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Class Information
Number: 257/E21.548
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture of specific parts of devices (epo) > Making of isolation regions between components (epo) > Dielectric regions, e.g., epic dielectric isolation, locos; trench refilling techniques, soi technology, use of channel stoppers (epo) > Using trench refilling with dielectric materials (epo) > Concurrent filling of plurality of trenches having different trench shape or dimension, e.g., rectangular and v-shaped trenches, wide and narrow trenches, shallow and deep trenches (epo)
Description: This subclass is indented under subclass E21.546. This subclass is substantially the same in scope as ECLA classification H01L21/762C4.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7622369 |
Device isolation technology on semiconductor substrate |
Nov. 24, 2009 |
| 7622360 |
Shallow trench isolation region in semiconductor device and method of manufacture |
Nov. 24, 2009 |
| 7618876 |
Semiconductor device and method of manufacturing the same by filling a trench which includes an additional coating step |
Nov. 17, 2009 |
| 7615493 |
Method for forming alignment mark |
Nov. 10, 2009 |
| 7598575 |
Semiconductor die with reduced RF attenuation |
Oct. 6, 2009 |
| 7575968 |
Inverse slope isolation and dual surface orientation integration |
Aug. 18, 2009 |
| 7563720 |
Boron doped shell for MEMS device |
Jul. 21, 2009 |
| 7550361 |
Trench structure and method for co-alignment of mixed optical and electron beam lithographic fabrication levels |
Jun. 23, 2009 |
| 7541298 |
STI of a semiconductor device and fabrication method thereof |
Jun. 2, 2009 |
| 7538009 |
Method for fabricating STI gap fill oxide layer in semiconductor devices |
May. 26, 2009 |
| 7521333 |
Methods of fabricating trench isolation structures having varying depth |
Apr. 21, 2009 |
| 7507663 |
Fabrication of semiconductor devices |
Mar. 24, 2009 |
| 7501322 |
Methods of forming non-volatile memory devices having trenches |
Mar. 10, 2009 |
| 7501326 |
Method for forming isolation layer of semiconductor device |
Mar. 10, 2009 |
| 7456067 |
Method with high gapfill capability for semiconductor devices |
Nov. 25, 2008 |
| 7456102 |
Electroless copper fill process |
Nov. 25, 2008 |
| 7439604 |
Method of forming dual gate dielectric layer |
Oct. 21, 2008 |
| 7420259 |
Semiconductor device having two-layered charge storage electrode |
Sep. 2, 2008 |
| 7416942 |
Method for manufacturing semiconductor device |
Aug. 26, 2008 |
| 7407875 |
Low resistance contact structure and fabrication thereof |
Aug. 5, 2008 |
| 7407897 |
Capacitor of analog semiconductor device having multi-layer dielectric film and method of manufacturing the same |
Aug. 5, 2008 |
| 7405461 |
Semiconductor device and method for manufacturing semiconductor device |
Jul. 29, 2008 |
| 7402499 |
Semiconductor device and method of manufacturing the same |
Jul. 22, 2008 |
| 7393789 |
Protective coating for planarization |
Jul. 1, 2008 |
| 7393750 |
Method for manufacturing a semiconductor device |
Jul. 1, 2008 |
| 7393737 |
Semiconductor device and a method of manufacturing the same |
Jul. 1, 2008 |
| 7390717 |
Trench power MOSFET fabrication using inside/outside spacers |
Jun. 24, 2008 |
| 7387940 |
Methods of forming trench isolation in the fabrication of integrated circuitry, methods of fabricating memory circuitry, integrated circuitry and memory integrated circuitry |
Jun. 17, 2008 |
| 7384825 |
Methods of fabricating phase change memory elements having a confined portion of phase change material on a recessed contact |
Jun. 10, 2008 |
| 7381612 |
Method for manufacturing semiconductor device with recess channels and asymmetrical junctions |
Jun. 3, 2008 |
| 7375004 |
Method of making an isolation trench and resulting isolation trench |
May. 20, 2008 |
| 7368800 |
Methods of forming trench isolation in the fabrication of integrated circuitry, methods of fabricating memory circuitry, integrated circuitry and memory integrated circuitry |
May. 6, 2008 |
| 7368366 |
Methods of forming trench isolation in the fabrication of integrated circuitry, methods of fabricating memory circuitry, integrated circuitry and memory integrated circuitry |
May. 6, 2008 |
| 7364975 |
Semiconductor device fabrication methods |
Apr. 29, 2008 |
| 7364981 |
Methods of forming trench isolation in the fabrication of integrated circuitry, methods of fabricating memory circuitry, integrated circuitry and memory integrated circuitry |
Apr. 29, 2008 |
| 7361546 |
Method of forming conductive stud on vertical memory device |
Apr. 22, 2008 |
| 7358103 |
Method of fabricating an imaging device for collecting photons |
Apr. 15, 2008 |
| 7358566 |
Semiconductor device |
Apr. 15, 2008 |
| 7354818 |
Process for high voltage superjunction termination |
Apr. 8, 2008 |
| 7323379 |
Fabrication process for increased capacitance in an embedded DRAM memory |
Jan. 29, 2008 |
| 7314792 |
Method for fabricating transistor of semiconductor device |
Jan. 1, 2008 |
| 7309640 |
Method of fabricating an integrated circuit including hollow isolating trenches and corresponding integrated circuit |
Dec. 18, 2007 |
| 7294571 |
Concave pattern formation method and method for forming semiconductor device |
Nov. 13, 2007 |
| 7282400 |
Method and apparatus on (110) surfaces of silicon structures with conduction in the <110> direction |
Oct. 16, 2007 |
| 7276411 |
Trench semiconductor device having gate oxide layer with multiple thicknesses and processes of fabricating the same |
Oct. 2, 2007 |
| 7276426 |
Methods of forming semiconductor constructions |
Oct. 2, 2007 |
| 7274084 |
Enhanced PFET using shear stress |
Sep. 25, 2007 |
| 7271107 |
Reduction of feature critical dimensions using multiple masks |
Sep. 18, 2007 |
| 7271108 |
Multiple mask process with etch mask stack |
Sep. 18, 2007 |
| 7268057 |
Methods of filling openings with oxide, and methods of forming trenched isolation regions |
Sep. 11, 2007 |
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