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Class Information
Number: 257/E21.552
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture of specific parts of devices (epo) > Making of isolation regions between components (epo) > Dielectric regions, e.g., epic dielectric isolation, locos; trench refilling techniques, soi technology, use of channel stoppers (epo) > Using local oxidation of silicon, e.g., locos, swami, silo (epo)
Description: This subclass is indented under subclass E21.545. This subclass is substantially the same in scope as ECLA classification H01L21/762B.

Sub-classes under this class:

Class Number Class Name Patents
257/E21.553 In region recessed from surface, e.g., in recess, groove, tub or trench region (epo) 217
257/E21.556 Introducing electrical inactive or active impurities in local oxidation region, e.g., to alter locos oxide growth characteristics or for additional isolation purpose (epo) 117
257/E21.559 With plurality of successive local oxidation steps (epo) 96

Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12

Patent Number Title Of Patent Date Issued
8432000 Trench MOS barrier schottky rectifier with a planar surface using CMP techniques Apr. 30, 2013
8378497 Contact structures and semiconductor devices including the same Feb. 19, 2013
8354326 Precision trench formation through oxide region formation for a semiconductor device Jan. 15, 2013
8319290 Trench MOS barrier schottky rectifier with a planar surface using CMP techniques Nov. 27, 2012
8319317 Mesa type semiconductor device and manufacturing method thereof Nov. 27, 2012
8264022 Semiconductor device including contact plug and associated methods Sep. 11, 2012
8211778 Forming isolation regions for integrated circuits Jul. 3, 2012
8143139 Method of fabricating extended drain MOS transistor Mar. 27, 2012
8129799 Semiconductor device Mar. 6, 2012
8084833 Semiconductor device Dec. 27, 2011
7989308 Creation of dielectrically insulating soi-technlogical trenches comprising rounded edges for allowing higher voltages Aug. 2, 2011
7871938 Producing method of semiconductor device and substrate processing apparatus Jan. 18, 2011
7871896 Precision trench formation through oxide region formation for a semiconductor device Jan. 18, 2011
7824999 Method for enhancing field oxide Nov. 2, 2010
7816218 Selective deposition of amorphous silicon films on metal gates Oct. 19, 2010
7772637 Semiconductor devices including gate structures and leakage barrier oxides Aug. 10, 2010
7713873 Methods of forming contact structures semiconductor devices May. 11, 2010
7709348 Method for manufacturing semiconductor device May. 4, 2010
7709907 ESD structure May. 4, 2010
7625783 Semiconductor element and method for manufacturing the same Dec. 1, 2009
7560389 Method for fabricating semiconductor element Jul. 14, 2009
7517813 Two-step oxidation process for semiconductor wafers Apr. 14, 2009
7514336 Robust shallow trench isolation structures and a method for forming shallow trench isolation structures Apr. 7, 2009
7504308 Method of dual bird's beak LOCOS isolation Mar. 17, 2009
7465643 Semiconductor device with fixed channel ions Dec. 16, 2008
7413914 Method and apparatus for manufacturing semiconductor device, method and apparatus for controlling the same, and method and apparatus for simulating manufacturing process of semiconductor devic Aug. 19, 2008
7402474 Manufacturing method of semiconductor device Jul. 22, 2008
7211523 Method for forming field oxide May. 1, 2007
7192840 Semiconductor device fabrication method using oxygen ion implantation Mar. 20, 2007
7041563 Semiconductor device having a shallow trench isolation and method of fabricating the same May. 9, 2006
7015114 Trench in semiconductor device and formation method thereof Mar. 21, 2006
7008850 Method for manufacturing a semiconductor device Mar. 7, 2006
6995449 Deep trench isolation region with reduced-size cavities in overlying field oxide Feb. 7, 2006
6984868 Semiconductor device having a structure for isolating elements Jan. 10, 2006
6949387 Method of designing a semiconductor device Sep. 27, 2005
6949448 Local oxidation of silicon (LOCOS) method employing graded oxidation mask Sep. 27, 2005
6936897 Intermediate structure having a silicon barrier layer encapsulating a semiconductor substrate Aug. 30, 2005
6930029 Method of passivating an oxide surface subjected to a conductive material anneal Aug. 16, 2005
6921688 Method of and apparatus for integrating flash EPROM and SRAM cells on a common substrate Jul. 26, 2005
6921701 Method of manufacturing and structure of semiconductor device (DEMOS) with field oxide structure Jul. 26, 2005
6903434 Method and apparatus for integrating flash EPROM and SRAM cells on a common substrate Jun. 7, 2005
6900111 Method of forming a thin oxide layer having improved reliability on a semiconductor surface May. 31, 2005
6891245 Integrated circuit formed by removing undesirable second oxide while minimally affecting a desirable first oxide May. 10, 2005
6876055 Semiconductor device and its production method Apr. 5, 2005
6869849 Semiconductor device and its manufacturing method Mar. 22, 2005
6855618 Radiation hardened semiconductor device Feb. 15, 2005
6841822 Static random access memory cells Jan. 11, 2005
6835634 Streamlined field isolation process Dec. 28, 2004
6828644 Semiconductor device with reduced parasitic capacitance between impurity diffusion regions Dec. 7, 2004
6818495 Method for forming high purity silicon oxide field oxide isolation region Nov. 16, 2004

1 2 3 4 5 6 7 8 9 10 11 12

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