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Class Information
Number: 257/E21.625
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components or integrated circuits formed in, or on, common substrate (epo) > With subsequent division of substrate into plural individual devices (epo) > To produce devices each consisting of plurality of components, e.g., integrated circuits (epo) > Substrate being semiconductor, using silicon technology (epo) > Field-effect technology (epo) > Mis technology (epo) > With particular manufacturing method of gate insulating layer, e.g., different gate insulating layer thicknesses, particular gate insulator materials or particular gate insulator implants (epo)
Description: This subclass is indented under subclass E21.616. This subclass is substantially the same in scope as ECLA classification H01L21/8234J.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8691638 High-K metal gate device Apr. 8, 2014
8685815 Hafnium tantalum titanium oxide films Apr. 1, 2014
8673711 Methods of fabricating a semiconductor device having a high-K gate dielectric layer and semiconductor devices fabricated thereby Mar. 18, 2014
8652908 Semiconductor devices employing high-K dielectric layers as a gate insulating layer and methods of fabricating the same Feb. 18, 2014
8642374 Image sensor with reduced noise by blocking nitridation using photoresist Feb. 4, 2014
8633536 Gate dielectric of semiconductor device Jan. 21, 2014
8617954 Formation of nitrogen containing dielectric layers having an improved nitrogen distribution Dec. 31, 2013
8569812 Floating body memory cell having gates favoring different conductivity type regions Oct. 29, 2013
8563444 ALD of metal silicate films Oct. 22, 2013
8563441 Methods for fabricating memory cells having fin structures with smooth sidewalls and rounded top corners and edges Oct. 22, 2013
8546211 Replacement gate having work function at valence band edge Oct. 1, 2013
8525274 Semiconductor device and method of manufacturing the same Sep. 3, 2013
8513076 Non-volatile memory device and method for fabricating the same Aug. 20, 2013
8513739 Metal-gate high-k reference structure Aug. 20, 2013
8487384 Semiconductor device, power-supply unit, amplifier and method of manufacturing semiconductor device Jul. 16, 2013
8487368 Low voltage power MOSFET device and process for its manufacture Jul. 16, 2013
8470659 Method for reducing interfacial layer thickness for high-k and metal gate stack Jun. 25, 2013
8470675 Thick gate oxide for LDMOS and DEMOS Jun. 25, 2013
8460992 Semiconductor device and method of manufacturing the same Jun. 11, 2013
8450216 Contact etch stop layers of a field effect transistor May. 28, 2013
8445344 Uniform high-k metal gate stacks by adjusting threshold voltage for sophisticated transistors by diffusing a metal species prior to gate patterning May. 21, 2013
8435861 Method of manufacturing a semiconductor device having different kinds of insulating films with different thicknesses May. 7, 2013
8435858 Semiconductor device manufacturing method May. 7, 2013
8426267 Semiconductor device and method of manufacturing the same Apr. 23, 2013
8415211 Semiconductor device, method of fabricating the same, and patterning mask utilizied by the method Apr. 9, 2013
8410559 Selectively self-assembling oxygen diffusion barrier Apr. 2, 2013
8404575 Semiconductor device and method for manufacturing same Mar. 26, 2013
8405167 Hafnium tantalum titanium oxide films Mar. 26, 2013
8399320 Electronic apparatus containing lanthanide yttrium aluminum oxide Mar. 19, 2013
8399952 Integrated circuit devices having a strontium ruthenium oxide interface Mar. 19, 2013
8372718 Manufacturing method of semiconductor device and semiconductor device Feb. 12, 2013
8367558 Method for tuning the work function of a metal gate of the PMOS device Feb. 5, 2013
8357604 Work function adjustment in high-k gate stacks for devices of different threshold voltage Jan. 22, 2013
8350341 Method and structure for work function engineering in transistors including a high dielectric constant gate insulator and metal gate (HKMG) Jan. 8, 2013
8344422 Semiconductor device Jan. 1, 2013
8334183 Semiconductor device containing a buried threshold voltage adjustment layer and method of forming Dec. 18, 2012
8288833 Semiconductor device and manufacturing method thereof Oct. 16, 2012
8288832 Semiconductor devices including a layer of polycrystalline silicon having a smooth morphology Oct. 16, 2012
8288232 Manufacturing method of semiconductor device and semiconductor device Oct. 16, 2012
8268683 Method for reducing interfacial layer thickness for high-K and metal gate stack Sep. 18, 2012
8258570 Semiconductor device Sep. 4, 2012
8247282 Enhancing interface characteristics between a channel semiconductor alloy and a gate dielectric by an oxidation process Aug. 21, 2012
8222111 Simultaneous formation of a top oxide layer in a silicon-oxide-nitride-oxide-silicon (SONOS) transistor and a gate oxide in a metal oxide semiconductor (MOS) Jul. 17, 2012
8217453 Bi-directional DMOS with common drain Jul. 10, 2012
8217435 Floating body memory cell having gates favoring different conductivity type regions Jul. 10, 2012
8207584 Semiconductor device and manufacturing method of the same Jun. 26, 2012
8198155 Semiconductor device and method of manufacturing the same Jun. 12, 2012
8187942 Method for manufacturing semiconductor device having a dual gate insulation layer May. 29, 2012
8138537 Semiconductor device with grooved capacitor structure Mar. 20, 2012
8138076 MOSFETs having stacked metal gate electrodes and method Mar. 20, 2012

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