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Class Information
Number: 257/E21.59
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture of specific parts of devices (epo) > Interconnections, comprising conductors and dielectrics, for carrying current between separate components within device (epo) > Characterized by formation and post treatment of dielectrics, e.g., planarizing (epo) > Local interconnects; local pads (epo)
Description: This subclass is indented under subclass E21.582. This subclass is substantially the same in scope as ECLA classification H01L21/768C10.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6479378 |
Process for forming electrical interconnects in integrated circuits |
Nov. 12, 2002 |
| 6476488 |
Method for fabricating borderless and self-aligned polysilicon and metal contact landing plugs for multilevel interconnections |
Nov. 5, 2002 |
| 6476490 |
Contact openings, electrical connections and interconnections for integrated circuitry |
Nov. 5, 2002 |
| 6472303 |
Method of forming a contact plug for a semiconductor device |
Oct. 29, 2002 |
| 6468855 |
Reduced topography DRAM cell fabricated using a modified logic process and method for operating same |
Oct. 22, 2002 |
| 6468857 |
Method for forming a semiconductor device having a plurality of circuits parts |
Oct. 22, 2002 |
| 6468883 |
Semiconductor processing methods of forming contact openings, methods of forming electrical connections and interconnections |
Oct. 22, 2002 |
| 6468899 |
Contactless local interconnect process utilizing self-aligned silicide |
Oct. 22, 2002 |
| 6468905 |
Methods of restricting silicon migration |
Oct. 22, 2002 |
| 6468919 |
Method of making a local interconnect in an embedded memory |
Oct. 22, 2002 |
| 6469336 |
Structure for reducing contact aspect ratios |
Oct. 22, 2002 |
| 6465310 |
Methods of forming self-aligned contact pads on electrically conductive lines |
Oct. 15, 2002 |
| 6465364 |
Method for fabrication of a contact plug in an embedded memory |
Oct. 15, 2002 |
| 6461951 |
Method of forming a sidewall spacer to prevent gouging of device junctions during interlayer dielectric etching including silicide growth over gate spacers |
Oct. 8, 2002 |
| 6462395 |
Semiconductor device and method of producing the same |
Oct. 8, 2002 |
| 6462403 |
Semiconductor device comprising thin film transistors having a passivation film formed thereon |
Oct. 8, 2002 |
| 6458680 |
Method of fabricating contact pads of a semiconductor device |
Oct. 1, 2002 |
| 6455407 |
Methods of forming memory circuitry, methods of forming electrical connections, and methods of forming dynamic random access memory (DRAM) circuitry |
Sep. 24, 2002 |
| 6455918 |
Integrated circuitry |
Sep. 24, 2002 |
| 6451634 |
Method of fabricating a multistack 3-dimensional high density semiconductor device |
Sep. 17, 2002 |
| 6451651 |
Method of manufacturing DRAM device invention |
Sep. 17, 2002 |
| 6448179 |
Method for fabricating semiconductor device |
Sep. 10, 2002 |
| 6448631 |
Cell architecture with local interconnect and method for making same |
Sep. 10, 2002 |
| 6444520 |
Method of forming dual conductive plugs |
Sep. 3, 2002 |
| 6440781 |
Method of adding bias-independent aluminum bridged anti-fuses to a tungsten plug process |
Aug. 27, 2002 |
| 6440795 |
Hemispherical grained silicon on conductive nitride |
Aug. 27, 2002 |
| 6440826 |
NiSi contacting extensions of active regions |
Aug. 27, 2002 |
| 6441320 |
Electrically conductive projections having conductive coverings |
Aug. 27, 2002 |
| 6441419 |
Encapsulated-metal vertical-interdigitated capacitor and damascene method of manufacturing same |
Aug. 27, 2002 |
| 6436746 |
Transistor having an improved gate structure and method of construction |
Aug. 20, 2002 |
| 6436758 |
Method for forming storage node contact plug of DRAM (dynamic random access memory) |
Aug. 20, 2002 |
| 6436805 |
Local interconnect structures and methods for making the same |
Aug. 20, 2002 |
| 6437391 |
Capacitor for semiconductor devices |
Aug. 20, 2002 |
| 6432764 |
Methods of forming resistors |
Aug. 13, 2002 |
| 6433381 |
Semiconductor device and method of manufacturing the same |
Aug. 13, 2002 |
| 6433397 |
N-channel metal oxide semiconductor (NMOS) driver circuit and method of making same |
Aug. 13, 2002 |
| 6429520 |
Semiconductor component with silicon wiring and method of fabricating the component |
Aug. 6, 2002 |
| 6429124 |
Local interconnect structures for integrated circuits and methods for making the same |
Aug. 6, 2002 |
| 6426249 |
Buried metal dual damascene plate capacitor |
Jul. 30, 2002 |
| 6426263 |
Method for making a merged contact window in a transistor to electrically connect the gate to either the source or the drain |
Jul. 30, 2002 |
| 6426528 |
Method of fabricating conductive straps to interconnect contacts to corresponding digit lines by employing an angled sidewall implant and semiconductor devices fabricated thereby |
Jul. 30, 2002 |
| 6426558 |
Metallurgy for semiconductor devices |
Jul. 30, 2002 |
| 6423606 |
Semiconductor processing methods, methods of forming a resistor and methods of forming a diode |
Jul. 23, 2002 |
| 6423620 |
SEMICONDUCTOR PROCESSING METHODS OF FORMING CONTACT OPENINGS, METHODS OF FORMING MEMORY CIRCUITRY, METHODS OF FORMING ELECTRICAL CONNECTIONS, AND METHODS OF FORMING DYNAMIC RANDOM ACCESS MEMOR |
Jul. 23, 2002 |
| 6420227 |
Semiconductor integrated circuit device and process for manufacture of the same |
Jul. 16, 2002 |
| 6420273 |
Self-aligned etch-stop layer formation for semiconductor devices |
Jul. 16, 2002 |
| 6420746 |
Three device DRAM cell with integrated capacitor and local interconnect |
Jul. 16, 2002 |
| 6420749 |
Trench field shield in trench isolation |
Jul. 16, 2002 |
| 6417104 |
Method for making a low resistivity electrode having a near noble metal |
Jul. 9, 2002 |
| 6413832 |
Method for forming inner-cylindrical capacitor without top electrode mask |
Jul. 2, 2002 |
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