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Class Information
Number: 257/E21.621
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components or integrated circuits formed in, or on, common substrate (epo) > With subsequent division of substrate into plural individual devices (epo) > To produce devices each consisting of plurality of components, e.g., integrated circuits (epo) > Substrate being semiconductor, using silicon technology (epo) > Field-effect technology (epo) > Mis technology (epo) > With particular manufacturing method of gate conductor, e.g., particular materials, shapes (epo)
Description: This subclass is indented under subclass E21.616. This subclass is substantially the same in scope as ECLA classification H01L21/8234G.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.623 Gate conductors with different gate conductor materials or different gate conductor implants, e.g., dual gate structures (epo) 191
257/E21.624 Gate conductors with different shapes, lengths or dimensions (epo) 146
257/E21.622 Silicided or salicided gate conductors (epo) 144


Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8709899 Vertical gate LDMOS device Apr. 29, 2014
8647950 Vertical gate LDMOS device Feb. 11, 2014
8637371 Non-planar MOSFET structures with asymmetric recessed source drains and methods for making the same Jan. 28, 2014
8614467 Method of gate work function adjustment and metal gate transistor Dec. 24, 2013
8569798 Semicondcutor device comprising transistor Oct. 29, 2013
8557621 Method for manufacturing thin film transistor array panel Oct. 15, 2013
8541281 Replacement gate process flow for highly scaled semiconductor devices Sep. 24, 2013
8525263 Programmable high-k/metal gate memory device Sep. 3, 2013
8513078 Structure and method for fabricating fin devices Aug. 20, 2013
8513739 Metal-gate high-k reference structure Aug. 20, 2013
8507338 Semiconductor structure and fabricating method thereof Aug. 13, 2013
8482075 Structure and method for manufacturing asymmetric devices Jul. 9, 2013
8470647 Semiconductor device and manufacturing method thereof Jun. 25, 2013
8455309 Method for manufacturing a semiconductor device Jun. 4, 2013
8445339 Conductor structure, pixel structure, and methods of forming the same May. 21, 2013
8435846 Semiconductor devices with raised extensions May. 7, 2013
8410547 Semiconductor device and method for fabricating the same Apr. 2, 2013
8362546 Cross-point diode arrays and methods of manufacturing cross-point diode arrays Jan. 29, 2013
8338892 Strain enhancement in transistors comprising an embedded strain-inducing semiconductor alloy by corner rounding at the top of the gate electrode Dec. 25, 2012
8252654 Method for manufacturing memory cell Aug. 28, 2012
8252681 Methods of forming integrated circuit devices having electrically conductive layers therein with partially nitridated sidewalls Aug. 28, 2012
8252675 Methods of forming CMOS transistors with high conductivity gate electrodes Aug. 28, 2012
8242558 Semiconductor device and method for production of semiconductor device Aug. 14, 2012
8237231 Device with aluminum surface protection Aug. 7, 2012
8227342 Method of fabricating a transistor with semiconductor gate combined locally with a metal Jul. 24, 2012
8168521 Methods of manufacturing semiconductor devices having low resistance buried gate structures May. 1, 2012
8148222 Cross-point diode arrays and methods of manufacturing cross-point diode arrays Apr. 3, 2012
8148247 Method and algorithm for random half pitched interconnect layout with constant spacing Apr. 3, 2012
8119473 High temperature anneal for aluminum surface protection Feb. 21, 2012
8105931 Method of fabricating dual high-k metal gates for MOS devices Jan. 31, 2012
8097513 Vertical transistor of semiconductor device and method of forming the same Jan. 17, 2012
8093146 Method of fabricating gate electrode using a hard mask with spacers Jan. 10, 2012
8071445 Method for manufacturing semiconductor device, and semiconductor device Dec. 6, 2011
8044433 GaN-based high electron mobility transistor (HEMT) with an embedded gate electrode having a first recess portion and a second recess portion to improve drain breakdown voltage Oct. 25, 2011
8039334 Shared gate for conventional planar device and horizontal CNT Oct. 18, 2011
8034692 Structure and method for manufacturing asymmetric devices Oct. 11, 2011
7994008 Transistor device with two planar gates and fabrication process Aug. 9, 2011
7964465 Transistors having asymmetric strained source/drain portions Jun. 21, 2011
7960761 Semiconductor device having a recess channel transistor Jun. 14, 2011
7951678 Metal-gate high-k reference structure May. 31, 2011
7915713 Field effect transistors with channels oriented to different crystal planes Mar. 29, 2011
7892957 Gate CD trimming beyond photolithography Feb. 22, 2011
7871913 Method for manufacturing semiconductor device having vertical transistor Jan. 18, 2011
7871910 Flash memory device and method of fabricating the same Jan. 18, 2011
7863677 Semiconductor device and method of fabricating the same Jan. 4, 2011
7855141 Semiconductor device having multiple wiring layers and method of producing the same Dec. 21, 2010
7855411 Memory cell Dec. 21, 2010
7781849 Semiconductor devices and methods of fabricating the same Aug. 24, 2010
7776680 Complementary metal oxide semiconductor device with an electroplated metal replacement gate Aug. 17, 2010
7745326 Semiconductor device having multiple wiring layers and method of producing the same Jun. 29, 2010

1 2 3 4










 
 
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