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Class Information
Number: 257/E21.636
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components or integrated circuits formed in, or on, common substrate (epo) > With subsequent division of substrate into plural individual devices (epo) > To produce devices each consisting of plurality of components, e.g., integrated circuits (epo) > Substrate being semiconductor, using silicon technology (epo) > Field-effect technology (epo) > Mis technology (epo) > Complementary field-effect transistors, e.g., cmos (epo) > With particular manufacturing method of gate conductor, e.g., particular materials, shapes (epo) > Silicided or salicided gate conductors (epo)
Description: This subclass is indented under subclass E21.635. This subclass is substantially the same in scope as ECLA classification H01L21/8238G2.










Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
8563429 Methods of forming a metal silicide layer for semiconductor devices Oct. 22, 2013
8513122 Method and structure for differential silicide and recessed or raised source/drain to improve field effect transistor Aug. 20, 2013
8497205 Semiconductor device manufacturing method, wiring and semiconductor device Jul. 30, 2013
8482076 Method and structure for differential silicide and recessed or raised source/drain to improve field effect transistor Jul. 9, 2013
8461006 Semiconductor device and method for manufacturing the same Jun. 11, 2013
8410568 Integrated photodiode for semiconductor substrates Apr. 2, 2013
8405131 High performance MOSFET comprising a stressed gate metal silicide layer and method of fabricating the same Mar. 26, 2013
8338247 Semiconductor device and method of manufacturing same Dec. 25, 2012
8330234 Semiconductor device and manufacturing process therefor Dec. 11, 2012
8329526 Cap removal in a high-k metal gate electrode structure by using a sacrificial fill material Dec. 11, 2012
8304841 Metal gate transistor, integrated circuits, systems, and fabrication methods thereof Nov. 6, 2012
8298924 Method for differential spacer removal by wet chemical etch process and device with differential spacer structure Oct. 30, 2012
8299538 Differential nitride pullback to create differential NFET to PFET divots for improved performance versus leakage Oct. 30, 2012
8293631 Semiconductor devices having tensile and/or compressive stress and methods of manufacturing Oct. 23, 2012
8247262 Method for reducing contact resistance of CMOS image sensor Aug. 21, 2012
8168522 Method for fabricating semiconductor device May. 1, 2012
8168499 Semiconductor device and method for manufacturing the same May. 1, 2012
8164085 Semiconductor device and production method thereof Apr. 24, 2012
8153487 Semiconductor device and method for manufacturing the same Apr. 10, 2012
8030149 Method for manufacturing semiconductor device Oct. 4, 2011
8021944 Method for fabricating semiconductor device Sep. 20, 2011
8021942 Method of forming CMOS device having gate insulation layers of different type and thickness Sep. 20, 2011
7994038 Method to reduce MOL damage on NiSi Aug. 9, 2011
7955921 Full silicide gate for CMOS Jun. 7, 2011
7939895 Semiconductor device with forwardly tapered P-type FET gate electrode and reversely tapered N-type FET gate electrode and method of manufacturing same May. 10, 2011
7919820 CMOS semiconductor device and method of fabricating the same Apr. 5, 2011
7902673 Semiconductor device Mar. 8, 2011
7883951 CMOS device with metal and silicide gate electrodes and a method for making it Feb. 8, 2011
7879723 Semiconductor device manufacturing method, wiring and semiconductor device Feb. 1, 2011
7875521 Semiconductor device and production method thereof Jan. 25, 2011
7867899 Wordline resistance reduction method and structure in an integrated circuit memory device Jan. 11, 2011
7858509 High-dielectric film substrate processing method Dec. 28, 2010
7838945 Semiconductor device and manufacturing method thereof Nov. 23, 2010
7838355 Differential nitride pullback to create differential NFET to PFET divots for improved performance versus leakage Nov. 23, 2010
7820500 Single mask scheme method and structure for integrating PMOS and NMOS transistors using strained silicon Oct. 26, 2010
7812413 MOSFET devices and methods for making them Oct. 12, 2010
7803702 Method for fabricating MOS transistors Sep. 28, 2010
7799644 Transistor with asymmetry for data storage circuitry Sep. 21, 2010
7795086 Method of manufacturing semiconductor device using salicide process Sep. 14, 2010
7741217 Dual workfunction silicide diode Jun. 22, 2010
7727832 Semiconductor device and method for manufacturing the same Jun. 1, 2010
7682971 Semiconductor device and method for manufacturing the same Mar. 23, 2010
7667253 Non-volatile memory device with conductive sidewall spacer and method for fabricating the same Feb. 23, 2010
7659133 Method for manufacturing CMOS image sensor Feb. 9, 2010
7638427 MOS transistor with fully silicided gate Dec. 29, 2009
7560329 Semiconductor device and method for fabricating the same Jul. 14, 2009
7547595 Integration scheme method and structure for transistors using strained silicon Jun. 16, 2009
7534709 Semiconductor device and method of manufacturing the same May. 19, 2009
7531467 Manufacturing method of semiconductor device and substrate processing apparatus May. 12, 2009
7494859 Semiconductor device having metal gate patterns and related method of manufacture Feb. 24, 2009

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