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Class Information
Number: 257/E21.546
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture of specific parts of devices (epo) > Making of isolation regions between components (epo) > Dielectric regions, e.g., epic dielectric isolation, locos; trench refilling techniques, soi technology, use of channel stoppers (epo) > Using trench refilling with dielectric materials (epo)
Description: This subclass is indented under subclass E21.545. This subclass is substantially the same in scope as ECLA classification H01L21/762C.
Sub-classes under this class:
| Class Number |
Class Name |
Patents |
| 257/E21.548 |
Concurrent filling of plurality of trenches having different trench shape or dimension, e.g., rectangular and v-shaped trenches, wide and narrow trenches, shallow and deep trenches (epo) |
619 |
| 257/E21.547 |
Dielectric material being obtained by full chemical transformation of nondielectric materials, such as polycrystalline silicon, metals (epo) |
83 |
| 257/E21.551 |
Introducing impurities in trench side or bottom walls, e.g., for forming channel stoppers or alter isolation behavior (epo) |
326 |
| 257/E21.549 |
Of trenches having shape other than rectangular or v shape, e.g., rounded corners, oblique or rounded trench walls (epo) |
527 |
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7432150 |
Method of manufacturing a magnetoelectronic device |
Oct. 7, 2008 |
| 7432148 |
Shallow trench isolation by atomic-level silicon reconstruction |
Oct. 7, 2008 |
| 7429520 |
Methods for forming trench isolation |
Sep. 30, 2008 |
| 7425751 |
Method to reduce junction leakage current in strained silicon on silicon-germanium devices |
Sep. 16, 2008 |
| 7425489 |
Self-aligned shallow trench isolation |
Sep. 16, 2008 |
| 7422959 |
Method for forming isolation trench in a semiconductor substrate |
Sep. 9, 2008 |
| 7419866 |
Process of forming an electronic device including a semiconductor island over an insulating layer |
Sep. 2, 2008 |
| 7416955 |
Method of manufacturing a semiconductor device |
Aug. 26, 2008 |
| 7407897 |
Capacitor of analog semiconductor device having multi-layer dielectric film and method of manufacturing the same |
Aug. 5, 2008 |
| 7402473 |
Semiconductor device and process for producing the same |
Jul. 22, 2008 |
| 7400010 |
Semiconductor device and method of manufacturing the same |
Jul. 15, 2008 |
| 7399679 |
Narrow width effect improvement with photoresist plug process and STI corner ion implantation |
Jul. 15, 2008 |
| 7397105 |
Apparatus to passivate inductively or capacitively coupled surface currents under capacitor structures |
Jul. 8, 2008 |
| 7397104 |
Semiconductor integrated circuit device and a method of manufacturing the same |
Jul. 8, 2008 |
| 7396737 |
Method of forming shallow trench isolation |
Jul. 8, 2008 |
| 7396729 |
Methods of forming semiconductor devices having a trench with beveled corners |
Jul. 8, 2008 |
| 7396728 |
Methods of improving drive currents by employing strain inducing STI liners |
Jul. 8, 2008 |
| 7393789 |
Protective coating for planarization |
Jul. 1, 2008 |
| 7393750 |
Method for manufacturing a semiconductor device |
Jul. 1, 2008 |
| 7390717 |
Trench power MOSFET fabrication using inside/outside spacers |
Jun. 24, 2008 |
| 7390701 |
Method of forming a digitalized semiconductor structure |
Jun. 24, 2008 |
| 7374999 |
Semiconductor device |
May. 20, 2008 |
| 7371657 |
Method for forming an isolating trench with a dielectric material |
May. 13, 2008 |
| 7371656 |
Method for forming STI of semiconductor device |
May. 13, 2008 |
| 7371654 |
Manufacturing method of semiconductor device with filling insulating film into trench |
May. 13, 2008 |
| 7368364 |
Method for manufacturing element isolation structural section |
May. 6, 2008 |
| 7368353 |
Trench power MOSFET with reduced gate resistance |
May. 6, 2008 |
| 7364975 |
Semiconductor device fabrication methods |
Apr. 29, 2008 |
| 7361571 |
Method for fabricating a trench isolation with spacers |
Apr. 22, 2008 |
| 7348639 |
Method for providing a deep connection to substrate or buried layer in a semiconductor device |
Mar. 25, 2008 |
| 7348256 |
Methods of forming reduced electric field DMOS using self-aligned trench isolation |
Mar. 25, 2008 |
| 7348254 |
Method of fabricating fin field-effect transistors |
Mar. 25, 2008 |
| 7335609 |
Gap-fill depositions introducing hydroxyl-containing precursors in the formation of silicon containing dielectric materials |
Feb. 26, 2008 |
| 7335564 |
Method for forming device isolation layer of semiconductor device |
Feb. 26, 2008 |
| 7332407 |
Method and apparatus for a semiconductor device with a high-k gate dielectric |
Feb. 19, 2008 |
| 7326627 |
Method of fabricating a semiconductor device with a trench isolation structure and resulting semiconductor device |
Feb. 5, 2008 |
| 7320927 |
In situ hardmask pullback using an in situ plasma resist trim process |
Jan. 22, 2008 |
| 7319062 |
Trench isolation method with an epitaxially grown capping layer |
Jan. 15, 2008 |
| 7304365 |
Semiconductor device and method of producing the same |
Dec. 4, 2007 |
| 7297609 |
Method for fabricating semiconductor device |
Nov. 20, 2007 |
| 7291541 |
System and method for providing improved trench isolation of semiconductor devices |
Nov. 6, 2007 |
| 7279377 |
Method and structure for shallow trench isolation during integrated circuit device manufacture |
Oct. 9, 2007 |
| 7276774 |
Trench isolation structures for integrated circuits |
Oct. 2, 2007 |
| 7276417 |
Hybrid STI stressor with selective re-oxidation anneal |
Oct. 2, 2007 |
| 7276411 |
Trench semiconductor device having gate oxide layer with multiple thicknesses and processes of fabricating the same |
Oct. 2, 2007 |
| 7276406 |
Transistor structure with dual trench for optimized stress effect and method therefor |
Oct. 2, 2007 |
| 7273796 |
Methods of forming trench isolation in the fabrication of integrated circuitry and methods of fabricating integrated circuitry |
Sep. 25, 2007 |
| 7273795 |
Method for forming a trench element separation region in a semiconductor substrate |
Sep. 25, 2007 |
| 7268048 |
Methods for elimination of arsenic based defects in semiconductor devices with isolation regions |
Sep. 11, 2007 |
| 7268043 |
Semiconductor device and method of manufacturing the same |
Sep. 11, 2007 |
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