
8067283 |
Semiconductor device fabricating method |
Nov. 29, 2011 |
8053306 |
PFET with tailored dielectric and related methods and integrated circuit |
Nov. 8, 2011 |
8053313 |
Semiconductor device and method of fabricating the same |
Nov. 8, 2011 |
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