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Class Information
Number: 257/E21.56
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture of specific parts of devices (epo) > Making of isolation regions between components (epo) > Dielectric regions, e.g., epic dielectric isolation, locos; trench refilling techniques, soi technology, use of channel stoppers (epo) > Dielectric isolation using epic technique, i.e., epitaxial passivated integrated circuit (epo)
Description: This subclass is indented under subclass E21.545. This subclass is substantially the same in scope as ECLA classification H01L21/762F.










Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8390058 Configurations and methods for manufacturing devices with trench-oxide-nano-tube super-junctions Mar. 5, 2013
8357562 Method to improve the reliability of the breakdown voltage in high voltage devices Jan. 22, 2013
RE43819 Thin film transistor array substrate and method of fabricating the same Nov. 20, 2012
8222148 Method of manufacturing a semiconductor device Jul. 17, 2012
8183633 Semiconductor device and method for forming the same May. 22, 2012
8062953 Semiconductor devices with extended active regions Nov. 22, 2011
8034651 Light receiving device and method of manufacturing light receiving device Oct. 11, 2011
7955992 Method of passivating and encapsulating CdTe and CZT segmented detectors Jun. 7, 2011
7897471 Method and apparatus to improve the reliability of the breakdown voltage in high voltage devices Mar. 1, 2011
7790567 Semiconductor device and method for forming the same Sep. 7, 2010
7655533 Semiconductor device having reduced standby leakage current and increased driving current and method for manufacturing the same Feb. 2, 2010
7625816 Method of fabricating passivation Dec. 1, 2009
7595558 Semiconductor device and method of manufacturing the same Sep. 29, 2009
7504697 Rotational shear stress for charge carrier mobility modification Mar. 17, 2009
7485474 Higher selectivity, method for passivating short circuit current paths in semiconductor devices Feb. 3, 2009
7425505 Use of silyating agents Sep. 16, 2008
7279370 Thin film transistor array substrate and method of fabricating the same Oct. 9, 2007
7256140 Higher selectivity, method for passivating short circuit current paths in semiconductor devices Aug. 14, 2007
7001822 Semiconductor device formed on insulating layer and method of manufacturing the same Feb. 21, 2006
6984554 Transistor with group III/VI emitter Jan. 10, 2006
6903386 Transistor with means for providing a non-silicon-based emitter Jun. 7, 2005
6653656 Semiconductor device formed on insulating layer and method of manufacturing the same Nov. 25, 2003
6562692 Dielectric isolated wafer and its production method May. 13, 2003
6545337 Semiconductor integrated circuit device Apr. 8, 2003
6528379 Method for manufacturing semiconductor integrated circuit device Mar. 4, 2003
6509583 Semiconductor device formed on insulating layer and method of manufacturing the same Jan. 21, 2003
6424010 Method of manufacturing a semiconductor device having reduced power consumption without a reduction in the source/drain breakdown voltage Jul. 23, 2002
6410973 Thin film SOI MOSFET Jun. 25, 2002
6350659 Process of making semiconductor device having regions of insulating material formed in a semiconductor substrate Feb. 26, 2002
6144072 Semiconductor device formed on insulating layer and method of manufacturing the same Nov. 7, 2000
6104065 Semiconductor device having an active region in a substrate with trapezoidal cross-sectional structure Aug. 15, 2000
6100159 Quasi soi device Aug. 8, 2000
6060344 Method for producing a semiconductor substrate May. 9, 2000
5977606 Dielectric isolated high voltage semiconductor device Nov. 2, 1999
5933745 Method of making total dielectric semiconductor device isolation region Aug. 3, 1999
5905286 Semiconductor device May. 18, 1999
5841169 Integrated circuit containing devices dielectrically isolated and junction isolated from a substrate Nov. 24, 1998
5773868 Semiconductor device and method of manufacturing the same Jun. 30, 1998
5773352 Fabrication process of bonded total dielectric isolation substrate Jun. 30, 1998
5773330 Semiconductor device and method for fabricating the same Jun. 30, 1998
5747829 Dielectric isolated high voltage semiconductor device May. 5, 1998
5719426 Semiconductor device and manufacturing process thereof Feb. 17, 1998
5653803 Method of manufacturing a substrate for manufacturing silicon semiconductor elements Aug. 5, 1997
5612556 Monolithic integration of microwave silicon devices and low loss transmission lines Mar. 18, 1997
5602054 Method for formation of a well in a dielectrically isolated island Feb. 11, 1997
5557125 Dielectrically isolated semiconductor devices having improved characteristics Sep. 17, 1996
5536961 High breakdown voltage semiconductor device Jul. 16, 1996
5512774 Dielectrically isolated substrate and semiconductor device using the same Apr. 30, 1996
5463243 Dielectric isolated high voltage semiconductor device Oct. 31, 1995
5457068 Monolithic integration of microwave silicon devices and low loss transmission lines Oct. 10, 1995

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