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Class Information
Number: 257/E21.635
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components or integrated circuits formed in, or on, common substrate (epo) > With subsequent division of substrate into plural individual devices (epo) > To produce devices each consisting of plurality of components, e.g., integrated circuits (epo) > Substrate being semiconductor, using silicon technology (epo) > Field-effect technology (epo) > Mis technology (epo) > Complementary field-effect transistors, e.g., cmos (epo) > With particular manufacturing method of gate conductor, e.g., particular materials, shapes (epo)
Description: This subclass is indented under subclass E21.632. This subclass is substantially the same in scope as ECLA classification H01L21/8238G.

Sub-classes under this class:

Class Number Class Name Patents
257/E21.637 Gate conductors with different gate conductor materials or different gate conductor implants, e.g., dual gate structures (epo) 524
257/E21.638 Gate conductors with different shapes, lengths or dimensions (epo) 124
257/E21.636 Silicided or salicided gate conductors (epo) 278

Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8685811 Method for manufacturing a CMOS device having dual metal gate Apr. 1, 2014
8673757 Structure and method for using high-k material as an etch stop layer in dual stress layer process Mar. 18, 2014
8609482 Enhancing interface characteristics between a channel semiconductor alloy and a gate dielectric by an oxidation process Dec. 17, 2013
8580625 Metal oxide semiconductor transistor and method of manufacturing the same Nov. 12, 2013
8580634 Methods of forming 3-D semiconductor devices with a nanowire gate structure wherein the nanowire gate structure is formed prior to source/drain formation Nov. 12, 2013
8569128 Semiconductor structure and method of fabrication thereof with mixed metal types Oct. 29, 2013
8551874 MOSFET gate and source/drain contact metallization Oct. 8, 2013
8541274 Methods of forming 3-D semiconductor devices with a nanowire gate structure wherein the nanowire gate structure is formed after source/drain formation Sep. 24, 2013
8535999 Stress memorization process improvement for improved technology performance Sep. 17, 2013
8536005 Semiconductor integrated circuit device and manufacturing method thereof Sep. 17, 2013
8513078 Structure and method for fabricating fin devices Aug. 20, 2013
8470664 Methods of fabricating a dual polysilicon gate and methods of fabricating a semiconductor device using the same Jun. 25, 2013
8455309 Method for manufacturing a semiconductor device Jun. 4, 2013
8445339 Conductor structure, pixel structure, and methods of forming the same May. 21, 2013
8445345 CMOS structure having multiple threshold voltage devices May. 21, 2013
8294238 Nonvolatile semiconductor memory device with reduced size of peripheral circuit area Oct. 23, 2012
8263485 Method for fabricating semiconductor device Sep. 11, 2012
8178406 Split gate device and method for forming May. 15, 2012
8168521 Methods of manufacturing semiconductor devices having low resistance buried gate structures May. 1, 2012
8138076 MOSFETs having stacked metal gate electrodes and method Mar. 20, 2012
8115264 Semiconductor device having a metal gate with a low sheet resistance and method of fabricating metal gate of the same Feb. 14, 2012
8097513 Vertical transistor of semiconductor device and method of forming the same Jan. 17, 2012
8093146 Method of fabricating gate electrode using a hard mask with spacers Jan. 10, 2012
8093116 Method for N/P patterning in a gate last process Jan. 10, 2012
8084826 Semiconductor device and manufacturing method thereof Dec. 27, 2011
8076729 Semiconductor device having a dual gate electrode and methods of making the same Dec. 13, 2011
8076732 Semiconductor device Dec. 13, 2011
8062966 Method for integration of replacement gate in CMOS flow Nov. 22, 2011
8034678 Complementary metal oxide semiconductor device fabrication method Oct. 11, 2011
8021942 Method of forming CMOS device having gate insulation layers of different type and thickness Sep. 20, 2011
7994586 Semiconductor device and manufacturing method of the same Aug. 9, 2011
7994008 Transistor device with two planar gates and fabrication process Aug. 9, 2011
7981740 Enhanced cap layer integrity in a high-K metal gate stack by using a hard mask for offset spacer patterning Jul. 19, 2011
7977181 Method for gate height control in a gate last process Jul. 12, 2011
7947588 Structure and method for a CMOS device with doped conducting metal oxide as the gate electrode May. 24, 2011
7943454 Method for dual stress liner May. 17, 2011
7944005 Semiconductor device and method for fabricating the same May. 17, 2011
7939895 Semiconductor device with forwardly tapered P-type FET gate electrode and reversely tapered N-type FET gate electrode and method of manufacturing same May. 10, 2011
7935599 Nanowire transistor and method for forming same May. 3, 2011
7919376 CMOS transistor and method for manufacturing the same Apr. 5, 2011
7915713 Field effect transistors with channels oriented to different crystal planes Mar. 29, 2011
7897464 Method of manufacturing semiconductor device Mar. 1, 2011
7875543 Strain-silicon CMOS using etch-stop layer and method of manufacture Jan. 25, 2011
7863677 Semiconductor device and method of fabricating the same Jan. 4, 2011
7863174 Vertical pillar transistor Jan. 4, 2011
7851297 Dual workfunction semiconductor device Dec. 14, 2010
7851868 Step gate electrode structures for field-effect transistors and methods for fabricating the same Dec. 14, 2010
7833849 Method of fabricating a semiconductor structure including one device region having a metal gate electrode located atop a thinned polygate electrode Nov. 16, 2010
7824980 Semiconductor device and method for manufacturing the same Nov. 2, 2010
7795086 Method of manufacturing semiconductor device using salicide process Sep. 14, 2010

1 2 3 4

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