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Class Information
Number: 257/E21.62
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components or integrated circuits formed in, or on, common substrate (epo) > With subsequent division of substrate into plural individual devices (epo) > To produce devices each consisting of plurality of components, e.g., integrated circuits (epo) > Substrate being semiconductor, using silicon technology (epo) > Field-effect technology (epo) > Mis technology (epo) > With particular manufacturing method of source or drain, e.g., specific s or d implants or silicided s or d structures or raised s or d structures (epo) > Manufacturing common source or drain regions between plurality of conductor-insulator-semiconductor structures (epo)
Description: This subclass is indented under subclass E21.619. This subclass is substantially the same in scope as ECLA classification H01L21/8234D2.










Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8642435 Performing treatment on stressors Feb. 4, 2014
8518776 Methods for producing a tunnel field-effect transistor Aug. 27, 2013
8492229 Method and layout of semiconductor device with reduced parasitics Jul. 23, 2013
8404534 End-to-end gap fill using dielectric film Mar. 26, 2013
8093130 Method of manufacturing a semiconductor device having raised source and drain of differing heights Jan. 10, 2012
7960788 Replacing symmetric transistors with asymmetric transistors Jun. 14, 2011
7902581 Semiconductor device comprising a contact structure based on copper and tungsten Mar. 8, 2011
7883984 Method of manufacturing flash memory device Feb. 8, 2011
7863683 Fin field effect transistor and method for forming the same Jan. 4, 2011
7800200 Wireless IC tag and method for manufacturing same Sep. 21, 2010
7767531 Method of forming transistor having channel region at sidewall of channel portion hole Aug. 3, 2010
7732247 Isolation techniques for reducing dark current in CMOS image sensors Jun. 8, 2010
7704825 Method of fabricating memory including diode Apr. 27, 2010
7678656 Method of fabricating an enhanced resurf HVPMOS device Mar. 16, 2010
7572684 Nonvolatile memory devices and methods of forming the same Aug. 11, 2009
7569404 Ink-jet printhead fabrication Aug. 4, 2009
7435647 NOR-type flash memory device and manufacturing method thereof Oct. 14, 2008
7411245 Spacer barrier structure to prevent spacer voids and method for forming the same Aug. 12, 2008
7326607 Imager floating diffusion region and process for forming same Feb. 5, 2008
7064026 Semiconductor device having shared contact and fabrication method thereof Jun. 20, 2006
7064392 Semiconductor device Jun. 20, 2006
7045449 Methods of forming semiconductor constructions May. 16, 2006
7045405 Semiconductor processing methods of forming integrated circuitry May. 16, 2006
7034354 Semiconductor structure with lining layer partially etched on sidewall of the gate Apr. 25, 2006
7015089 Method to improve etching of resist protective oxide (RPO) to prevent photo-resist peeling Mar. 21, 2006
7008835 Method of manufacturing a semiconductor device having a gate structure with low parasitic capacitance Mar. 7, 2006
7009257 Methods of manufacturing integrated circuit devices having reduced contact resistance between a substrate and a contact pad while maintaining separation of the substrate and the contact pad an Mar. 7, 2006
6987038 Method for fabricating MOS field effect transistor Jan. 17, 2006
6977228 Semiconductor device using damascene technique and manufacturing method therefor Dec. 20, 2005
6972223 Use of atomic oxygen process for improved barrier layer Dec. 6, 2005
6963094 Metal oxide semiconductor transistors having a drain punch through blocking region and methods for fabricating metal oxide semiconductor transistors having a drain punch through blocking regio Nov. 8, 2005
6927119 Semiconductor device having landing pad and fabrication method thereof Aug. 9, 2005
6927461 Semiconductor device having shared contact and fabrication method thereof Aug. 9, 2005
6924225 Method for producing an electrically conductive contact Aug. 2, 2005
6916716 Asymmetric halo implants Jul. 12, 2005
6914309 Semiconductor device with double sidewall spacer and layered contact Jul. 5, 2005
6913979 Method of manufacturing a metal oxide semiconductor transistor Jul. 5, 2005
6900086 Semiconductor device having MISFETs May. 31, 2005
6890823 Methods of forming integrated circuits with thermal oxide layers on side walls of gate electrodes wherein the source and drain are higher than the gate electrode May. 10, 2005
6879009 Integrated circuit with MOSFETS having bi-layer metal gate electrodes Apr. 12, 2005
6875646 Semiconductor processing methods of forming integrated circuitry Apr. 5, 2005
6873008 Asymmetrical devices for short gate length performance with disposable sidewall Mar. 29, 2005
6869891 Semiconductor device having groove and method of fabricating the same Mar. 22, 2005
6867141 Method for fabricating semiconductor device and forming interlayer dielectric film using high-density plasma Mar. 15, 2005
6846732 Semiconductor device fabrication method Jan. 25, 2005
6841851 Semiconductor device having a high density plasma oxide layer Jan. 11, 2005
6838732 Semiconductor device and method for manufacturing the same Jan. 4, 2005
6835640 Method of forming a novel composite insulator spacer Dec. 28, 2004
6833591 Semiconductor device and method for fabricating the same Dec. 21, 2004
6831012 Method for forming a silicide film of a semiconductor device Dec. 14, 2004

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