| |
 |
|
Class Information
Number: 257/E21.553
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture of specific parts of devices (epo) > Making of isolation regions between components (epo) > Dielectric regions, e.g., epic dielectric isolation, locos; trench refilling techniques, soi technology, use of channel stoppers (epo) > Using local oxidation of silicon, e.g., locos, swami, silo (epo) > In region recessed from surface, e.g., in recess, groove, tub or trench region (epo)
Description: This subclass is indented under subclass E21.552. This subclass is substantially the same in scope as ECLA classification H01L21/762B2.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7384846 |
Method of fabricating semiconductor device |
Jun. 10, 2008 |
| 7371693 |
Manufacturing method of semiconductor device with chamfering |
May. 13, 2008 |
| 7365413 |
Reduced power distribution mesh resistance using a modified swiss-cheese slotting pattern |
Apr. 29, 2008 |
| 7361572 |
STI liner modification method |
Apr. 22, 2008 |
| 7314792 |
Method for fabricating transistor of semiconductor device |
Jan. 1, 2008 |
| 7279396 |
Methods of forming trench isolation regions with nitride liner |
Oct. 9, 2007 |
| 7220640 |
Method of fabricating recess transistor in integrated circuit device and recess transistor in integrated circuit device fabricated by the same |
May. 22, 2007 |
| 7199450 |
Materials and method to seal vias in silicon substrates |
Apr. 3, 2007 |
| 7157781 |
Enhancement of membrane characteristics in semiconductor device with membrane |
Jan. 2, 2007 |
| 7060630 |
Method of forming isolation film of semiconductor device |
Jun. 13, 2006 |
| 7061128 |
Semiconductor device and manufacturing method of the same |
Jun. 13, 2006 |
| 7049206 |
Device isolation for semiconductor devices |
May. 23, 2006 |
| 7049239 |
STI structure and fabricating methods thereof |
May. 23, 2006 |
| 6979628 |
Methods of forming semiconductor devices having field oxides in trenches and devices formed thereby |
Dec. 27, 2005 |
| 6949387 |
Method of designing a semiconductor device |
Sep. 27, 2005 |
| 6849519 |
Method of forming an isolation layer in a semiconductor devices |
Feb. 1, 2005 |
| 6817903 |
Process for reducing leakage in an integrated circuit with shallow trench isolated active areas |
Nov. 16, 2004 |
| 6800917 |
Bladed silicon-on-insulator semiconductor devices and method of making |
Oct. 5, 2004 |
| 6723618 |
Methods of forming field isolation structures |
Apr. 20, 2004 |
| 6620704 |
Method of fabricating low stress semiconductor devices with thermal oxide isolation |
Sep. 16, 2003 |
| 6610580 |
Flash memory array and a method and system of fabrication thereof |
Aug. 26, 2003 |
| 6610581 |
Method of forming isolation film in semiconductor device |
Aug. 26, 2003 |
| 6599798 |
Method of preparing buried LOCOS collar in trench DRAMS |
Jul. 29, 2003 |
| 6580088 |
Semiconductor devices and methods for manufacturing the same |
Jun. 17, 2003 |
| 6559032 |
Method of fabricating an isolation structure on a semiconductor substrate |
May. 6, 2003 |
| 6489205 |
Semiconductor device and method for manufacturing the same |
Dec. 3, 2002 |
| 6479370 |
Isolated structure and method of fabricating such a structure on a substrate |
Nov. 12, 2002 |
| 6465865 |
Isolated structure and method of fabricating such a structure on a substrate |
Oct. 15, 2002 |
| 6376331 |
Method for manufacturing a semiconductor device |
Apr. 23, 2002 |
| 6340624 |
Method of forming a circuitry isolation region within a semiconductive wafer |
Jan. 22, 2002 |
| 6326672 |
LOCOS fabrication processes and semiconductive material structures |
Dec. 4, 2001 |
| 6306726 |
Method of forming field oxide |
Oct. 23, 2001 |
| 6274455 |
Method for isolating semiconductor device |
Aug. 14, 2001 |
| 6258694 |
Fabrication method of a device isolation structure |
Jul. 10, 2001 |
| 6255218 |
Semiconductor device and fabrication method thereof |
Jul. 3, 2001 |
| 6251750 |
Method for manufacturing shallow trench isolation |
Jun. 26, 2001 |
| 6245643 |
Method of removing polysilicon residual in a LOCOS isolation process using an etching selectivity solution |
Jun. 12, 2001 |
| 6239003 |
Method of simultaneous fabrication of isolation and gate regions in a semiconductor device |
May. 29, 2001 |
| 6239002 |
Thermal oxidizing method for forming with attenuated surface sensitivity ozone-teos silicon oxide dielectric layer upon a thermally oxidized silicon substrate layer |
May. 29, 2001 |
| 6225674 |
Semiconductor structure and method of manufacture |
May. 1, 2001 |
| 6225186 |
Method for fabricating LOCOS isolation |
May. 1, 2001 |
| 6207539 |
Semiconductor device having field isolating film of which upper surface is flat and method thereof |
Mar. 27, 2001 |
| 6184106 |
Method for manufacturing a semiconductor device |
Feb. 6, 2001 |
| 6175147 |
Device isolation for semiconductor devices |
Jan. 16, 2001 |
| 6153482 |
Method for fabricating LOCOS isolation having a planar surface which includes having the polish stop layer at a lower level than the LOCOS formation |
Nov. 28, 2000 |
| 6144047 |
Semiconductor device having impurity concentrations for preventing a parasitic channel |
Nov. 7, 2000 |
| 6133118 |
Edge polysilicon buffer LOCOS isolation |
Oct. 17, 2000 |
| 6118167 |
Polysilicon coated nitride-lined shallow trench |
Sep. 12, 2000 |
| 6103595 |
Assisted local oxidation of silicon |
Aug. 15, 2000 |
| 6100162 |
Method of forming a circuitry isolation region within a semiconductive wafer |
Aug. 8, 2000 |
|
|
|
