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Class Information
Number: 257/E21.593
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture of specific parts of devices (epo) > Interconnections, comprising conductors and dielectrics, for carrying current between separate components within device (epo) > Characterized by formation and post treatment of dielectrics, e.g., planarizing (epo) > Modifying pattern or conductivity of conductive members, e.g., formation of alloys, reduction of contact resistances (epo) > By forming silicide of refractory metal (epo)
Description: This subclass is indented under subclass E21.591. This subclass is substantially the same in scope as ECLA classification H01L21/768C8C.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8673694 Thin film transistor array panel and method of manufacturing the same Mar. 18, 2014
8642377 Method of producing conductive thin film Feb. 4, 2014
8617992 Method of forming metal silicide contact and metal interconnect Dec. 31, 2013
8481378 Effecting selectivity of silicon or silicon-germanium deposition on a silicon or silicon-germanium substrate by doping Jul. 9, 2013
8470707 Silicide method Jun. 25, 2013
8461012 Device with ground plane for high frequency signal transmission and method therefor Jun. 11, 2013
8450216 Contact etch stop layers of a field effect transistor May. 28, 2013
8409985 Methods for growing low-resistivity tungsten for high aspect ratio and small features Apr. 2, 2013
8334574 Semiconductor contact structure and method of fabricating the same Dec. 18, 2012
8324058 Contacts for FET devices Dec. 4, 2012
8278199 Method of manufacturing a semiconductor device Oct. 2, 2012
8258626 Copper interconnection, method for forming copper interconnection structure, and semiconductor device Sep. 4, 2012
8237264 Method of manufacturing semiconductor device and thermal annealing apparatus Aug. 7, 2012
8187970 Process for forming cobalt and cobalt silicide materials in tungsten contact applications May. 29, 2012
8158483 Semiconductor device and its manufacturing method Apr. 17, 2012
8158518 Methods of making metal silicide contacts, interconnects, and/or seed layers Apr. 17, 2012
8080452 Effecting selectivity of silicon or silicon-germanium deposition on a silicon or silicon-germanium substrate by doping Dec. 20, 2011
8076239 Semiconductor device and method of manufacturing the same Dec. 13, 2011
8056500 Thermal reactor with improved gas flow distribution Nov. 15, 2011
8053347 Method of manufacturing semiconductor device Nov. 8, 2011
8053860 Semiconductor device and manufacturing method of the same Nov. 8, 2011
8039378 Method of manufacturing a semiconductor device Oct. 18, 2011
8030210 Contact barrier structure and manufacturing methods Oct. 4, 2011
8017506 Semiconductor device and method for forming the same Sep. 13, 2011
7998858 Vertical interconnect structure, memory device and associated production method Aug. 16, 2011
7993987 Surface cleaning using sacrificial getter layer Aug. 9, 2011
7955972 Methods for growing low-resistivity tungsten for high aspect ratio and small features Jun. 7, 2011
7928008 Method for fabricating semiconductor device Apr. 19, 2011
7902056 Plasma treated metal silicide layer formation Mar. 8, 2011
7897414 Method of manufacturing semiconductor device and thermal annealing apparatus Mar. 1, 2011
7829430 Methods for preparing and devices with treated dummy moats Nov. 9, 2010
7830010 Surface treatment for selective metal cap applications Nov. 9, 2010
7811928 Semiconductor devices and fabrication methods thereof Oct. 12, 2010
7803707 Metal silicide nanowires and methods for their production Sep. 28, 2010
7799628 Advanced metal gate method and device Sep. 21, 2010
7795100 Semiconductor device and its manufacturing method Sep. 14, 2010
7786004 Method of treating an exposed conductive film prior to forming a silicide Aug. 31, 2010
7750471 Metal and alloy silicides on a single silicon wafer Jul. 6, 2010
7749898 Silicide interconnect structure Jul. 6, 2010
7745334 Technique for locally adapting transistor characteristics by using advanced laser/flash anneal techniques Jun. 29, 2010
7737555 Semiconductor method having silicon-diffused metal wiring layer Jun. 15, 2010
7713798 Thin film transistor substrate having nickel-silicide layer May. 11, 2010
7678694 Method for fabricating semiconductor device with silicided gate Mar. 16, 2010
7670941 Method for production of semiconductor devices Mar. 2, 2010
7638433 Semiconductor device and method of fabricating the same Dec. 29, 2009
7622388 Methods of forming titanium-containing materials Nov. 24, 2009
7589017 Methods for growing low-resistivity tungsten film Sep. 15, 2009
7553757 Semiconductor device and method of manufacturing the same Jun. 30, 2009
7550323 Electrical fuse with a thinned fuselink middle portion Jun. 23, 2009
7538029 Method of room temperature growth of SiO.sub.x on silicide as an etch stop layer for metal contact open of semiconductor devices May. 26, 2009

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