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Class Information
Number: 257/E21.536
Name: Active solid-state devices (e.g., transistors, solid-state diodes) > Processes or apparatus adapted for manufacture or treatment of semiconductor or solid-state devices or of parts thereof (epo) > Manufacture or treatment of devices consisting of plurality of solid-state components formed in or on common substrate or of parts thereof; manufacture of integrated circuit devices or of parts thereof (epo) > Manufacture of specific parts of devices (epo)
Description: This subclass is indented under subclass E21.532. This subclass is substantially the same in scope as ECLA classification H01L21/71.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7595216 |
Method for manufacturing CMOS image sensor |
Sep. 29, 2009 |
| 7595235 |
Solid electrolytic capacitor, transmission-line device, method of producing the same, and composite electronic component using the same |
Sep. 29, 2009 |
| 7572711 |
Method of manufacturing a semiconductor device |
Aug. 11, 2009 |
| 7384875 |
Method of manufacturing semiconductor device using flexible tube |
Jun. 10, 2008 |
| 7364935 |
Common word line edge contact phase-change memory |
Apr. 29, 2008 |
| 7354842 |
Methods of forming conductive materials |
Apr. 8, 2008 |
| 7348263 |
Manufacturing method for electronic component, electronic component, and electronic equipment |
Mar. 25, 2008 |
| 7253062 |
Semiconductor device with asymmetric pocket implants |
Aug. 7, 2007 |
| 7244670 |
Enhanced step coverage of thin films on patterned substrates by oblique angle PVD |
Jul. 17, 2007 |
| 7199458 |
Stacked offset semiconductor package and method for fabricating |
Apr. 3, 2007 |
| 7192858 |
Method of forming plug |
Mar. 20, 2007 |
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