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Class Information
Number: 257/E21.637
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components or integrated circuits formed in, or on, common substrate (epo) > With subsequent division of substrate into plural individual devices (epo) > To produce devices each consisting of plurality of components, e.g., integrated circuits (epo) > Substrate being semiconductor, using silicon technology (epo) > Field-effect technology (epo) > Mis technology (epo) > Complementary field-effect transistors, e.g., cmos (epo) > With particular manufacturing method of gate conductor, e.g., particular materials, shapes (epo) > Gate conductors with different gate conductor materials or different gate conductor implants, e.g., dual gate structures (epo)
Description: This subclass is indented under subclass E21.635. This subclass is substantially the same in scope as ECLA classification H01L21/8238G4.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8685811 Method for manufacturing a CMOS device having dual metal gate Apr. 1, 2014
8686514 Multiple threshold voltages in field effect transistor devices Apr. 1, 2014
8629021 Integration scheme for an NMOS metal gate Jan. 14, 2014
8587039 Method of forming a semiconductor device featuring a gate stressor and semiconductor device Nov. 19, 2013
8580629 Method of fabricating semiconductor device using a work function control film Nov. 12, 2013
8575023 Contact formation method, semiconductor device manufacturing method, and semiconductor device Nov. 5, 2013
8569128 Semiconductor structure and method of fabrication thereof with mixed metal types Oct. 29, 2013
8569844 Metal gate CMOS with at least a single gate metal and dual gate dielectrics Oct. 29, 2013
8530287 ETSOI CMOS with back gates Sep. 10, 2013
8524561 Methods of forming a plurality of transistor gates, and methods of forming a plurality of transistor gates having at least two different work functions Sep. 3, 2013
8492210 Transistor, semiconductor device comprising the transistor and method for manufacturing the same Jul. 23, 2013
8470664 Methods of fabricating a dual polysilicon gate and methods of fabricating a semiconductor device using the same Jun. 25, 2013
8461006 Semiconductor device and method for manufacturing the same Jun. 11, 2013
8395221 Depletion-free MOS using atomic-layer doping Mar. 12, 2013
8372703 Gate dielectric first replacement gate processes and integrated circuits therefrom Feb. 12, 2013
8367502 Method of manufacturing dual gate semiconductor device Feb. 5, 2013
8361866 Modifying work function in PMOS devices by counter-doping Jan. 29, 2013
8357604 Work function adjustment in high-k gate stacks for devices of different threshold voltage Jan. 22, 2013
8354313 Method to optimize work function in complementary metal oxide semiconductor (CMOS) structures Jan. 15, 2013
8349680 High-k metal gate CMOS patterning method Jan. 8, 2013
8343839 Scaled equivalent oxide thickness for field effect transistor devices Jan. 1, 2013
8330234 Semiconductor device and manufacturing process therefor Dec. 11, 2012
8329540 Semiconductor device and manufacturing method thereof Dec. 11, 2012
8313991 Method for fabricating a high-K metal gate MOS Nov. 20, 2012
8304841 Metal gate transistor, integrated circuits, systems, and fabrication methods thereof Nov. 6, 2012
8268712 Method of forming metal gate structure and method of forming metal gate transistor Sep. 18, 2012
8247286 Semiconductor device having transistor and method of manufacturing the same Aug. 21, 2012
8236686 Dual metal gates using one metal to alter work function of another metal Aug. 7, 2012
8207582 Semiconductor devices including dual gate structures Jun. 26, 2012
8183116 Method of manufacturing a double gate transistor May. 22, 2012
8169074 Semiconductor devices including first and second silicon interconnection regions May. 1, 2012
8169033 Semiconductor devices and methods of manufacture thereof May. 1, 2012
8168547 Manufacturing method of semiconductor device May. 1, 2012
8168499 Semiconductor device and method for manufacturing the same May. 1, 2012
8168491 Method for fabricating dual poly gate in semiconductor device May. 1, 2012
8164085 Semiconductor device and production method thereof Apr. 24, 2012
8119474 High performance capacitors in planar back gates CMOS Feb. 21, 2012
8114728 Integration scheme for an NMOS metal gate Feb. 14, 2012
8101987 Semiconductor device and method of fabricating the same Jan. 24, 2012
8093118 Semiconductor structure and method of forming the same Jan. 10, 2012
8076729 Semiconductor device having a dual gate electrode and methods of making the same Dec. 13, 2011
8076732 Semiconductor device Dec. 13, 2011
8034687 Methods of forming a plurality of transistor gates, and methods of forming a plurality of transistor gates having at least two different work functions Oct. 11, 2011
8021990 Gate structure and method Sep. 20, 2011
8021942 Method of forming CMOS device having gate insulation layers of different type and thickness Sep. 20, 2011
8017473 Modifying work function in PMOS devices by counter-doping Sep. 13, 2011
7985669 Selective deposition of noble metal thin films Jul. 26, 2011
7977195 Method for manufacturing a field effect transistor with auto-aligned grids Jul. 12, 2011
7973369 Semiconductor devices and methods of manufacture thereof Jul. 5, 2011
7960223 Structure and method to integrate dual silicide with dual stress liner to improve CMOS performance Jun. 14, 2011

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