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Class Information
Number: 257/E21.561
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture of specific parts of devices (epo) > Making of isolation regions between components (epo) > Dielectric regions, e.g., epic dielectric isolation, locos; trench refilling techniques, soi technology, use of channel stoppers (epo) > Using semiconductor or insulator technology, i.e., soi technology (epo)
Description: This subclass is indented under subclass E21.545. This subclass is substantially the same in scope as ECLA classification H01L21/762D.










Sub-classes under this class:

Class Number Class Name Patents
257/E21.564 Soi together with lateral isolation, e.g., using local oxidation of silicon, or dielectric or polycrystalline material refilled trench or air gap isolation regions, e.g., completely isolated semiconductor islands (epo) 883
257/E21.567 Using bonding technique (epo) 522
257/E21.565 Using full isolation by porous oxide silicon, i.e., fipos technique (epo) 33
257/E21.566 Using lateral overgrowth technique, i.e., elo techniques (epo) 78
257/E21.562 Using selective deposition of single crystal silicon, e.g., selective epitaxial growth (seg) (epo) 102
257/E21.563 Using silicon implanted buried insulating layers, e.g., oxide layers, i.e., simox technique (epo) 209


Patents under this class:
1 2 3 4 5 6 7 8 9 10

Patent Number Title Of Patent Date Issued
8703531 Manufacturing method of oxide semiconductor film and manufacturing method of transistor Apr. 22, 2014
8669616 Method for forming N-shaped bottom stress liner Mar. 11, 2014
8658508 Method for manufacturing SOI substrate Feb. 25, 2014
8652902 Floating gate semiconductor memory device and method for producing such a device Feb. 18, 2014
8637932 Semiconductor device and method for manufacturing the same Jan. 28, 2014
8637383 Strain relaxation using metal materials and related structures Jan. 28, 2014
8633044 Display device and method for fabricating same Jan. 21, 2014
8633065 Method for manufacturing mother substrate and array substrate Jan. 21, 2014
8629007 Method of improving replacement metal gate fill Jan. 14, 2014
8629501 Stress-generating structure for semiconductor-on-insulator devices Jan. 14, 2014
8629030 Method for manufacturing SOI substrate Jan. 14, 2014
8623712 Bulk fin-field effect transistors with well defined isolation Jan. 7, 2014
8617942 Producing transistor including single layer reentrant profile Dec. 31, 2013
8618554 Method to reduce ground-plane poisoning of extremely-thin SOI (ETSOI) layer with thin buried oxide Dec. 31, 2013
8598013 Method for manufacturing SOI substrate and semiconductor device Dec. 3, 2013
8598646 Non-volatile FINFET memory array and manufacturing method thereof Dec. 3, 2013
8587025 Method for forming laterally varying doping concentrations and a semiconductor device Nov. 19, 2013
8569152 Cut-very-last dual-epi flow Oct. 29, 2013
8557668 Method for forming N-shaped bottom stress liner Oct. 15, 2013
RE44531 Manufacturing process of thin film transistor Oct. 8, 2013
8541841 Semiconductor devices and semiconductor device manufacturing methods Sep. 24, 2013
8536650 Strained ultra-thin SOI transistor formed by replacement gate Sep. 17, 2013
8530998 Substrate compositions and methods for forming semiconductor on insulator devices Sep. 10, 2013
8492842 Method for forming retrograded well for MOSFET Jul. 23, 2013
8486739 Etchant for etching double-layered copper structure and method of forming array substrate having double-layered copper structures Jul. 16, 2013
8486772 Method of manufacturing SOI substrate Jul. 16, 2013
8482070 Silicon-on-insulator CMOS integrated circuit with multiple threshold voltages and a method for designing the same Jul. 9, 2013
8481354 Methods of creating a micro electro-mechanical systems accelerometer using a single double silicon-on-insulator wafer Jul. 9, 2013
8476123 Method for manufacturing thin film transistor array panel Jul. 2, 2013
8466039 Pressurized treatment of substrates to enhance cleaving process Jun. 18, 2013
8460980 Transistor comprising an embedded semiconductor alloy in drain and source regions extending under the gate electrode Jun. 11, 2013
8450160 Flattening method of a substrate May. 28, 2013
8450737 Thin film transistor array panel and method for manufacturing the same May. 28, 2013
8445338 Semiconductor device and method for manufacturing the same May. 21, 2013
8445346 Method of reducing wordline shorting May. 21, 2013
8440510 Method for manufacturing semiconductor device May. 14, 2013
8440502 Semiconductor device and method for manufacturing the semiconductor device May. 14, 2013
8435810 Method of manufacturing organic light emitting display device May. 7, 2013
8435857 Method for manufacturing semiconductor memory device May. 7, 2013
8420459 Bulk fin-field effect transistors with well defined isolation Apr. 16, 2013
8404529 Method of manufacturing thin film transistor Mar. 26, 2013
8389382 Method for manufacturing bonded wafer Mar. 5, 2013
8389392 FinFET with separate gates and method for fabricating a finFET with separate gates Mar. 5, 2013
8383493 Production of semiconductor devices Feb. 26, 2013
8383467 Thin film transistor and method of manufacturing the same Feb. 26, 2013
8377825 Semiconductor wafer re-use using chemical mechanical polishing Feb. 19, 2013
8361888 Method for manufacturing SOI wafer Jan. 29, 2013
8362561 Transistor device and method of manufacturing such a transistor device Jan. 29, 2013
8357562 Method to improve the reliability of the breakdown voltage in high voltage devices Jan. 22, 2013
8354719 Finned semiconductor device with oxygen diffusion barrier regions, and related fabrication methods Jan. 15, 2013

1 2 3 4 5 6 7 8 9 10










 
 
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